A device includes a buried well region and a first HVW region of the first conductivity, and an insulation region over the first HVW region. A drain region of the first conductivity type is disposed on a first side of the insulation region and in a top surface region of the first HVW region. A first well region and a second well region of a second conductivity type opposite the first conductivity type are on the second side of the insulation region. A second HVW region of the first conductivity type is disposed between the first and the second well regions, wherein the second HVW region is connected to the buried well region. A source region of the first conductivity type is in a top surface region of the second HVW region, wherein the source region, the drain region, and the buried well region form a JFET.

Disclosed are a lateral silicon carbide junction gate field effect transistor (SiC-JFET) device and a manufacturing method thereof. The lateral SiC-JFET device includes a base; a source and a drift region formed on the base in sequence; a first source contact region, a second source contact region, and a channel region formed on the source in sequence; and a gate formed on the channel region; where the channel region and the drift region are independent structures respectively. The embodiments of the present disclosure solved the technical problem that the adjustment of the breakdown voltage of the conventional lateral SiC-JFET device is limited by the size of the channel region.

A junction field effect transistor device includes a substrate, a well region, a first top layer, a plurality of source/drain regions, a first isolation structure, a gate, and a plurality of first well slots. The substrate has a first conductivity type. The well region is embedded in the substrate. The well region has a second conductivity type. The first top layer is embedded in the well region. The first top layer has the first conductivity type. The source/drain regions are disposed on a top surface of the well region. The first isolation structure is adjacent to one of the source/drain regions. The gate is disposed on a top surface of the first top layer. The first well slots are disposed below the gate. A second-conductivity-type dopant concentration of the first well slots is lower than a second-conductivity-type dopant concentration of the well region.

A semiconductor substrate of a first conductivity type having a first region of a second conductivity type formed in a surface thereof; an insulating film on the semiconductor substrate; a primary wiring line connected to the first region and configured to receive a voltage from outside; a plurality of diodes connected in series on the insulating film and having a spiral shape generally centering around the first region in a plan view, the diodes having one end of the series thereof connected to the primary wiring line and serving as a cathode; a resistor voltage divider having one end connected to another end of the series of diodes; a first connection wiring line connected to another end of the resistor voltage divider; and a second connection wiring line connected to a midpoint between the another end of the series of diodes and the another end of the resistor voltage divider.

A device includes a p-well region, and a first High-Voltage N-type Well (HVNW) region and a second HVNW region contacting opposite edges of the p-well region. A P-type Buried Layer (PBL) has opposite edges in contact with the first HVNW region and the second HVNW region. An n-type buried well region is underlying the PBL. The p-well region and the n-type buried well region are in contact with a top surface and a bottom surface, respectively, of the PBL. The device further includes a n-well region in a top portion of the p-well region, an n-type source region in the n-well region, a gate stack overlapping a portion of the p-well region and a portion of the second HVNW region, and a channel region under the gate stack. The channel region interconnects the n-well region and the second HVNW region.

A nitride semiconductor device according to the present disclosure includes a substrate, a p-type GaN layer formed on a main surface of the substrate and made of Al.sub.xIn.sub.yGa.sub.1-x-yN containing p-type impurities, where 0X<1, 0Y<1, and a Ti film formed on the p-type GaN layer. The Ti film is in a coherent or metamorphic state with respect to the p-type GaN layer.

A dielectric and isolation lower fin material is described that is useful for fin-based electronics. In some examples, a dielectric layer is on first and second sidewalls of a lower fin. The dielectric layer has a first upper end portion laterally adjacent to the first sidewall of the lower fin and a second upper end portion laterally adjacent to the second sidewall of the lower fin. An isolation material is laterally adjacent to the dielectric layer directly on the first and second sidewalls of the lower fin and a gate electrode is over a top of and laterally adjacent to sidewalls of an upper fin. The gate electrode is over the first and second upper end portions of the dielectric layer and the isolation material.

Aspects of the present disclosure provides a device comprising a P-type semiconductor substrate, an N-type tub above the semiconductor substrate, a P-type region provided in the N-type tub isolated by one or more P-type isolation structures, and an N-type punch-through stopper provided under the P-type regions isolated by the isolation structure(s). The punch-through stopper is heavily doped compared to the N-type tub. The P-type region has a width between the two isolation structures that is equal to or less than that of the N-type punch-through stopper.

The present invention relates to a junction field effect transistor. The junction field effect transistor comprises a substrate (10), a buried layer in the substrate, a first well region (32) and a second well region (34) that are on the buried layer, a source lead-out region (50), a drain lead-out region (60), and a first gate lead-out region (42) that are in the first well region (32), and a second gate lead-out region (44) in the second well region (34). A Schottky junction interface (70) is disposed on the surface of the first well region (32). The Schottky junction interface (70) is located between the first gate lead-out region (42) and the drain lead-out region (60), and is isolated from the first gate lead-out region (42) and the drain lead-out region (60) by means of isolation structures. The present invention also relates to a manufacturing method for a junction field effect transistor.

A lateral super junction JFET is formed from stacked alternating P type and N type semiconductor layers over a P-epi layer supported on an N+ substrate. An N+ drain column extends down through the super junction structure and the P-epi to connect to the N+ substrate to make the device a bottom drain device. N+ source column and P+ gate column extend through the super junction but stop at the P-epi layer. A gate-drain avalanche clamp diode is formed from the bottom the P+ gate column through the P-epi to the N+ drain substrate.