The present disclosure provides a method of manufacturing a light detecting device. The light detecting devices includes an insulating layer, a silicon layer, a light detecting layer, N first doped regions and M second doped regions. The silicon layer is disposed over the insulating layer. The light detecting layer is disposed over the silicon layer and extends within at least a portion of the silicon layer. The first doped regions have a first dopant type and are disposed within the light detecting layer. The second doped regions have a second dopant type and are disposed within the light detecting layer. The first doped regions and the second doped regions are alternatingly arranged. M and N are integers equal to or greater than 2.

There is room for improvement in the quality of diamond crystals used in radiation detectors produced using the conventional hetero-epitaxial method. The diamond crystal used for the radiation detector according to the present invention: is heteroepitaxially grown by means of chemical vapor deposition on a substrate comprising a material other than the diamond and having a plane orientation inclined by a predetermined off-angle from a just plane orientation; and has a crystallinity such that the full width half maximum of the diffraction peak of the (004) plane of the X-ray diffractometry represents a value shorter than or equal to 200 seconds.

There is room for improvement in the quality of diamond crystals used in radiation detectors produced using the conventional hetero-epitaxial method. The diamond crystal used for the radiation detector according to the present invention: is heteroepitaxially grown by means of chemical vapor deposition on a substrate comprising a material other than the diamond and having a plane orientation inclined by a predetermined off-angle from a just plane orientation; and has a crystallinity such that the full width half maximum of the diffraction peak of the (004) plane of the X-ray diffractometry represents a value shorter than or equal to 200 seconds.

A solar cell and a manufacturing method thereof, and a photovoltaic system. The solar cell includes: a substrate layer including a first surface and a second surface arranged oppositely along a thickness direction thereof; a tunnel oxide layer, a first doped polysilicon layer, and a first passivation layer sequentially arranged on the first surface of the substrate layer in a direction gradually away from the substrate layer; and a first finger electrode layer, at least one of the first fingers being arranged in first connection holes, bottoms of the first connection holes being located in the first doped polysilicon layer, and the first fingers passing through the first connection holes corresponding thereto to be electrically connected to the first doped polysilicon layer; and in the first direction, widths of the first connection holes being all less than widths of the first fingers corresponding to the first connection holes. While ensuring good electrical connection, the solar cell causes less damage and recombination to a passivation structure of the solar cell, and has high photoelectric conversion efficiency.

A solar cell and a manufacturing method thereof, and a photovoltaic system. The solar cell includes: a substrate layer including a first surface and a second surface arranged oppositely along a thickness direction thereof; a tunnel oxide layer, a first doped polysilicon layer, and a first passivation layer sequentially arranged on the first surface of the substrate layer in a direction gradually away from the substrate layer; and a first finger electrode layer, at least one of the first fingers being arranged in first connection holes, bottoms of the first connection holes being located in the first doped polysilicon layer, and the first fingers passing through the first connection holes corresponding thereto to be electrically connected to the first doped polysilicon layer; and in the first direction, widths of the first connection holes being all less than widths of the first fingers corresponding to the first connection holes. While ensuring good electrical connection, the solar cell causes less damage and recombination to a passivation structure of the solar cell, and has high photoelectric conversion efficiency.

A solar cell having a P-type silicon substrate where one main surface is a light-receiving surface and another is a backside, a plurality of back surface electrodes formed on a part of the backside, an N-type layer in at least a part of the light-receiving surface, and contact areas in which the substrate contacts the electrodes. The P-type silicon substrate is a silicon substrate doped with gallium and has a resistivity of 2.5 .Math.cm or less; and a back surface electrode pitch P.sub.rm [mm] of contact areas in which the P-type silicon substrate is in contact with the back surface electrodes and the resistivity R.sub.sub [.Math.cm] of the substrate satisfy the relation represented by the following formula (1).
log(R.sub.sub)log(P.sub.rm)+1.0(1)

A solar cell having a P-type silicon substrate where one main surface is a light-receiving surface and another is a backside, a plurality of back surface electrodes formed on a part of the backside, an N-type layer in at least a part of the light-receiving surface, and contact areas in which the substrate contacts the electrodes. The P-type silicon substrate is a silicon substrate doped with gallium and has a resistivity of 2.5 .Math.cm or less; and a back surface electrode pitch P.sub.rm [mm] of contact areas in which the P-type silicon substrate is in contact with the back surface electrodes and the resistivity R.sub.sub [.Math.cm] of the substrate satisfy the relation represented by the following formula (1).
log(R.sub.sub)log(P.sub.rm)+1.0(1)

A solar cell includes a light-receiving surface electrode formed on a light-receiving surface, a back surface electrode formed on a backside, and a CZ silicon single crystal substrate doped with gallium. The CZ silicon single crystal substrate contains 12 ppm or more oxygen atoms. A spiral oxygen-induced defect is not observed in an EL (electroluminescence) image of the solar cell.

A solar cell includes a light-receiving surface electrode formed on a light-receiving surface, a back surface electrode formed on a backside, and a CZ silicon single crystal substrate doped with gallium. The CZ silicon single crystal substrate contains 12 ppm or more oxygen atoms. A spiral oxygen-induced defect is not observed in an EL (electroluminescence) image of the solar cell.

Devices, methods and techniques related to photoconductive switches using diamond are disclosed. In one example aspect, a photoconductive apparatus includes a diamond layer positioned to receive a light. The diamond layer is doped with nitrogen. The apparatus also includes a first electrode coupled to the diamond layer to provide a first electrical contact for the diamond layer, and a second electrode coupled to the diamond layer to provide a second electrical contact for the diamond layer and configured to reflect the light back to the diamond layer. The first electrode and the second electrode are configured to establish an electric field across the diamond layer in response to receiving the light.