Horizontal motion conveyors for moving material and methods for reversing such horizontal motion conveyors are disclosed. In some embodiments, the horizontal motion conveyor includes a motor such as a servomotor that is connected to the driveshaft that drives the horizontal motion of the conveyor. In some embodiments, the speed profile of the pan may be changed to reverse direction of the flow of material on the pan without slowing or stopping the drive motor.

Horizontal motion conveyors for moving material are disclosed. The horizontal motion conveyor includes multiple drives. The second drive may float relative to the first drive. The conveyor may be made successively longer by including additional floating drives. Each drive may include a motor such as a servomotor that is connected to the driveshaft that drives the horizontal motion of the conveyor. A control system may control the rotation and positioning of the shafts.

Horizontal motion conveyors for moving material are disclosed. The horizontal motion conveyor includes multiple drives. The second drive may float relative to the first drive. The conveyor may be made successively longer by including additional floating drives. Each drive may include a motor such as a servomotor that is connected to the driveshaft that drives the horizontal motion of the conveyor. A control system may control the rotation and positioning of the shafts.

Methods and apparatuses to activate, modify, and sanitize the surfaces of granular, powdered, or seed material placed in a continuous flow of a low-temperature, reduced-pressure gas plasma. Said plasma may be created with radio-frequency power, using capacitive-inductive, or a combination of both types of discharge. The plasma is generated at pressures in the 0.01 to 10 Torr range. RF frequency ranges from 0.2 to 220 MHz, and correspond to a plasma density between about n.sub.e10.sup.8n.sub.e10.sup.12 or 0.001 to 0.4 W/cm.sup.3. Inserts and electrodes may be temperature controlled to control process conditions. RF discharge may be pulsed or modulated by different frequency in order to stimulate energy exchange between gas plasma and process material. The apparatuses may be grounded, biased and mechanically activated (e.g., vibration, rotation, etc.).

Methods and apparatuses to activate, modify, and sanitize the surfaces of granular, powdered, or seed material placed in a continuous flow of a low-temperature, reduced-pressure gas plasma. Said plasma may be created with radio-frequency power, using capacitive-inductive, or a combination of both types of discharge. The plasma is generated at pressures in the 0.01 to 10 Torr range. RF frequency ranges from 0.2 to 220 MHz, and correspond to a plasma density between about n.sub.e10.sup.8n.sub.e10.sup.12 or 0.001 to 0.4 W/cm.sup.3. Inserts and electrodes may be temperature controlled to control process conditions. RF discharge may be pulsed or modulated by different frequency in order to stimulate energy exchange between gas plasma and process material. The apparatuses may be grounded, biased and mechanically activated (e.g., vibration, rotation, etc.).

Horizontal motion conveyors for moving material and methods for reversing such horizontal motion conveyors are disclosed. In some embodiments, the horizontal motion conveyor includes a motor such as a servomotor that is connected to the driveshaft that drives the horizontal motion of the conveyor. In some embodiments, the speed profile of the pan may be changed to reverse direction of the flow of material on the pan without slowing or stopping the drive motor.

Horizontal motion conveyors for moving material and methods for reversing such horizontal motion conveyors are disclosed. In some embodiments, the horizontal motion conveyor includes a motor such as a servomotor that is connected to the driveshaft that drives the horizontal motion of the conveyor. In some embodiments, the speed profile of the pan may be changed to reverse direction of the flow of material on the pan without slowing or stopping the drive motor.

Methods and apparatuses to activate, modify, and sanitize the surfaces of granular, powdered, or seed material placed in a continuous flow of a low-temperature, reduced-pressure gas plasma. Said plasma may be created with radio-frequency power, using capacitive-inductive, or a combination of both types of discharge. The plasma is generated at pressures in the 0.01 to 10 Torr range. RF frequency ranges from 0.2 to 220 MHz, and correspond to a plasma density between about n.sub.e10.sup.8-n.sub.e10.sup.12 or 0.001 to 0.4 W/cm.sup.3. Inserts and electrodes may be temperature controlled to control process conditions. RF discharge may be pulsed or modulated by different frequency in order to stimulate energy exchange between gas plasma and process material. The apparatuses may be grounded, biased and mechanically activated (e.g., vibration, rotation, etc.).

Methods and apparatuses to activate, modify, and sanitize the surfaces of granular, powdered, or seed material placed in a continuous flow of a low-temperature, reduced-pressure gas plasma. Said plasma may be created with radio-frequency power, using capacitive-inductive, or a combination of both types of discharge. The plasma is generated at pressures in the 0.01 to 10 Torr range. RF frequency ranges from 0.2 to 220 MHz, and correspond to a plasma density between about n.sub.e10.sup.8-n.sub.e10.sup.12 or 0.001 to 0.4 W/cm.sup.3. Inserts and electrodes may be temperature controlled to control process conditions. RF discharge may be pulsed or modulated by different frequency in order to stimulate energy exchange between gas plasma and process material. The apparatuses may be grounded, biased and mechanically activated (e.g., vibration, rotation, etc.).

Raw material devices, systems that incorporate raw material delivery devices, and methods of supplying raw material using the raw material devices. A raw material delivery device includes a hollow body comprising a first end and a second end, the second end disposed above the first end in a system vertical direction, an inlet disposed at the first end of the hollow body, an outlet disposed at the second end of the hollow body, and a stepped passageway disposed within the hollow body between the inlet and the outlet. The stepped passageway is configured to deliver raw material via one or more steps from the inlet to the outlet.