The present invention discloses methods for extracting and recycling ammonia in MOCVD processes by FTrPSA. Through pretreatment, medium-shallow temperature PSA concentration, condensation and freezing, liquid ammonia vaporization, PSA ammonia extraction, and ammonia gas purification procedures, ammonia-containing exhaust gases from MOCVD processes are purified to meet the electronic-level ammonia gas standard required by the MOCVD processes, so as to implement recycling and reuse of the exhaust gases, where the ammonia gas yield is greater than or equal to 70-85%. The present invention solves the technical problem that atmospheric-pressure or low-pressure ammonia-containing exhaust gases in MOCVD processes cannot be returned to the MOCVD processes for use after being recycled, and fills the gap in green and circular economy development of the LED industry.

A system comprising a pumping system configured to pump respective exhaust gases from each of a plurality of chemical etching process chambers and to combine the exhaust gases to provide a combined exhaust gas, and a noble gas recovery system configured to process the combined exhaust gas to remove one or more noble gases therefrom.

A system comprising a pumping system configured to pump respective exhaust gases from each of a plurality of chemical etching process chambers and to combine the exhaust gases to provide a combined exhaust gas, and a noble gas recovery system configured to process the combined exhaust gas to remove one or more noble gases therefrom.

There is provided a photoreactor for the remediation of gaseous emissions and/or contaminated water using ultraviolet (UV) or vacuum ultraviolet (VUV). There is also provided an emission source for generating UV and/or VUV, the source comprising: a microwave generator; a chamber arranged to receive microwaves generated by the microwave generator, the chamber comprising: a gas comprising species for forming excimers; a resonator arranged to receive the microwaves in the chamber and generate a plasma; a first electrode spaced apart from the resonator; and a voltage source configured to generate an electric field between the resonator and the first electrode, wherein, on application of the electric field, the electric field drives electrons and/or ions from the plasma to generate excimers and produce vacuum ultraviolet or ultraviolet emission. There are also provided methods of generating UV and/or VUV, and methods of remediating fluids.

There is provided a photoreactor for the remediation of gaseous emissions and/or contaminated water using ultraviolet (UV) or vacuum ultraviolet (VUV). There is also provided an emission source for generating UV and/or VUV, the source comprising: a microwave generator; a chamber arranged to receive microwaves generated by the microwave generator, the chamber comprising: a gas comprising species for forming excimers; a resonator arranged to receive the microwaves in the chamber and generate a plasma; a first electrode spaced apart from the resonator; and a voltage source configured to generate an electric field between the resonator and the first electrode, wherein, on application of the electric field, the electric field drives electrons and/or ions from the plasma to generate excimers and produce vacuum ultraviolet or ultraviolet emission. There are also provided methods of generating UV and/or VUV, and methods of remediating fluids.

The present invention relates to a method for the purification of alkanes, especially methane, wherein an alkane comprising impurities, especially methane, is reacted with an active compound, optionally in the presence of sulfur trioxide, whereby the impurities are removed. The present invention furthermore relates to the use of the active compound and sulfur trioxide in the purification of alkanes, especially methane.

Methods and systems described perform air cleaning and/or sanitization in a heating, ventilation, air conditioning, and/or refrigeration (HVACR) system by detecting a concentration of airborne contaminants in a space serviced by the HVACR system. The detected concentration of airborne contaminants is determined whether it exceeds a threshold relative to a capacity of a first air cleaner. When the detected concentration of airborne contaminants exceeds the threshold, a second air cleaner is selected and enabled to be activated in the space. When the detected concentration of airborne contaminants does not exceed the threshold, the first air cleaner is selected and enabled to be activated in the space. The first air cleaner has a cleaning material different from the second air cleaner, and the first air cleaner, relative to the second air cleaner, treats the space at a lower concentration of airborne contaminants. The second air cleaner includes specifically designed cleaner modules.

Methods and systems described perform air cleaning and/or sanitization in a heating, ventilation, air conditioning, and/or refrigeration (HVACR) system by detecting a concentration of airborne contaminants in a space serviced by the HVACR system. The detected concentration of airborne contaminants is determined whether it exceeds a threshold relative to a capacity of a first air cleaner. When the detected concentration of airborne contaminants exceeds the threshold, a second air cleaner is selected and enabled to be activated in the space. When the detected concentration of airborne contaminants does not exceed the threshold, the first air cleaner is selected and enabled to be activated in the space. The first air cleaner has a cleaning material different from the second air cleaner, and the first air cleaner, relative to the second air cleaner, treats the space at a lower concentration of airborne contaminants. The second air cleaner includes specifically designed cleaner modules.

An air dust removal method, comprising the following steps: 1) using an ionization dust removal electric field to adsorb particulate matters in intake air; and 2) using the ionization dust removal electric field to charge an intake air electret element. The method can effectively remove dust in air, the dust removal ability is better, and the dust removal efficiency is higher.

A gas treatment device that treats a gas to be treated, including oxygen, introduced at a gas inlet and that exhausts a treated gas at a gas outlet, the gas treatment device includes: a gas channel that communicates the gas inlet with the gas outlet; a blower that allows the gas to be treated to flow from the gas inlet to the gas outlet; an ultraviolet light source that is disposed in the gas channel and radiates ultraviolet light having a wavelength of 230 nm or less; a filter that is disposed at a side at which the gas outlet is located from the ultraviolet light source in the gas channel, and that adsorbs at least ozone; and a control unit that controls the blower to operate, wherein the control unit controls the blower to start a blowing operation after the ultraviolet light source starts radiating the ultraviolet light.