A display panel is provided. The display panel includes has an active area and a border area surrounding the active area. The display panel includes a plurality of pixels, a plurality of multiplexer portion, a gate driver portion and a source routing portion. The pixels are located in the active area. The multiplexer portion is located in the border area. The gate driver portion is located in the border area. The source routing portion is located in the border area. In part of the border area, at least part of the multiplexer portion, at least part of the gate driver portion and at least part of the source routing portion are located and sequentially arranged from an internal edge of the border area to an external edge of the border area.

A sense amplifier (SA) comprises a semiconductor substrate having an oxide definition (OD) region, a pair of SA sensing devices, a SA enabling device, and a sense amplifier enabling signal (SAE) line for carrying an SAE signal. The pair of SA sensing devices have the same poly gate length Lg as the SA enabling device, and they all share the same OD region. When enabled, the SAE signal turns on the SA enabling device to discharge one of the pair of SA sensing devices for data read from the sense amplifier.

An array substrate and a display panel are provided. The array substrate includes a transparent substrate including a display area and a rim area; a pixel structure and an antistatic switching tube which are arranged on a same side of the transparent substrate. The pixel structure includes a pixel thin-film transistor located in the display area, and the antistatic switching tube is located in the rim area. The pixel structure also includes first grounding wire located on a side of the antistatic switching tube facing away from the transparent substrate, and a second grounding wire located between the antistatic switching tube and the transparent substrate.

The present disclosure provides an integrated circuit (IC) structure that includes a first substrate with a first surface having a normal direction along a first direction; a first IC chip bonded to the first substrate; and a second IC chip electrically connected to the first IC chip. The first and second IC chips are sealed in a same package having a sealing material layer, and the sealing material layer includes a first anisotropic thermal dissipation material. The first anisotropic thermal dissipation material is thermally conductive with a first thermal conductivity along the first direction and a second thermal conductivity along a second direction being perpendicular to the first direction. The second thermal conductivity is substantially greater than the first thermal conductivity.

A semiconductor structure includes a transistor device at a first side of the semiconductor structure, a control circuit at the first side of the semiconductor structure, and a resistor-capacitor circuit including a resistor and a capacitor. The resistor is in a power delivery network at a second side of the semiconductor structure and the capacitor is at the first side of the semiconductor structure. A first electrode of the capacitor is coupled to a first power rail in the power delivery network at the second side of the semiconductor structure. A second electrode of the capacitor is coupled to a second power rail in the power delivery network at the second side of the semiconductor structure. An input of the control circuit is coupled to the resistor. A gate of the transistor device is coupled to an output of the control circuit.

Various embodiments of the present application are directed towards an integrated circuit (IC) in which a shield structure blocks the migration of charge to a semiconductor device from proximate a through substrate via (TSV). In some embodiments, the IC comprises a substrate, an interconnect structure, the semiconductor device, the TSV, and the shield structure. The interconnect structure is on a frontside of the substrate and comprises a wire. The semiconductor device is on the frontside of the substrate, between the substrate and the interconnect structure. The TSV extends completely through the substrate, from a backside of the substrate to the wire, and comprises metal. The shield structure comprises a PN junction extending completely through the substrate and directly between the semiconductor device and the TSV.

A semiconductor device includes a semiconductor layer. The entire length of an outer peripheral side among outer peripheral sides of a first gate electrode region and the entire length of an outer peripheral side among outer peripheral sides of a first resistance element region match a portion of an outer peripheral side, among outer peripheral sides of the semiconductor layer, that is orthogonal to a border line and has the shortest distance to a first gate pad. Among four corner portions of an outer periphery of the first gate electrode region, only one corner portion is included in the outer peripheral sides of the first resistance element region, the only one corner portion having the shortest distance to the border line and the shortest distance to an outer peripheral side, among the outer peripheral sides of the semiconductor layer, that is orthogonal to the border line.

An electro-static discharge (ESD) protection network for an input/output (I/O) pad includes a driver stack including an upper branch and a lower branch, the upper branch being electrically connected between a first node that has a first reference voltage and the I/O pad, and the lower branch being electrically connected between the I/O pad and a second node that has a second reference voltage; a first ESD device electrically connected between the I/O pad and a third node that has a third reference voltage; and a power clamp between the third node and the second node.

A transient voltage suppressor (TVS) circuit is described. The TVS circuit includes a semiconductor substrate having a first TVS device and a second TVS device electrically connected in series. The TVS circuit further includes a resistor. The resistor and at least one of the first TVS device and the second TVS device are electrically connected in parallel. A method of manufacturing the TVS circuit is also described.

The present disclosure provides a semiconductor device. The semiconductor device includes a semiconductor substrate and an epitaxial stack disposed above the semiconductor substrate. The epitaxial stack includes first and second type epitaxial layers, the first and second type epitaxial layers having different material compositions. The first and second type epitaxial layers are alternatingly disposed in a vertical direction. The semiconductor device also includes a first doped region in the epitaxial stack and a second doped region in the epitaxial stack. The first doped region has a first dopant of a first conductivity type. The second doped region has a second dopant of a second conductivity type opposite the first conductivity type. The semiconductor device also includes first and second gate stacks disposed above the epitaxial stack. A portion of the first doped region and a portion of the second doped region are between the first and second gate stacks.