Patent classifications
B82B3/0019
Nanoscale topography system for use in DNA sequencing and method for fabrication thereof
A method of fabricating a nanoscale topography system for inducing unfolding of a DNA molecule for sequencing includes providing a substrate and creating trench walls on the substrate which define a trench therebetween. The method further includes depositing a layer of a block copolymer (BCP) in the trench and forming cylindrical domains by self-assembly of the BCP between the trench walls, removing a first portion of the cylindrical domains to create a vacant region in the trench, and depositing a subsequent layer of the BCP in the vacant region and forming spherical domains by self-assembly of the BCP between the trench walls adjacent a second portion of the cylindrical domains. The spherical domains form staggered post structures for unfolding the DNA molecule and the cylindrical domains form parallel channel structures for entry of the DNA molecule for sequencing.
STORAGE OF INFORMATION USING MIXTURES OF MOLECULES
A machine-readable medium and methods of reading and writing same are disclosed. The machine-readable medium comprises a substrate having an array of addressable locations thereon, each addressable location adapted to be physically associated with a collection of non-polymeric molecules. The molecules in each collection are selected from a set of unambiguously identifiable molecules, each molecule uniquely associated with a predetermined position in a numerical value, wherein the presence of the molecule in the collection indicates a predetermined digit at the associated position and the absence of said molecule in the collection indicates a zero at said associated position.
Plasmon resonance imaging apparatus having metal-insulator-metal nanocups
Provided are plasmon resonance imaging devices having metal-insulator-metal nanocups and methods of use thereof.
Forming nanoscale pores in a semiconductor structure utilizing nanotubes as a sacrificial template
A method of forming a semiconductor structure includes forming two or more catalyst nanoparticles from a metal layer disposed over a substrate in two or more openings of a hard mask patterned over the metal layer. The method also includes growing two or more carbon nanotubes using the catalyst nanoparticles, and removing the carbon nanotubes to form two or more nanoscale pores. The two or more nanoscale pores may be circular nanoscale pores having a substantially uniform diameter. The two or more openings in the hard mask may have non-uniform size, and the substantially uniform diameter of the two or more nanopores may be controlled by a size of the carbon nanotubes.
Systems and methods for genome mapping
A system for molecular mapping includes a semiconductor substrate defining a reservoir to receive a sample of molecules and a nanofluidic channel in fluid communication with the reservoir. The system also includes a plurality of electrodes, in electrical communication with the nanofluidic channel, to electrophoretically trap the sample of molecules in the nanofluidic channel. At least one avalanche photodiode is fabricated in the semiconductor substrate and disposed within an optical near-field of the nanofluidic channel to detect fluorescence emission from at least one molecule in the sample of molecules.
Antibacterial medical implant surface
Aspects include methods of fabricating antibacterial surfaces for medical implant devices including patterning a photoresist layer on a silicon substrate and etching the silicon to generate a plurality of nanopillars. Aspects also include removing the photoresist layer from the structure and coating the plurality of nanopillars with a biocompatible film. Aspects also include a system for preventing bacterial infection associated with medical implants including a thin silicon film including a plurality of nanopillars.
Beam controlled nano-robotic device
A system and method (referred to as a method) to fabricate nanorobots. The method generates a pixel map of an atomic object and identifies portions of the atomic object that form a nanorobot. The method stores those identifications in a memory. The method adjusts an electron beam to a noninvasive operating level and images the portions of the atomic object that form the nanorobot. The method executes a plurality of scanning profiles by the electron beam to form the nanorobot and detects nanorobot characteristics and their surroundings via the electron beam in response to executing the plurality of scanning profiles.
Antibacterial medical implant surface
Aspects include methods of fabricating antibacterial surfaces for medical implant devices including patterning a photoresist layer on a silicon substrate and etching the silicon to generate a plurality of nanopillars. Aspects also include removing the photoresist layer from the structure and coating the plurality of nanopillars with a biocompatible film. Aspects also include a system for preventing bacterial infection associated with medical implants including a thin silicon film including a plurality of nanopillars.
METHOD TO REDUCE PORE DIAMETER USING ATOMIC LAYER DEPOSITION AND ETCHING
Methods are provided for manufacturing well-controlled, solid-state nanopores and arrays of well-controlled, solid-state nanopores by a cyclic process including atomic layer deposition (ALD), or chemical vapor deposition (CVD), and etching. One or more features are formed in a thin film deposited on a topside of a substrate. A dielectric material is deposited over the substrate having the one or more features in the thin film. An etching process is then used to etch a portion of the dielectric material deposited over the substrate having the one or more features in the thin film. The dielectric material deposition and etching processes are optionally repeated to reduce the size of the features until a well-controlled nanopore is formed through the thin film on the substrate.
Method to reduce pore diameter using atomic layer deposition and etching
Methods are provided for manufacturing well-controlled, solid-state nanopores and arrays of well-controlled, solid-state nanopores by a cyclic process including atomic layer deposition (ALD), or chemical vapor deposition (CVD), and etching. One or more features are formed in a thin film deposited on a topside of a substrate. A dielectric material is deposited over the substrate having the one or more features in the thin film. An etching process is then used to etch a portion of the dielectric material deposited over the substrate having the one or more features in the thin film. The dielectric material deposition and etching processes are optionally repeated to reduce the size of the features until a well-controlled nanopore is formed through the thin film on the substrate.