Nanostructure field-effect transistors (NSFETs) including isolation layers formed between epitaxial source/drain regions and semiconductor substrates and methods of forming the same are disclosed. In an embodiment, a semiconductor device includes a semiconductor substrate; a gate stack over the semiconductor substrate, the gate stack including a gate electrode and a gate dielectric layer; a first epitaxial source/drain region adjacent the gate stack; and a high-k dielectric layer extending between the semiconductor substrate and the first epitaxial source/drain region, the high-k dielectric layer contacting the first epitaxial source/drain region, the gate dielectric layer and the high-k dielectric layer including the same material.

A semiconductor device structure and a method for forming a semiconductor device structure are provided. The semiconductor device structure includes a stack of channel structures over a semiconductor fin and a gate stack wrapped around the channel structures. The semiconductor device structure also includes a source/drain epitaxial structure adjacent to the channel structures and an isolation structure surrounding the semiconductor fin. A protruding portion of the semiconductor fin protrudes from a top surface of the isolation structure. The semiconductor device structure further includes an embedded epitaxial structure adjacent to a first side surface of the protruding portion of the semiconductor fin.

A method includes forming an anti-punch-through layer over a first region and a second region of a substrate, forming a semiconductor layer over the anti-punch-through layer, patterning the semiconductor layer and the anti-punch-through layer to form a first plurality of fins over the first region and a second plurality of fins over the second region, and forming a patterned resist layer over the first plurality of fins and the second plurality of fins. The method also includes recessing a portion of the substrate between the first plurality of fins and the second plurality of fins in an etching process through openings of the patterned resist layer.

Nanostructure field-effect transistors (NSFETs) including isolation layers formed between epitaxial source/drain regions and semiconductor substrates and methods of forming the same are disclosed. In an embodiment, a semiconductor device includes a semiconductor substrate; a gate stack over the semiconductor substrate, the gate stack including a gate electrode and a gate dielectric layer; a first epitaxial source/drain region adjacent the gate stack; and a high-k dielectric layer extending between the semiconductor substrate and the first epitaxial source/drain region, the high-k dielectric layer contacting the first epitaxial source/drain region, the gate dielectric layer and the high-k dielectric layer including the same material.

A semiconductor device includes first and second structures. The first structure includes a first fin structure and a second fin structure. Bottom portions of the first fin structure and the second fin structure are doped with an n-type dopant. The second structure includes a third fin structure and a fourth fin structure. Bottom portions of the third and fourth fin structures are doped with a p-type dopant. The semiconductor device also includes anti-punch-through layers in top ends of the first, second, third, and fourth fin structures, a first epitaxial feature atop the anti-punch-through layers, and a second epitaxial feature atop the anti-punch-through layers. A bottom surface of the first epitaxial feature interfaces a top surface of the anti-punch-through layers in the first and second fin structures. A bottom surface of the second epitaxial feature interfaces a top surface of the anti-punch-through layers in the third and fourth fin structures.

A channel stop and well dopant migration control implant (e.g., of argon) can be used in the fabrication of a transistor (e.g., PMOS), either around the time of threshold voltage adjust and well implants prior to gate formation, or as a through-gate implant around the time of source/drain extension implants. With its implant depth targeted about at or less than the peak of the concentration of the dopant used for well and channel stop implants (e.g., phosphorus) and away from the substrate surface, the migration control implant suppresses the diffusion of the well and channel stop dopant to the surface region, a more retrograde concentration profile is achieved, and inter-transistor threshold voltage mismatch is improved without other side effects. A compensating through-gate threshold voltage adjust implant (e.g., of arsenic) or a threshold voltage adjust implant of increased dose can increase the magnitude of the threshold voltage to a desired level.

A method of independently forming source/drain regions in NMOS regions including nanosheet field-effect transistors (NSFETs), NMOS regions including fin field-effect transistors (FinFETs) PMOS regions including NSFETs, and PMOS regions including FinFETs and semiconductor devices formed by the method are disclosed. In an embodiment, a device includes a semiconductor substrate; a first nanostructure over the semiconductor substrate; a first epitaxial source/drain region adjacent the first nanostructure; a first inner spacer layer adjacent the first epitaxial source/drain region, the first inner spacer layer comprising a first material; a second nanostructure over the semiconductor substrate; a second epitaxial source/drain region adjacent the second nanostructure; and a second inner spacer layer adjacent the second epitaxial source/drain region, the second inner spacer layer comprising a second material different from the first material.

Provided are a semiconductor device, a method of manufacturing the semiconductor device, and an electronic apparatus including the semiconductor device. According to the embodiments, the semiconductor device may include: a vertical structure extending in a vertical direction relative to a substrate; and a nanosheet extending from the vertical structure and spaced apart from the substrate in the vertical direction, wherein the nanosheet includes a first portion in a first orientation, and at least one of an upper surface and a lower surface of the first portion is not parallel to a horizontal surface of the substrate.

A semiconductor device includes a gate structure disposed over a semiconductor substrate, and a dielectric layer surrounding the gate structure. The semiconductor device also includes a source region and a drain region disposed in the semiconductor substrate and on opposite sides of the gate structure. The semiconductor device further includes a first dipole portion disposed over the semiconductor substrate and covering the source region, and a first dielectric spacer disposed over the first dipole portion and adjacent to the dielectric layer.

A method of independently forming source/drain regions in NMOS regions including nanosheet field-effect transistors (NSFETs), NMOS regions including fin field-effect transistors (FinFETs) PMOS regions including NSFETs, and PMOS regions including FinFETs and semiconductor devices formed by the method are disclosed. In an embodiment, a device includes a semiconductor substrate; a first nanostructure over the semiconductor substrate; a first epitaxial source/drain region adjacent the first nanostructure; a first inner spacer layer adjacent the first epitaxial source/drain region, the first inner spacer layer comprising a first material; a second nanostructure over the semiconductor substrate; a second epitaxial source/drain region adjacent the second nanostructure; and a second inner spacer layer adjacent the second epitaxial source/drain region, the second inner spacer layer comprising a second material different from the first material.