A manufacture includes a polysilicon structure over a portion of a substrate. The manufacture further includes a spacer on a sidewall of the polysilicon structure, wherein the spacer has a concave corner region between an upper portion and a lower portion, the spacer has an outer sidewall and an inner sidewall, and the inner sidewall is between the outer sidewall and the polysilicon structure. The manufacture further includes a protective layer exposing a portion of the outer sidewall of the spacer above the concave corner region, wherein the protective layer covers an entirety of the lower portion of the spacer, and the protective layer directly contacts the substrate.