Described herein are antireflective materials and methods of making antireflective materials. The material can include a plurality of hierarchical nanostructures on abase substrate and a total specular reflection of less than 3% at a wavelength of about 400 nm to about 1100 nm. The material can have an etched polyimide layer disposed on the superior surface of the hierarchical nanostructures. The materials can also have superhydrophobic characteristics.