A semiconductor device includes a first semiconductor structure having a first active region pattern density. The semiconductor device further includes a second semiconductor structure having a second active region pattern density, wherein the second semiconductor structure comprises a first resistive element. The semiconductor device further includes a third semiconductor structure having a third active region pattern density, wherein the third semiconductor structure includes a second resistive element. The second semiconductor structure is adjacent to the first semiconductor structure and adjacent to the third semiconductor structure. The first semiconductor structure, the second semiconductor structure and the third semiconductor structure do not overlap.

A semiconductor device may include a first terminal electrically connected to a first semiconductor chip, a second terminal electrically connected to a second semiconductor chip, which is different from the first semiconductor chip, a first signal line electrically connecting the first terminal and the second terminal and including a first node, a third terminal connected to a tester monitoring a signal transmitted between the first semiconductor chip and the second semiconductor chip, a fourth terminal applied a reference voltage, a second signal line electrically connecting the third terminal and the fourth terminal and including a second node, a first resistor connected between the first node and the second node and a second resistor directly connected to the second node different from the first resistor.

A method for producing a polysilicon resistor device may include: forming a polysilicon layer; implanting first dopant atoms into at least a portion of the polysilicon layer, wherein the first dopant atoms include deep energy level donors; implanting second dopant atoms into said at least a portion of said polysilicon layer; and annealing said at least a portion of said polysilicon layer.

Techniques related to a method for manufacturing an integrated circuit is disclosed. According to one embodiment, a method for manufacturing an integrated circuit on a wafer comprises a first device of the integrated circuit is formed on the wafer and a second device of the integrated circuit is formed on the wafer to make a projection area of the second device overlap with a projection area of the first device partially or completely. In one embodiment, two or more devices are formed in different layers of the integrated circuit, or formed at different depths in a same layer of the integrated circuit, so the two or more devices may share an area on the same wafer in a certain manner. Thereby, the area of the chip is saved and the chip cost of the integrated circuit is significantly reduced.

A semiconductor device (1) includes a first metal wiring layer (11) formed on a substrate (10), an interlayer insulating film (12) formed on the first metal wiring layer (11), a second metal wiring layer (23) formed on the interlayer insulating film (12), a first resistor including a first resistance metal film (14a) formed between the first metal wiring layer (11) and the second metal wiring layer (23), a first insulating film (15a) formed on the first resistance metal film (14a), and a second resistance metal film (16a) formed on the first insulating film (15a), and a second resistor including a first resistance metal film (14b) formed between the first metal wiring layer (11) and the second metal wiring layer (23), a first insulating film (15b) formed on the first resistance metal film (14b), and a second resistance metal film (16b) formed on the first insulating film (15b).

A semiconductor structure can include a resistor on a substrate formed simultaneously with other devices, such as transistors. A diffusion barrier layer formed on a substrate is patterned to form a resistor and barrier layers under a transistor gate. A filler material, a first connector, and a second connector are formed on the resistor at the same manner and time as the gate of the transistor. The filler material is removed to form a resistor on a substrate.

A structure that includes a plurality of circular metal elements that are concentrically arranged and connected through a plurality of metal connectors, wherein the structure forms a circular resistor.

Resistor structures of stacked devices and methods of forming the same are provided. The, resistor structures may include a substrate, an upper semiconductor layer that may be spaced apart from the substrate in a vertical direction, a lower semiconductor layer that may be between the substrate and the upper semiconductor layer, and first and second resistor contacts that may be spaced apart from each other in a horizontal direction. At least one of the upper semiconductor layer, the lower semiconductor layer, and a portion of the substrate may contact the first and second resistor contacts.

A first pair of resistors formed in a first layer of material, and a second pair of resistors formed in the first layer or in a second layer can be wired into a Wheatstone bridge to form a temperature sensor. Either layer can include a semiconductor or a dielectric. In a semiconductor layer, a pair of resistors can be doped areas of the layer, while in a dielectric, a pair of resistors can be material deposited in cavities in the layer, such as material from an added middle-of-line (MOL) metallization layer.

In accordance with an embodiment, a semiconductor component and a method for manufacturing a semiconductor component are provided. A first dielectric material is formed over a body of semiconductor material of the first conductivity type and a plurality of semiconductor fingers are formed over the first of dielectric material. Semiconductor fingers of the plurality of semiconductor fingers spaced apart from each other and at least one of the semiconductor fingers has a first end spaced apart from a second end by a central region. A second dielectric material is formed over central region of the at least one semiconductor finger of the plurality of semiconductor fingers. An electrically conductive material is formed over the second dielectric material that is over the central region of the at least one semiconductor finger. The electrically conductive material serves as a shielding structure and the semiconductor material may be coupled to a fixed potential.