A semiconductor device includes a substrate, a thermal conduction layer on the substrate, a first wire pattern on the thermal conduction layer, a first semiconductor pattern a second semiconductor pattern, and a gate electrode between the first semiconductor pattern and the second semiconductor pattern. The gate electrode surrounds a periphery of the first wire pattern. A concentration of impurity of the thermal conduction layer is different from that of the substrate. The first wire pattern includes a first end and a second end. The concentration of impurity contained in the first wire pattern is higher than that contained in the thermal conduction layer and that contained in the substrate. The first semiconductor pattern is in contact with the first end of the first wire pattern and the thermal conduction layer. The second semiconductor pattern is in contact with the second end of the first wire pattern.

A semiconductor device which is capable of operating at an operation frequency f, includes a substrate, a first element unit and a second element unit. The substrate has a thermal diffusion coefficient D. The first element unit is formed on the substrate. The first element includes a first active element. The second element unit is adjacent to the first element unit on the substrate. The second element includes a second active element. The second active element acts on a different timing from the first active element. Moreover, a distance of between a first gravity center of the first element unit and a second gravity center of the second element unit is equal to or less than twice of a thermal diffusion length (D/f).sup.1/2.

A semiconductor device includes a plurality of die pad sections, a plurality of semiconductor chips, each of which is arranged in each of the die pad sections, a resin encapsulation portion having a recess portion for exposing at least a portion of the die pad sections, the resin encapsulation portion configured to cover the die pad sections and the semiconductor chips, and a heat radiation layer arranged in the recess portion. The heat radiation layer includes an elastic layer exposed toward a direction in which the recess portion is opened. The heat radiation layer directly faces at least a portion of the die pad sections. The elastic layer overlaps with at least a portion of the die pad sections when seen in a thickness direction of the heat radiation layer.

Methods, systems, and apparatus, including an integrated circuit (IC) with a ring-shaped hot spot area. In one aspect, an IC includes a first area along an outside perimeter of a surface of the IC. The first area defines a first inner perimeter. The IC includes a second area that includes a center of the IC and that includes a first set of components. The second area defines a first outer. The IC includes a ring-shaped hot spot area between the first area and the second area. The ring-shaped hot spot area defines a ring outer perimeter that is juxtaposed with the first inner perimeter. The ring-shaped hot spot area defines a ring inner perimeter that is juxtaposed with the first outer perimeter. The ring-shaped hot spot area includes a second set of components that produce more heat than the first set of components.

Integrated circuit dies, systems, devices, and techniques, are described herein related to embedding a thermal solution into an integrated circuit die to heat the integrated circuit die when deployed in sub-zero environments, techniques for operating the thermal solution in a system, and techniques for fabricating the embedded thermal solution. The thermal solution includes a resistive heating element having the same material and substantially coplanar with components of devices of the integrated circuit die.

A thermal control circuit is described. The thermal control circuit includes a heating element disposed within an electronic circuit board having a semiconductor chip disposed thereon. The thermal control circuit includes a power management integrated circuit coupled to the heating element. The power management integrated circuit is to enable the heating element to heat the semiconductor chip at least to the semiconductor chips' lowest rated operating temperature prior to the semiconductor chip being placed in a fully operational state.

A power device includes high electron mobility transistors formed on an active layer, each transistor comprising a source finger, a drain finger and a gate finger, a source contact common to the source fingers, a drain contact common to the drain fingers, and a gate contact common to the gate fingers. At least one gate finger is not connected to the gate contact and forms a Schottky contact with the active layer. This gate finger forms, with the neighbouring drain finger, a Schottky diode configured to measure an operating temperature within the power device.

A semiconductor device including a transistor section and a diode section, the semiconductor device having: a temperature sensing section; a neighboring transistor section adjacent to the temperature sensing section; a neighboring diode section adjacent to the temperature sensing section; and a first non-neighboring diode section that is not adjacent to the temperature sensing section, wherein the first non-neighboring diode section has a pattern different from the pattern of the neighboring diode section in the top view is provided.

A thin film resistor is provided, and a resistance layer of the thin film resistor is a patternized mesh. The mesh density of the mesh resistance layer increases from center to both ends of the film resistor. The temperature peak is shifted from the center to both ends of the film resistor. Therefore, the heat can be quickly dissipated via the electrodes.