Apparatuses for controlling emissions of carbon capture facilities and associated methods are disclosed that generally involve a chamber defining at least one washwater packing. The exemplary apparatuses further include at least one washwater return line, a UV treatment zone and a hydrogen peroxide treatment zone. The UV treatment zone generally receives UV energy sufficient to substantially destroy a first emission compound and the hydrogen peroxide treatment zone generally receives a hydrogen peroxide medium sufficient to substantially oxidize a second emission compound to a less volatile final product. An alternative exemplary apparatus generally involves a UV treatment zone and an ozonation treatment zone, further including a hydrogen peroxide treatment zone applied within the ozonation treatment zone. The exemplary methods generally include applying at least one of a UV treatment, a hydrogen peroxide treatment and an ozonation treatment.

A flue-gas purification system includes a flue-gas cycling system, a reactor, and an absorbent adding system having at least a catalytic absorbent, wherein the catalytic absorbent is being gasified for reacting with the flue-gas in the reactor in a homogenous gas-gas phase reacting manner. Therefore, the purification system has fast reaction rate between the pollutants of the flue-gas and the catalytic absorbent, which is preferably ammonia, to efficiently remove pollutants, so as to effectively purify the flue-gas.

A flue-gas purification system includes a flue-gas cycling system, a reactor, and an absorbent adding system having at least a catalytic absorbent, wherein the catalytic absorbent is being gasified for reacting with the flue-gas in the reactor in a homogenous gas-gas phase reacting manner. Therefore, the purification system has fast reaction rate between the pollutants of the flue-gas and the catalytic absorbent, which is preferably ammonia, to efficiently remove pollutants, so as to effectively purify the flue-gas.

A plasma abatement process for abating effluent containing compounds from a processing chamber is described. A plasma abatement process takes gaseous foreline effluent from a processing chamber, such as a deposition chamber, and reacts the effluent within a plasma chamber placed in the foreline path. The plasma dissociates the compounds within the effluent, converting the effluent into more benign compounds. Abating reagents may assist in the abating of the compounds. The abatement process may be a volatizing or a condensing abatement process. Representative volatilizing abating reagents include, for example, CH.sub.4, H.sub.2O, H.sub.2, NF.sub.3, SF.sub.6, F.sub.2, HCl, HF, Cl.sub.2, and HBr. Representative condensing abating reagents include, for example, H.sub.2, H.sub.2O, O.sub.2, N.sub.2, O.sub.3, CO, CO.sub.2, NH.sub.3, N.sub.2O, CH.sub.4, and combinations thereof.

A plasma abatement process for abating effluent containing compounds from a processing chamber is described. A plasma abatement process takes gaseous foreline effluent from a processing chamber, such as a deposition chamber, and reacts the effluent within a plasma chamber placed in the foreline path. The plasma dissociates the compounds within the effluent, converting the effluent into more benign compounds. Abating reagents may assist in the abating of the compounds. The abatement process may be a volatizing or a condensing abatement process. Representative volatilizing abating reagents include, for example, CH.sub.4, H.sub.2O, H.sub.2, NF.sub.3, SF.sub.6, F.sub.2, HCl, HF, Cl.sub.2, and HBr. Representative condensing abating reagents include, for example, H.sub.2, H.sub.2O, O.sub.2, N.sub.2, O.sub.3, CO, CO.sub.2, NH.sub.3, N.sub.2O, CH.sub.4, and combinations thereof.

A method of capturing a basic, nitrogen-containing compound is provided. The basic, nitrogen-containing compound is captured by sorption (e.g., adsorption) on a sulfonic-acid containing polymeric material. The sulfonic acid-containing polymeric material is formed from a polymerizable composition that contains a free-radically polymerizable spirobisindane monomer. Additionally, a polymeric material is provided that is a reaction product of a sulfonic acid-containing polymeric material having at least one SO3H group and a basic, nitrogen-containing compound of formula Q. This polymeric material has at least one group of formula SO.sub.3.sup.(QH.sup.+).

The invention relates to a method for recovery of urea dust and ammonia from a gas stream by contacting said gas stream with an aqueous sulphuric acid solution, thus forming an acid solution of ammonium sulphate and urea, characterized in that the acid solution is concentrated to a melt comprising less than 5 wt % of water, which melt is subsequently transferred into solid particles comprising urea and ammonium sulphate.

The invention relates to a method for recovery of urea dust and ammonia from a gas stream by contacting said gas stream with an aqueous sulphuric acid solution, thus forming an acid solution of ammonium sulphate and urea, characterized in that the acid solution is concentrated to a melt comprising less than 5 wt % of water, which melt is subsequently transferred into solid particles comprising urea and ammonium sulphate.

A plasma abatement process for abating effluent containing compounds from a processing chamber is described. A plasma abatement process takes gaseous foreline effluent from a processing chamber, such as a deposition chamber, and reacts the effluent within a plasma chamber placed in the foreline path. The plasma dissociates the compounds within the effluent, converting the effluent into more benign compounds. Abating reagents may assist in the abating of the compounds. The abatement process may be a volatizing or a condensing abatement process. Representative volatilizing abating reagents include, for example, CH.sub.4, H.sub.2O, H.sub.2, NF.sub.3, SF.sub.6, F.sub.2, HCl, HF, Cl.sub.2, and HBr. Representative condensing abating reagents include, for example, H.sub.2, H.sub.2O, O.sub.2, N.sub.2, O.sub.3, CO, CO.sub.2, NH.sub.3, N.sub.2O, CH.sub.4, and combinations thereof.

Systems and processes for reducing carbon capture emissions are described. The process involves introducing a radical species into a decarbonized combustion gas. The radical species react with residual amines or unwanted compounds in the decarbonized combustion gas, thus reducing the concentration of residual amines or unwanted compounds in the exhaust gas. The system includes a carbon capture absorber with non-thermal plasma generator configured to provide radical species reducing the concentration of residual amines or unwanted compounds in the exhaust combustion gas.