A system for removing contaminants from both liquid and gaseous hydrocarbon streams and methods thereof are described. An additive that reacts with said contaminant to form water-soluble compounds is injected into the hydrocarbon streams.

A system for removing contaminants from both liquid and gaseous hydrocarbon streams and methods thereof are described. An additive that reacts with said contaminant to form water-soluble compounds is injected into the hydrocarbon streams.

A deodorizer contains: (A) zinc oxide; (B) an organic acid; (C) an aqueous solvent; and (D) an amphoteric surfactant having one of a carboxylate group or a carboxyl group.

A plasma abatement process for abating effluent containing compounds from a processing chamber is described. A plasma abatement process takes gaseous foreline effluent from a processing chamber, such as a deposition chamber, and reacts the effluent within a plasma chamber placed in the foreline path. The plasma dissociates the compounds within the effluent, converting the effluent into more benign compounds. Abating reagents may assist in the abating of the compounds. The abatement process may be a volatizing or a condensing abatement process. Representative volatilizing abating reagents include, for example, CH.sub.4, H.sub.2O, H.sub.2, NF.sub.3, SF.sub.6, F.sub.2, HCl, HF, Cl.sub.2, and HBr. Representative condensing abating reagents include, for example, H.sub.2, H.sub.2O, O.sub.2, N.sub.2, O.sub.3, CO, CO.sub.2, NH.sub.3, N.sub.2O, CH.sub.4, and combinations thereof.

A plasma abatement process for abating effluent containing compounds from a processing chamber is described. A plasma abatement process takes gaseous foreline effluent from a processing chamber, such as a deposition chamber, and reacts the effluent within a plasma chamber placed in the foreline path. The plasma dissociates the compounds within the effluent, converting the effluent into more benign compounds. Abating reagents may assist in the abating of the compounds. The abatement process may be a volatizing or a condensing abatement process. Representative volatilizing abating reagents include, for example, CH.sub.4, H.sub.2O, H.sub.2, NF.sub.3, SF.sub.6, F.sub.2, HCl, HF, Cl.sub.2, and HBr. Representative condensing abating reagents include, for example, H.sub.2, H.sub.2O, O.sub.2, N.sub.2, O.sub.3, CO, CO.sub.2, NH.sub.3, N.sub.2O, CH.sub.4, and combinations thereof.

An improved cluster-supporting catalyst has heteroatom-removed zeolite particles, and catalyst metal clusters supported within the pores of the heteroatom-removed zeolite particles. A method for producing a cluster-supporting catalyst includes the following steps: providing a dispersion liquid containing a dispersion medium and the heteroatom-removed zeolite particles dispersed in the dispersion medium; and in the dispersion liquid, forming catalyst metal clusters having a positive charge, and supporting the catalyst metal clusters within the pores of the heteroatom-removed zeolite particles through an electrostatic interaction.

A neon recovering/purifying system including: a recovery vessel that is arranged on an exhaust gas route and stores exhaust gas, the exhaust gas route being branched and extending from a discharge line; a compressor that increases a pressure of the exhaust gas sent out from the recovery vessel, to a third pressure; an exhaust gas flow rate regulating unit that regulates a flow rate of the exhaust gas whose pressure has been increased by the compressor; a first impurity removing unit that removes a first impurity from the exhaust gas; a second impurity removing unit that removes a second impurity from the exhaust gas from which the first impurity has been removed; a pressure increasing vessel that stores purified gas that has been processed by the first impurity removing unit and the second impurity removing unit; a pressure reducing valve that reduces a pressure of the purified gas sent out from the pressure increasing vessel, to the first pressure; and a purified gas flow rate regulating unit that regulates a flow rate of the purified gas supplied to a supply line of a manufacturing system.

Systems and processes for reducing carbon capture emissions are described. The process involves introducing a radical species into a decarbonized combustion gas. The radical species react with residual amines or unwanted compounds in the decarbonized combustion gas, thus reducing the concentration of residual amines or unwanted compounds in the exhaust gas. The system includes a carbon capture absorber with non-thermal plasma generator configured to provide radical species reducing the concentration of residual amines or unwanted compounds in the exhaust combustion gas.

Systems and processes for reducing carbon capture emissions are described. The process involves introducing a radical species into a decarbonized combustion gas. The radical species react with residual amines or unwanted compounds in the decarbonized combustion gas, thus reducing the concentration of residual amines or unwanted compounds in the exhaust gas. The system includes a carbon capture absorber with non-thermal plasma generator configured to provide radical species reducing the concentration of residual amines or unwanted compounds in the exhaust combustion gas.

A plasma abatement process for abating effluent containing compounds from a processing chamber is described. A plasma abatement process takes gaseous foreline effluent from a processing chamber, such as a deposition chamber, and reacts the effluent within a plasma chamber placed in the foreline path. The plasma dissociates the compounds within the effluent, converting the effluent into more benign compounds. Abating reagents may assist in the abating of the compounds. The abatement process may be a volatizing or a condensing abatement process. Representative volatilizing abating reagents include, for example, CH.sub.4, H.sub.2O, H.sub.2, NF.sub.3, SF.sub.6, F.sub.2, HCl, HF, Cl.sub.2, and HBr. Representative condensing abating reagents include, for example, H.sub.2, H.sub.2O, O.sub.2, N.sub.2, O.sub.3, CO, CO.sub.2, NH.sub.3, N.sub.2O, CH.sub.4, and combinations thereof.