A method of forming a non-volatile memory cell on a substrate having memory cell and logic circuit regions by forming a pair of conductive floating gates in the memory cell region, forming a first source region in the substrate between the pair of floating gates, forming a polysilicon layer in both regions, forming an oxide layer over the polysilicon layer in the logic circuit region, performing a chemical-mechanical polish of the polysilicon layer in the memory cell area leaving a first block of the polysilicon layer between the floating gates that is separated from remaining portions of the polysilicon layer, and selectively etching portions of the polysilicon layer to result in: second and third blocks of the polysilicon layer disposed in outer regions of the memory cell area, and a fourth block of the polysilicon layer in the logic circuit region.

A method of forming a non-volatile memory cell on a substrate having memory cell and logic circuit regions by forming a pair of conductive floating gates in the memory cell region, forming a first source region in the substrate between the pair of floating gates, forming a polysilicon layer in both regions, forming an oxide layer over the polysilicon layer in the logic circuit region, performing a chemical-mechanical polish of the polysilicon layer in the memory cell area leaving a first block of the polysilicon layer between the floating gates that is separated from remaining portions of the polysilicon layer, and selectively etching portions of the polysilicon layer to result in: second and third blocks of the polysilicon layer disposed in outer regions of the memory cell area, and a fourth block of the polysilicon layer in the logic circuit region.

Embodiments of the invention are directed to methods of fabricating devices on a substrate. A non-limiting example of the method includes performing memory fabrication operations to form a non-volatile memory device in a first region of the substrate, wherein the memory fabrication operations include forming a first region of a nanosheet stack over the first region of the substrate. The first region of the nanosheet stack includes nanosheet layers of a first type of semiconductor material alternating with nanosheet layers of a second type of semiconductor material. A first portion of the first region of the nanosheet stack is replaced with a control gate of the non-volatile memory device, and a charge trapping region of the non-volatile memory device is provided under the control gate.

The present disclosure relates to a method of forming an integrated circuit (IC). In some embodiments, a substrate is provided comprising a memory region and a logic region disposed adjacent to the memory region. The memory region comprises a non-volatile memory (NVM) device having a control gate electrode and a select gate electrode disposed between two neighboring source/drain regions over a substrate. The control gate electrode and the select gate electrode comprise polysilicon. The logic region comprises a logic device including a metal gate electrode disposed between two neighboring source/drain regions over a logic gate dielectric and having bottom and sidewall surfaces covered by a high-k gate dielectric layer.

A semiconductor device comprises a peripheral circuit region provided on a first substrate and including circuit devices and a contact plug extending on the first substrate in a vertical direction; a memory cell region provided on a second substrate disposed above the first substrate and including memory cells; and a through insulating region penetrating through the second substrate on the contact plug and covering an upper surface of the contact plug.

A memory device includes a first state transistor and a second state transistor having a common control gate. A first selection transistor is buried in the semiconductor body and coupled to the first state transistor so that current paths of the first selection transistor and first state transistor are coupled in series. A second selection transistor is buried in the semiconductor body and coupled to the second state transistor so that current paths of the second selection transistor and second state transistor are coupled in series. The first and second selection transistors have a common buried selection gate. A dielectric region is located between the common control gate and the semiconductor body. A first bit line is coupled to the first state transistor and a second bit line is coupled to the second state transistor.

A method of forming a semiconductor device where memory cells and some logic devices are formed on bulk silicon while other logic devices are formed on a thin silicon layer over insulation over the bulk silicon of the same substrate. The memory cell stacks, select gate poly, and source regions for the memory devices are formed in the memory area before the logic devices are formed in the logic areas. The various oxide, nitride and poly layers used to form the gate stacks in the memory area are formed in the logic areas as well. Only after the memory cell stacks and select gate poly are formed, and the memory area protected by one or more protective layers, are the oxide, nitride and poly layers used to form the memory cell stacks removed from the logic areas, and the logic devices are then formed.

Various embodiments of the present application are directed to an IC, and associated forming methods. In some embodiments, the IC comprises a memory region and a logic region integrated in a substrate. A plurality of memory cell structures is disposed on the memory region. A plurality of logic devices is disposed on the logic region. A sidewall spacer is disposed along a sidewall surface of the logic devices, but not disposed along a sidewall surface of the memory cell structures. Thus, the inter-layer dielectric (ILD) fill-in window between adjacent memory cell structures is enlarged, compared to the approaches where the sidewall spacer is concurrently formed in both memory region and the logic region. Thereby, voids formation would be reduced or eliminated, and device quality would be improved.

Methods for preventing step-height difference of flash and logic gates in FinFET devices and related devices are provided. Embodiments include forming fins in flash and logic regions; recessing an oxide exposing an upper portion of the fins; forming an oxide liner over the upper portion in the flash region; forming a polysilicon gate over and perpendicular to the fins in both regions; removing the gate from the logic region and patterning the gate in the flash region forming a separate gate over each fin; forming an ONO layer over the gates in the flash region; forming a second polysilicon gate over and perpendicular to the fins in both regions; planarizing the second polysilicon gate exposing a portion of the ONO layer over the gates in the flash region; forming and patterning a hardmask, exposing STI regions between the flash and logic regions; and forming an ILD over the STI regions.

A method for manufacturing a semiconductor device includes providing a substrate structure having an active region, a gate insulating layer, a charge storage layer, a gate dielectric layer, and a gate layer sequentially formed on the active region. The method also includes forming a patterned metal layer on the substrate structure, removing a respective portion of the gate layer, the gate dielectric layer, the charge storage layer using the patterned metal gate layer as a mask to form multiple gate structures separated from each other by a space. The gate structures each include a stack containing a second portion of the charge storage layer, the gate dielectric layer, the gate layer, and one of the gate lines. The method further includes forming an interlayer dielectric layer on a surface of the gate structures stretching over the space while forming an air gap in the space.