A radio frequency (RF) front-end (RFFE) device includes a die having a front-side dielectric layer on an active device. The active device is on a first substrate. The RFFE device also includes a microelectromechanical system (MEMS) device. The MEMS device is integrated on the die at a different layer than the active device. The MEMS device includes a cap layer composed of a cavity in the front-side dielectric layer of the die. The cavity in the front-side dielectric layer is between the first substrate and a second substrate. The cap is coupled to the front-side dielectric layer.

Provided is a sensor interface including a first cantilever beam bundle including at least one resonator and a first output terminal, a second cantilever beam bundle including at least one resonator and a second output terminal, and a differential amplifier including a first input terminal electrically connected to the first output terminal of the first cantilever beam bundle and a second input terminal electrically connected to the second output terminal of the second cantilever beam bundle.

A heterostructure includes a substrate exhibiting a piezoelectric effect, and a magnetostrictive film supported by the substrate. The magnetostrictive film includes an iron-gallium alloy. The iron-gallium alloy has a gallium composition greater than 20%.

Embodiments of a single-chip ScAIN tunable filter bank include a plurality of switching elements, and a plurality of channel filters integrated on a monolithic platform. The monolithic platform may comprise a single crystal base and each of the switching elements may comprise at least one of a scandium aluminum nitride (ScAIN) or other Group III-Nitride transistor structure fabricated on the single crystal base. In these embodiments, each channel filter comprises a multi-layered ScAIN structure comprising one or more a single-crystal epitaxial ScAIN layers fabricated on the single crystal base. The ScAIN layers for each channel filter may be based on desired frequency characteristics of an associated one of the RF channels.

Ultrasonic sensing approaches are described with integrated MEMS-CMOS implementations. Embodiments include ultrasonic sensor arrays for which PMUT structures of individual detector elements are at least partially integrated into the CMOS ASIC wafer. MEMS heating elements are integrated with the PMUT structures by integrating under the PMUT structures in the CMOS wafer and/or over the PMUT structures (e.g., in the protective layer). For example, embodiments can avoid wafer bonding and can reduce other post processing involved with conventional manufacturing of PMUT ultrasonic sensors, while also improving thermal response.

Embodiments disclosed herein include resonators and methods of forming such resonators. In an embodiment a resonator comprises a substrate, where a cavity is disposed into a surface of the substrate, and a piezoelectric film suspended over the cavity. In an embodiment, the piezoelectric film has a first surface and a second surface opposite from the first surface, and the piezoelectric film is single crystalline and has a thickness that is 0.5 μm or less. In an embodiment a first electrode is over the first surface of the piezoelectric film, and a second electrode is over the second surface of the piezoelectric film.

A structure and method for integrating a crystal resonator with a control circuit are disclosed. The crystal resonator is integrated with both the control circuit (110) and a semiconductor die (900) on a single device wafer (100) through forming a piezoelectric vibrator (500) on, and bonding the semiconductor die (900) to, a back side of the device wafer (100). This allows an increased degree of integration of the crystal resonator and on-chip modulation of its parameters. Compared with traditional crystal resonators, the disclosed crystal resonator is more compact in size and hence less power-consuming.

A structure and method for integrating a crystal resonator with a control circuit are disclosed. The resonator is formed by forming a lower cavity (120) in the device wafer (100) containing the control circuit (110) and a piezoelectric vibrator (200) on a front side (100U) of the device wafer (100) and by fabricating a cap layer (420) using planar fabrication processes, which encloses the piezoelectric vibrator (200) within an upper cavity (400). In addition, a semiconductor die (500) may be bonded to a back side (100D) of the device wafer (100), helping in additionally increasing the integration of the crystal resonator and allowing on-chip modulation of the crystal resonator's parameters. In this way, in addition to being able to integrate with other semiconductor components more easily with a higher degree of integration, the crystal resonator is more compact in size and less power-consuming.

A structure and method for integrating a crystal resonator with a control circuit are disclosed. A piezoelectric vibrator (500) is formed on a back side of a device wafer (100) containing the control circuit, and planar fabrication processes are utilized to form a cap layer (720) which encloses the piezoelectric vibrator (500) within an upper cavity (700). Additionally, a semiconductor die (900) can be bonded to a front side of the device wafer (100). In addition to an increased degree of integration of the crystal resonator due to such integration with both the control circuit (110) and the semiconductor die (900), this also allows on-chip modulation of the crystal resonator's parameters. Moreover, compared with traditional crystal resonators, the resulting crystal resonator is more compact in size and hence less power-consuming.

An embodiment of the present invention discloses an array substrate, a method of fabricating the same, and a display panel. Compared with the conventional technology, the present invention combines a sensing material with thin film transistors to prepare a sensing layer on the thin film transistors, and since the thin film transistors can be formed by a large-area preparation, the sensors can be formed by a large-area preparation accordingly, thereby improving a performance of the sensors and reducing the production cost of the sensors.