Patent classifications
B81C1/00206
Semiconductor device and method of producing a semiconductor device
A method of producing a semiconductor device includes providing a carrier structure having a semiconductor substrate; applying or introducing a precursor substance onto or into the carrier structure, treating the precursor substance for producing a porous matrix structure; introducing a functionalization substance into the porous matrix structure.
Method for manufacturing flow path device
A method for manufacturing a flow path device internally provided with a flow path for allowing a liquid to flow by compression bonding two or more members to each other, in which the hydrophilic property of a surface of the flow path can be maintained for a long period of time. A flow path device is manufactured by forming a hydrophilic coating film using a treatment liquid including a hydrophilizing agent in at least one member, the coating film covering a surface of the member at a side to be joined to another member, then irradiating only a joining surface of the coating film with ultraviolet rays or plasma derived from an oxygen-containing gas in the member having the coating film, and irradiating at least the joining surface with ultraviolet rays or plasma derived from an oxygen-containing gas in a member having no coating film, and compression bonding the two or more members.
Covalently modified surfaces, kits, and methods of preparation and use
In biosciences and related fields, it can be useful to modify surfaces of apparatuses, devices, and materials that contact biomaterials such as biomolecules and biological micro-objects. Described herein are surface modifying and surface functionalizing reagents, preparation thereof, and methods for modifying surfaces to provide improved or altered performance with biomaterials.
Actively-controlled superhydrophobic surfaces
Active superhydrophobic surface structures are actively-controlled surface structures exhibiting a superhydrophobic state and an ordinary state. Active superhydrophobic surface structures comprise an outer elastomeric covering defining an exposed surface, a controlled group of MEMS (micro-electro-mechanical system) actuators at least covered by the elastomeric covering, and, a controlled region of the exposed surface corresponding to the controlled group. The controlled region has a superhydrophobic state in which the controlled region is textured. The controlled region also has an ordinary state in which the controlled region is smooth (i.e., less textured than in the superhydrophobic state). Active superhydrophobic surface structures may be part of an apparatus that includes a controller and/or one or more sensors. The controller, sensors, and the controlled region may form a feedback loop in which the active superhydrophobic surface is actively controlled.
Nonplanar patterned nanostructured surface and printing methods for making thereof
A method of applying a pattern to a nonplanar surface. A stamp has a major surface with pattern elements having a lateral dimension of greater than 0 and less than about 5 microns. The major surface of the stamp has a functionalizing molecule with a functional group selected to chemically bind to the nonplanar surface. The stamp is positioned to initiate rolling contact with the nonplanar surface, and contacts the nonplanar surface to form a self-assembled monolayer (SAM) of the functionalizing material thereon and impart the arrangement of pattern elements thereto. The major surface of the stamp is translated with respect to the nonplanar surface such that: a contact pressure is controlled at an interface between the stamping surfaces and the nonplanar surface, and a contact force at the interface is allowed to vary while the stamping surfaces and the nonplanar surface are in contact with each other.
Method for producing a nanocrystalline, gas-sensitive layer structure
A method for producing a nanocrystalline, gas-sensitive layer structure. The method for producing a nanocrystalline, gas-sensitive layer structure on a substrate comprises the steps: depositing a base layer made of a base material; depositing a doping layer made of a doping material; repeating the preceding steps; and performing a tempering step, whereby a gas-sensitive, nanocrystalline layer structure is produced.
MEMS gas sensor having a media-sensitive material
A MEMS media sensor, in particular, a MEMS gas sensor, including at least two electrodes, which are situated electrically isolated from one another with the aid of a carrier layer, a media-sensitive material for electrically connecting the two electrodes being applied to the carrier layer, a surface area for applying the media-sensitive material on the carrier layer having a topography, which is adapted to a particle size of particles of the media-sensitive material.
SAMPLE WELL FABRICATION TECHNIQUES AND STRUCTURES FOR INTEGRATED SENSOR DEVICES
Methods of forming an integrated device, and in particular forming one or more sample wells in an integrated device, are described. The methods may involve forming a metal stack over a cladding layer, forming an aperture in the metal stack, forming first spacer material within the aperture, and forming a sample well by removing some of the cladding layer to extend a depth of the aperture into the cladding layer. In the resulting sample well, at least one portion of the first spacer material is in contact with at least one layer of the metal stack.
A METHOD FOR IMPRINTING MICROPATTERNS ON A SUBSTRATE OF A CHALCOGENIDE GLASS
In a first embodiment, the invention relates to a method for nanoimprinting a pattern on a chalcogenide-glass substrate, comprising: (A) preparing a soft operational mold, the operational mold comprising an elastomeric matrix and a reinforcement, wherein the matrix is transparent to IR radiation, and the reinforcement is opaque to IR radiation, and the mold further includes a pattern to be replicated to the substrate; (B) placing the mold on a top surface of a chalcogenide-glass substrate to form a structure, and simultaneously applying (i) IR radiation to heat an area at a top surface of the substrate to a temperature T>T.sub.g, where T.sub.g is the glass transition temperature of chalcogenide-glass, and (ii) applying a controlled pressure on the mold to effect penetration to the top surface of the chalcogenide-glass substrate, thereby to replicate the pattern of the mold to the top surface of the substrate; and (C) separating the operational mold from the patterned substrate.
Inkjet printing process
An inkjet-printing-base process for depositing functional materials, for example PZT, on a substrate, in various instances platinized silicon. Substrate templating (via SAMs) and material deposition are both performed by an inkjet printing process. Additionally, a composition to be used as a SAM precursor ink which is a thiol in a solvent mixture, wherein the composition can be 1 dodecanethiol in a solvent mixture of 2-methoxyethanol and glycerol.