A method for manufacturing a semiconductor device includes providing a substrate structure having an active region, a gate insulating layer, a charge storage layer, a gate dielectric layer, and a gate layer sequentially formed on the active region. The method also includes forming a patterned metal layer on the substrate structure, removing a respective portion of the gate layer, the gate dielectric layer, the charge storage layer using the patterned metal gate layer as a mask to form multiple gate structures separated from each other by a space. The gate structures each include a stack containing a second portion of the charge storage layer, the gate dielectric layer, the gate layer, and one of the gate lines. The method further includes forming an interlayer dielectric layer on a surface of the gate structures stretching over the space while forming an air gap in the space.

An integrated circuit includes two different types of embedded memories, with cells that have different retention characteristics, and situated in different areas of the substrate. In some applications the cells are both non-volatile memories sharing a common gate layer but with different oxide layers, different thicknesses, etc. The first type of cell is a conventional flash cell which can be part of a logic/memory region, while the second type of cell uses capacitive coupling and can be located in a high voltage region. Because of their common features, the need for additional masks, manufacturing steps, etc. can be mitigated.

A semiconductor device is provided. The semiconductor device includes a substrate, a stacked gate structure, and a wall structure. The stacked gate structure is on the substrate and extending along a first direction. The wall structure is on the substrate and laterally aside the stacked gate structure. The wall structure extends along the first direction and a second direction perpendicular to the first direction. The stacked gate structure is overlapped with the wall structure in the first direction and the second direction.

A semiconductor device and a method of manufacturing a semiconductor device may be provided. The semiconductor device may include a source select line. The semiconductor device may include word lines. The semiconductor device may include a channel layer. The semiconductor device may include a source structure. The source structure may be disposed under the source select line. The source structure may be in contact with the channel layer.

A semiconductor memory device includes a semiconductor member extending in a first direction, a first interconnect extending in a second direction crossing the first direction, and a first electrode disposed between the semiconductor member and the first interconnect. A curvature radius of a corner portion facing the semiconductor member in the first electrode is larger than a curvature radius of a corner portion facing the first interconnect in the first electrode.

Provided is a method of manufacturing a memory device including following steps. A substrate including an active region and a periphery region. A stack layer is formed on the substrate. A first trench is formed in the substrate and the stack layer in the active region. A first isolation structure is formed in the first trench. An ion implantation process is performed to form a doped first isolation structure. A first wet etching process is performed to remove a portion of the doped first isolation structure, so that a first recess is formed on the doped first isolation structure. A protection layer is formed on the substrate to at least cover sidewalls of the first recess. A second wet etching process is performed to remove the protection layer and another portion of the doped first isolation structure and deepen the first recess. A SICONI etching process is performed.

A non-volatile memory cell and array structure is disclosed situated within a high voltage region of an integrated circuit. The cell utilizes capacitive coupling based on an overlap between a gate and a drift region to impart a programming voltage. Programming is effectuated using a drain extension which can act to inject hot electrons. The cell can be operated as a one-time programmable (OTP) or multiple-time programmable (MTP) device. The fabrication of the cell relies on processing steps associated with high voltage devices, thus avoiding the need for additional masks, manufacturing steps, etc.

A method is provided in which a monitor cell is made that is substantially identical to the flash memory cells of an embedded memory array. The monitor cell is formed simultaneously with the cells of the memory array, and so in certain critical aspects, is exactly comparable. An aperture is formed that extends through the control gate and intervening dielectric to the floating gate of the monitor cell. To prevent silicide contamination during a subsequent CMP process, a silicide protection layer (SPL), such as a resist protective oxide, is formed over exposed portions of the control gate prior to formation of a silicide contact formed on the floating gate. The SPL is formed simultaneously with existing manufacturing processes to avoid additional process steps.

A method of manufacturing a non-volatile memory is described. A substrate including a first region and a second region located at periphery of the first region is provided. A plurality of stacked structures are formed on the first region of the substrate. A wall structure is formed on the second region of the substrate. A conductive layer is formed over the substrate. A bottom anti-reflective coating is formed over the conductive layer. The bottom anti-reflective coating and the conductive layer are etched back. The conductive layer is patterned.

A semiconductor device and a method of manufacturing a semiconductor device may be provided. The semiconductor device may include a source select line. The semiconductor device may include word lines. The semiconductor device may include a channel layer. The semiconductor device may include a source structure. The source structure may be disposed under the source select line. The source structure may be in contact with the channel layer.