The present invention relates to a molding die comprising a base portion and a pattern portion having recesses and protrusions provided on a surface of the base portion, wherein a distance between the centers of protruding portions of the pattern portion is 15 to 50 nm, a ratio of recessed and protruding portion (protrusion/distance between centers of the protruding portions) of the pattern portion is 0.5 or less, a height of the protruding portion of the pattern portion is 2 nm or more, and a defect density of the pattern portion is 10×10.sup.10 cm.sup.2 or less. The present invention also relates to a lens comprising a base portion and a pattern portion having recesses and protrusions provided on a surface of the base portion, wherein a distance between centers of protruding portions of the pattern portion is 15 to 50 nm.

A surface enhanced luminescence (SELS) sensor may include a substrate and nano fingers projecting from the substrate. Each of the nano fingers may include a polymer pillar having a sidewall and a top, a coating layer covering the sidewall and a metal cap supported by and in contact with the top of the pillar.

A MEMS microphone includes a base comprising a back cavity and a capacitive system provided on the base. The capacitive system includes a diaphragm and a back plate spaced from the diaphragm for forming a cavity with the diaphragm. The back plate is provided with an electrode layer. An isolation groove is provided on the back plate for separating the electrode layer into an induction electrode and a floating motor. In the invention the induction electrode is separated from the floating electrode by the isolation groove to avoid the influence of the parasitic capacitance generated by the floating electrode on the MEMS microphone when the MEMS microphone is powered and working.

The present invention provides a MEMS microphone, having a base and a capacitive system provided on the base. The capacitive system includes a diaphragm and a back plate. The MEMS microphone is further provided with s a supporting frame located between the back plate and the diaphragm. One end of the supporting frame is connected with the back plate, and the other end is connected with the diaphragm. The supporting frame divides the cavity into a first cavity body and a second cavity body. The supporting frame is provided with a connection channel. During the production process of the lo MEMS microphone, the etchant enters the first cavity body, and then enters the second cavity body, which prevents oxides from remaining in the microphone product and affecting the use of MEMS microphone.

A robust and general fabrication/manufacturing method is described herein for the fabrication of periodic three-dimensional (3D) hierarchical nanostructures in a highly scalable and tunable manner. This nanofabrication technique exploits the selected and repeated etching of spherical particles that serve as resist material and that can be shaped in parallel for each processing step. The method enables the fabrication of periodic, vertically aligned nanotubes at the wafer scale with nanometer-scale control in three dimensions including outer/inner diameters, heights/hole-depths, and pitches. The method was utilized to construct 3D periodic hierarchical hybrid silicon and hybrid nanostructures such as multi-level solid/hollow nanotowers where the height and diameter of each level of each structure can be configured precisely as well as 3D concentric plasmonic supported metal nanodisk/nanorings with tunable optical properties on a variety of substrates.

A contact having a first contact member having an exposed surface, the exposed surface having irregularities, undulations, or asperities that form one or more high points and low points on the exposed surface, a second contact member having a contact base surface, a plurality of electrically conductive flexures extending from the contact base surface, and when the first contact member is positioned adjacent to the second contact member in a closed position in which the contact base surface of the second contact member is not in electrical contact with the one or more high points on the exposed surface of the first contact member, each flexure of the plurality of flexures is in electrical contact with the exposed surface of the first contact member.

Embodiments disclosed herein include lithographic patterning systems for non-orthogonal patterning and devices formed with such patterning. In an embodiment, a lithographic patterning system comprises an actinic radiation source, where the actinic radiation source is configured to propagate light along an optical axis. In an embodiment, the lithographic patterning system further comprises a mask mount, where the mask mount is configurable to orient a surface of a mask at a first angle with respect to the optical axis. In an embodiment, the lithographic patterning system further comprises a lens module, and a substrate mount, where the substrate mount is configurable to orient a surface of a substrate at a second angle with respect to the optical axis.

In an example, a wet cleaning process is performed to clean a structure having features and openings between the features while preventing drying of the structure. After performing the wet cleaning process, a polymer solution is deposited in the openings while continuing to prevent any drying of the structure. A sacrificial polymer material is formed in the openings from the polymer solution. The structure may be used in semiconductor devices, such as integrated circuits, memory devices, MEMS, among others.

Microdevices containing a chamber bound on one side by a nanoporous membrane are provided. The nanoporous membrane may contain hollow nanotubes that extend through the nanoporous membrane, from one surface to the other, and extend beyond the surface of the nanoporous membrane opposite the surface interfacing with the chamber. The nanotubes may provide a fluidic conduit between an environment external to the microdevice and the chamber, which is otherwise substantially fluid-tight. Also provided are methods of making a microdevice and methods of using the microdevices.

A method for fabricating a fluidic device includes depositing a sacrificial material on a pillar array arranged on a substrate. The method also includes removing a portion of the sacrificial material. The method further includes depositing a sealing layer on the pillar array to form a sealed fluidic cavity.