A semiconductor device includes a source region, a drain region, and a gate insulating film formed on a substrate, a gate electrode formed on the gate insulating film, a first insulating film pattern formed to extend from the source region to a part of a top surface of the gate electrode, and a spacer formed on a side surface of the gate electrode in a direction of the drain region.

A semiconductor device including: a first level including: a first silicon layer including a first single crystal silicon layer; first transistors each including a single-crystal channel; a first metal layer connected to the first transistors and the second metal layer; a third metal layer connected to the second metal layer; a second level including second transistors; a third level including third transistors, the third level is disposed over the second level which is disposed over the first level; a fifth metal layer disposed over a fourth metal layer disposed over the third level; and a via disposed through the second level, where at least one of the second transistors includes a metal gate, where the device includes at least one temperature sensor, and where at least one element within at least one of the second transistors has been processed independently of the third transistors.

Embodiments relate to a semiconductor device including a body made of a first conducting semiconductor material, a source and a drain made of a second conducting semiconductor material and formed on the body, a first gate formed on the body with a gate insulating layer interposed between the first gate and the body, a second gate formed opposite the first gate with respect to the body, and an insulating layer stack having a charge storage layer formed between the body and the second gate, and a method for controlling a synapse weight of a target semiconductor device within a neural network including semiconductor devices.

A semiconductor device includes an input/output cell, an IO power supply cell, a core power supply cell, and a core logic circuit arranged on a chip, and the core power supply cell includes an ESD protection circuit. The input/output cell includes a level shifter circuit and the level shifter circuit is arranged in the input/output cell. The core logic circuit is arranged outside the input/output cell. The core power supply cell is not arranged in the same row as the input/output cell, but is arranged in a third region provided between a first region in which the input/output cell and the IO power supply cell are arranged and a second region in which the core logic circuit is arranged.

Systems, apparatuses, and methods for placing cells in an integrated circuit are described. In various embodiments, an integrated circuit is divided into many partitions. In a first set of partitions susceptible to transistor latch-up, the many transistor gate stripes are connected to one of the power rails rather than left floating. The lengths of the transistor gate stripes are shortened for well tap cells in the first partition, but increased in a second partition susceptible for poor signal integrity. One or more implant layers are formed underneath the transistor gate stripes in each of the first and second partitions to adjust an amount of protection against transistor latch-up and poor signal integrity. An electrostatic discharge transistor is included with at least one source region of multiple source regions formed in a well with a same doping polarity as the at least one source region.

The present disclosure provides a semiconductor device and an electrostatic discharge (ESD) clamp circuit. The semiconductor device includes a voltage divider, a cascoded inverter, and a discharge circuit. The voltage divider is electrically coupled between a power supply voltage and an output voltage of the semiconductor device. The cascoded inverter is electrically coupled to the voltage divider. The discharge circuit is electrically coupled to the cascoded inverter. The cascoded inverter is configured to turn on the discharge circuit to discharge an electrostatic discharge (ESD) current in response to an ESD event occurring on the power supply voltage or the output voltage when the semiconductor device is in an ESD mode.

The present disclosure provides a semiconductor device and an electrostatic discharge (ESD) clamp circuit. The semiconductor device includes a voltage divider, a cascoded inverter, and a discharge circuit. The voltage divider is electrically coupled between a power supply voltage and an output voltage of the semiconductor device. The cascoded inverter is electrically coupled to the voltage divider. The discharge circuit is electrically coupled to the cascoded inverter. The cascoded inverter is configured to turn on the discharge circuit o discharge an electrostatic discharge (ESD) current in response to an ESD event occurring on the power supply voltage or the output voltage when the semiconductor device is in an ESD mode.

An electronic device comprising a substrate, an electronic element, a driving element, a plurality of first traces, a plurality of second traces and an electrostatic discharge protection element is provided. The substrate comprises a first surface and a second surface, wherein the first surface is opposite to the second surface. The electronic element is disposed on the first surface. The driving element is disposed on the second surface. The plurality of first traces are disposed on the first surface. The plurality of second traces are disposed on the second surface and are electrically connected to the driving element. The electrostatic discharge protection element is disposed on the first surface, and is electrically connected to the electronic element, wherein the electrostatic discharge protection element is electrically connected to the driving element through one of the plurality of first traces and one of the plurality of second traces.

A semiconductor structure according to the present disclosure includes a substrate; a through substrate via (TSV) cell over the substrate; and a TSV extending through the TSV cell and the substrate. The TSV cell includes a guard ring structure extending around a perimeter of the TSV cell, and a buffer zone surrounded by the guard ring. The buffer zone includes first dummy transistors, and second dummy transistors. Each of the first dummy transistors includes two first type epitaxial features, a first plurality of nanostructures extending between the two first type epitaxial features, and a first isolation gate structure wrapping over the first plurality of nanostructures. Each of the second dummy transistors includes two second type epitaxial feature, a second plurality of nanostructures extending between the two second type epitaxial features, and a second isolation gate structure wrapping over the second plurality of nanostructures.

A circuit device includes core circuitry. The circuit device further includes a first plurality of guard rings having a first dopant type, wherein the first plurality of guard rings is around a periphery of the core circuitry. The circuit device further includes a second plurality of guard rings having a second dopant type, wherein the second dopant type is opposite to the first dopant type, and at least one guard ring of the second plurality of guard rings is around a periphery of at least one guard ring of the first plurality of guard rings.