An ESD protection semiconductor device includes a substrate, a gate set formed on the substrate, a source region and a drain region formed in the substrate respectively at two sides of the gate set, at least a first doped region formed in the source region, and at least a second doped region formed in the drain region. The source region, the drain region and the second doped region include a first conductivity type, and the first doped region includes a second conductivity type. The first conductivity type and the second conductivity type are complementary to each other. The second doped region is electrically connected to the first doped region.

A semiconductor device and device arrangement including a plurality of semiconductor regions of different conductivity types and a plurality of gates which form electrically conducting paths between the semiconductor regions. The semiconductor device and device arrangement may be configured to protect against electrostatic discharge.

The invention provides a semiconductor device layout structure disposed in an active region. The semiconductor device layout structure includes a first well region having a first conduction type. A second well region having a second conduction type opposite the first conduction type is disposed adjacent to and enclosing the first well region. A first doped region having the second conduction type is disposed within the first well region. A second doped region having the second conduction type is disposed within the first well region. The second doped region is separated from and surrounds the first doped region. A third doped region having the second conduction type is disposed within the second well region.

An electrostatic discharge (ESD) protection device includes a semiconductor substrate, a base region in the semiconductor substrate and having a first conductivity type, an emitter region in the base region and having a second conductivity type, a collector region in the semiconductor substrate, spaced from the base region, and having the second conductivity type, a breakdown trigger region having the second conductivity type, disposed laterally between the base region and the collector region to define a junction across which breakdown occurs to trigger the ESD protection device to shunt ESD discharge current, and a gate structure supported by the semiconductor substrate over the breakdown trigger region and electrically tied to the base region and the emitter region. The lateral width of the breakdown trigger region is configured to establish a voltage level at which the breakdown occurs.

A semiconductor device is described, including a substrate including a first area and a second area, a first MOS element of a first conductivity type in the first area, and a second MOS element of the first conductivity type in the second area. The first area is closer to a pick-up region of the substrate than the second area. The substrate has a second conductivity type. The bottom depth of a first electrical conduction path in the substrate in the first area is smaller than that of a second electrical conduction path in the substrate in the second area.

A snapback electrostatic discharge (ESD) protection circuit includes a first well in a substrate, a drain region of a transistor, a source region of the transistor, a gate region of the transistor, and a second well embedded in the first well. The first well has a first dopant type. The drain region is in the first well, and has a second dopant type different from the first dopant type. The source region is in the first well, has the second dopant type, and is separated from the drain region in a first direction. The gate region is over the first well and the substrate. The second well is embedded in the first well, and is adjacent to a portion of the drain region. The second well has the second dopant type.

This application relates to a charging protection circuit. The charging protection circuit implements overcurrent protection by using a four-terminal NMOS switching transistor. In the solution provided in this application, floating management is performed on a Sub port of the four-terminal NMOS switching transistor. Specifically, when the four-terminal NMOS switching transistor is turned on, potential of the Sub port is pulled up, to avoid an excessively large internal resistance of the four-terminal NMOS switching transistor caused by an excessively large voltage between the Sub port and a drain of the four-terminal NMOS switching transistor. In addition, this application further provides a charging circuit and an electronic device.

A semiconductor device includes first and second transistors electrically connected in series, third and fourth transistors electrically connected in series, and first and second diodes. A body and a source of the first transistor are connected to a first reference node, and are electrically disconnected from a body of the second transistor. Gates of the first and second transistors are configured to receive a first control signal. Drains of the second and fourth transistors are connected to an input/output node. A body and a source of the third transistor are connected to a second reference node, and are electrically disconnected from a body of the fourth transistor. Gates of the third and fourth transistors are connected to receive a second control signal. The first diode is connected between the input/output node and the first reference node. The second diode is connected between the input/output node and the second reference node.

A semiconductor device including a first transistor and a second transistor. The first transistor has a first body. The first body of the first transistor is connected to receive a first reference voltage. The second transistor has a second body. The second body of the second transistor is electrically disconnected from the first body of the first transistor. The first transistor and the second transistor are electrically connected in series.