A condensate neutralizer system for treating condensate of a condensate generating device, the condensate neutralizer system including a container having an inlet and an outlet, the inlet is configured to receive condensate from the condensate generating device, the container is configured to contain a condensate neutralizing material useful for treating the condensate and the outlet is configured to drain condensate treated with the condensate neutralizing material; a controller; and a pH meter functionally connected to said controller, the pH meter is configured to take pH measurements of the treated condensate, the measurements are configured to be compared to a fault pattern, wherein the fault pattern is defined by a condition where the pH measurements are lower than a pre-determined pH level and if a fault is determined to exist, a warning is raised or a delivery of replenishment of the condensate neutralizing material is initiated.

The present disclosure provides a method for purifying trifluoroiodomethane. The method includes providing a process stream comprising trifluoroiodomethane, organic impurities, and acid impurities; reacting the process stream with a basic aqueous solution, the basic aqueous solution comprising water and at least one base selected from the group of an alkali metal carbonate and an alkali metal hydroxide; and separating at least some of the organic impurities from the process stream.

To provide a transfer chamber capable of replacing a chemical filter without affecting an internal atmosphere, and shortening or eliminating stop time of a transfer process of a wafer (W) associated with replacement of the chemical filter. The transfer chamber transfers the wafer (W) to or from a processing device (6) by using a transfer robot (2) provided thereinside, and includes a circulation path (CL1) formed inside of a transfer chamber (1) to circulate gas, a chemical filter unit (7) provided in the midstream of the circulation path (CL1), and a connecting and disconnecting means (8) which switches connection and disconnection of the chemical filter unit (7) to and from the circulation path (CL1).

To provide a transfer chamber capable of replacing a chemical filter without affecting an internal atmosphere, and shortening or eliminating stop time of a transfer process of a wafer (W) associated with replacement of the chemical filter. The transfer chamber transfers the wafer (W) to or from a processing device (6) by using a transfer robot (2) provided thereinside, and includes a circulation path (CL1) formed inside of a transfer chamber (1) to circulate gas, a chemical filter unit (7) provided in the midstream of the circulation path (CL1), and a connecting and disconnecting means (8) which switches connection and disconnection of the chemical filter unit (7) to and from the circulation path (CL1).

An example article includes a substrate and a coating applied to the substrate. The coating may include a basic reactant and a humectant. The coating may further include a preservative or a water-soluble polymer. A coating configured to be applied to an acidic gas filter substrate may include K.sub.2CO.sub.3, potassium succinate, dehydroacetic acid, and poly(2-acrylamido-2-methyl-1-propanesulfonic acid (PAMPS). An example system includes an acidic gas filter including a coating, and a sensor configured to sense an optical change in the coating.

An example article includes a substrate and a coating applied to the substrate. The coating may include a basic reactant and a humectant. The coating may further include a preservative or a water-soluble polymer. A coating configured to be applied to an acidic gas filter substrate may include K.sub.2CO.sub.3, potassium succinate, dehydroacetic acid, and poly(2-acrylamido-2-methyl-1-propanesulfonic acid (PAMPS). An example system includes an acidic gas filter including a coating, and a sensor configured to sense an optical change in the coating.

Electronic device processing assemblies including an equipment front end module (EFEM) with at least one side storage pod attached thereto are described. The side storage pod has a side storage container. In some embodiments, an exhaust conduit extends between the chamber and a pod plenum that can contain a chemical filter proximate thereto. A supplemental fan may draw purge gas from the pod plenum through the chemical filter and route the gas through a return duct to an upper plenum of the EFEM. Methods and side storage pods in accordance with these and other embodiments are also disclosed.

Provided is an abatement device that reduces an amount of drainage of circulating water. The abatement device lowers an average drainage flow of circulating water to a low flow, when a ratio of a concentration of silicon dioxide within the circulating water and a concentration of hydrogen fluoride within the circulating water is greater than or equal to a predetermined value at which hydrofluorosilicic acid can be produced, and raises the average drainage flow of the circulating water to a high flow higher than the low flow, when the ratio of the concentration of silicon dioxide within the circulating water and the concentration of hydrogen fluoride within the circulating water is less than the predetermined value.

Provided is an abatement device that reduces an amount of drainage of circulating water. The abatement device lowers an average drainage flow of circulating water to a low flow, when a ratio of a concentration of silicon dioxide within the circulating water and a concentration of hydrogen fluoride within the circulating water is greater than or equal to a predetermined value at which hydrofluorosilicic acid can be produced, and raises the average drainage flow of the circulating water to a high flow higher than the low flow, when the ratio of the concentration of silicon dioxide within the circulating water and the concentration of hydrogen fluoride within the circulating water is less than the predetermined value.

A waste gas is contacted with a mercury removal agent to remove mercury and a flue gas conditioning agent to alter a resistivity and/or cohesivity of particulates. The flue gas conditioning agent can be substantially free of SO.sub.3 and/or comprise more than about 25 wt. % SO.sub.3, and/or the mercury removal agent can be substantially unaffected by the flue gas conditioning agent. An amount of mercury removed from the waste gas in the presence of the flue gas conditioning agent can be the same or more than that removed from the waste gas in the absence of the flue gas conditioning agent. An amount of the acid gas removed, by an acid gas removal agent, from the waste gas in the presence of the flue gas conditioning agent can be the same or more than that removed from the waste gas in the absence of the flue gas conditioning agent.