Patent classifications
H01L39/02
In-situ quantum error correction
Methods, systems, and apparatus for parallel optimization of continuously running quantum error correction by closed-loop feedback. In one aspect, a method includes continuously and effectively optimizing qubit performance in-situ whilst an error correction operation on the quantum system is running. The method directly monitors the output from error detection and provides this information as feedback to calibrate the quantum gates associated with the quantum system. In some implementations, the physical qubits are spatially partitioned into one or more independent hardware patterns, where the errors attributable to each hardware pattern are non-overlapping. The one or more different sets of hardware patterns are then temporarily interleaved such that all physical qubits and operations are optimized. The method allows for the optimization of each section of a hardware pattern to be performed individually and in parallel, and can result is O(1) scaling.
Systems and methods for superconducting devices used in superconducting circuits and scalable computing
Approaches useful to operation of scalable processors with ever larger numbers of logic devices (e.g., qubits) advantageously take advantage of QFPs, for example to implement shift registers, multiplexers (i.e., MUXs), de-multiplexers (i.e., DEMUXs), and permanent magnetic memories (i.e., PMMs), and the like, and/or employ XY or XYZ addressing schemes, and/or employ control lines that extend in a “braided” pattern across an array of devices. Many of these described approaches are particularly suited for implementing input to and/or output from such processors. Superconducting quantum processors comprising superconducting digital-analog converters (DACs) are provided. The DACs may use kinetic inductance to store energy via thin-film superconducting materials and/or series of Josephson junctions, and may use single-loop or multi-loop designs. Particular constructions of energy storage elements are disclosed, including meandering structures. Galvanic connections between DACs and/or with target devices are disclosed, as well as inductive connections.
Method of forming superconducting layers and traces
Methods and structures corresponding to superconducting apparatus including superconducting layers and traces are provided. A method for forming a superconducting apparatus includes forming a first dielectric layer on a substrate by depositing a first dielectric material on the substrate and curing the first dielectric material at a first temperature. The method further includes forming a first superconducting layer comprising a first set of patterned superconducting traces on the first dielectric layer. The method further includes forming a second dielectric layer on the first superconducting layer by depositing a second dielectric material on the first superconducting layer and curing the second dielectric material at a second temperature, where the second temperature is lower than the first temperature. The method further includes forming a second superconducting layer comprising a second set of patterned superconducting traces on the second dielectric layer.
Capacitively-driven tunable coupling
A capacitively-driven tunable coupler includes a coupling capacitor connecting an open end of a quantum object (i.e., an end of the object that cannot have a DC path to a low-voltage rail, such as a ground node, without breaking the functionality of the object) to an RF SQUID having a Josephson element capable of providing variable inductance and therefore variable coupling to another quantum object.
CO-PLANAR WAVEGUIDE FLUX QUBITS
A qubit device includes an elongated thin film uninterrupted by Josephson junctions, a quantum device in electrical contact with a proximal end of the elongated thin film, and a ground plane that is co-planar with the elongated thin film and is in electrical contact with a distal end of the elongated thin film, in which the thin film, the quantum device, and the ground plane comprise a material that is superconducting at a designed operating temperature.
Method for the in situ production of Majorana material superconductor hybrid networks and to a hybrid structure which is produced using the method
A method for producing a hybrid structure, the hybrid structure including at least one structured Majorana material and at least one structured superconductive material arranged thereon includes producing, on a substrate, a first mask for structured application of the Majorana material and a further mask for structured growth of the at least one superconductive material, which are aligned relatively to one another, and applying the at least one structured superconductive material to the structured Majorana material with the aid of the further mask. The structured application of the Majorana material and of the at least one superconductive material takes place without interruption in an inert atmosphere.
METHODS FOR ANNEALING QUBITS WITH AN ANTENNA CHIP
Systems, computer-implemented methods, and techniques facilitating antenna-based thermal annealing of qubits are provided. In one example, a first antenna can be positioned above a superconducting qubit chip having a first Josephson junction and a second Josephson junction. The first antenna can direct a first electromagnetic wave toward the first Josephson junction. A first length of a first defined vertical gap, between the first antenna and the superconducting qubit chip, can be sized to cause the first electromagnetic wave to circumscribe a first set of one or more capacitor pads of the first Josephson junction, thereby annealing the first Josephson junction, without annealing the second Josephson junction. In another example, the first length of the first defined vertical gap can be a function of a model of the first electromagnetic wave as a cone, wherein the cone originates from the first antenna and extends toward the superconducting qubit chip.
Shadow mask sidewall tunnel junction for quantum computing
A technique relates to forming a sidewall tunnel junction. A first conducting layer is formed using a first shadow mask evaporation. A second conducting layer is formed on a portion of the first conducting layer, where the second conducting layer is formed using a second shadow mask evaporation. An oxide layer is formed on the first conducting layer and the second conducting layer. A third conducting layer is formed on part of the oxide layer, such that the sidewall tunnel junction is positioned between the first conducting layer and the third conducting layer.
SUPERCONDUCTING BUMP BOND ELECTRICAL CHARACTERIZATION
Test structures and methods for superconducting bump bond electrical characterization are used to verify the superconductivity of bump bonds that electrically connect two superconducting integrated circuit chips fabricated using a flip-chip process, and can also ascertain the self-inductance of bump bond(s) between chips. The structures and methods leverage a behavioral property of superconducting DC SQUIDs to modulate a critical current upon injection of magnetic flux in the SQUID loop, which behavior is not present when the SQUID is not superconducting, by including bump bond(s) within the loop, which loop is split among chips. The sensitivity of the bump bond superconductivity verification is therefore effectively perfect, independent of any multi-milliohm noise floor that may exist in measurement equipment.
Three-dimensional integration for qubits on multiple height crystalline dielectric
Techniques related to a three-dimensional integration for qubits on multiple height crystalline dielectric and method of fabricating the same are provided. A superconductor structure can comprise a first buried layer that can comprise a first patterned superconducting layer of a first wafer bonded to a second patterned superconducting layer of a second wafer. The superconductor structure can also comprise a patterned superconducting film attached to the second wafer. Further, the superconductor structure can comprise a second buried layer that can comprise a third patterned superconducting layer of a third wafer bonded to the patterned superconducting film that can be attached to the second wafer.