Patent classifications
B01D53/68
MATERIALS AND METHODS FOR MITIGATING HALIDE SPECIES IN PROCESS STREAMS
Materials and methods for mitigating the effects of halide species contained in process streams are provided. A halide-containing process stream can be contacted with mitigation materials comprising active metal oxides and a non-acidic high surface area carrier combined with a solid, porous substrate. The halide species in the process stream can be reacted with the mitigation material to produce neutralized halide salts and a process stream that is essentially halide-free. The neutralized salts can be attracted and retained on the solid, porous substrate.
MATERIALS AND METHODS FOR MITIGATING HALIDE SPECIES IN PROCESS STREAMS
Materials and methods for mitigating the effects of halide species contained in process streams are provided. A halide-containing process stream can be contacted with mitigation materials comprising active metal oxides and a non-acidic high surface area carrier combined with a solid, porous substrate. The halide species in the process stream can be reacted with the mitigation material to produce neutralized halide salts and a process stream that is essentially halide-free. The neutralized salts can be attracted and retained on the solid, porous substrate.
PROCESS APPARATUS AND PROCESS METHOD
According to an embodiment, a process apparatus performs processing on a byproduct generated in a reaction of a raw material including silicon and a halogen element or in a reaction between a raw material including silicon and a raw material including a halogen element. The apparatus includes a process liquid tank, a processing tank, a supplier and an exhauster. A process target member including the byproduct is introduced into the processing tank. The supplier supplies the process liquid from the process liquid tank to the processing tank and performs processing on the byproduct with the supplied process liquid. The exhauster exhausts a gas generated by reaction between the process liquid and the byproduct from the processing tank.
RADIOACTIVE IODINE ADSORBENT, AND METHOD FOR TREATING RADIOACTIVE IODINE
Provided is a method for treating radioactive iodine contained in steam discharged from a nuclear power facility, including a filling step of filling an air-permeable container with a granulated radioactive iodine adsorbent of zeolite X, wherein ion exchange sites of the zeolite X are substituted with silver so that a size of minute pores of the zeolite X is suited to a size of a hydrogen molecule, and the radioactive iodine adsorbent has a silver content of 36 wt % or more when dried, a particle size of 10×20 mesh, a hardness of 94% or more, and a water content of 12 wt % or less when dried at 150° C. for 3 h and thereby reduced in weight; and a flow passing step of passing a flow of the steam discharged from the nuclear power facility, through the container filled with the radioactive iodine adsorbent.
Control of wet scrubber oxidation inhibitor and byproduct recovery
The present disclose is directed to a method for controlling iodine levels in wet scrubbers, and, in particular, recirculating wet scrubbers by removing the iodine from the scrubbing solution, such as by using ion exchange, absorption, adsorption, precipitation, filtration, solvent extraction, ion pair extraction, and an aqueous two-phase extraction.
Control of wet scrubber oxidation inhibitor and byproduct recovery
The present disclose is directed to a method for controlling iodine levels in wet scrubbers, and, in particular, recirculating wet scrubbers by removing the iodine from the scrubbing solution, such as by using ion exchange, absorption, adsorption, precipitation, filtration, solvent extraction, ion pair extraction, and an aqueous two-phase extraction.
Gas laser apparatus
A gas laser apparatus may include: a laser chamber connected through a first control valve to a first laser gas supply source that supplies a first laser gas containing a halogen gas; a purification column that removes at least a part of the halogen gas and a halogen compound from at least a part of a gas exhausted from the laser chamber; a booster pump; and a controller that calculates, on a basis of a first amount of a gas supplied from the booster pump to the laser chamber, a second amount of the first laser gas that is to be supplied to the laser chamber and controls the first control valve on a basis of a result of the calculation of the second amount.
Method for treating sulfur hexafluoride using radiation and apparatus for collecting and treating by-products
Provided are a method for treating sulfur hexafluoride and an apparatus for collecting and treating by-products. The method for treating sulfur hexafluoride, and the apparatus for collecting and treating by-products according to the present invention are a significantly effective method and apparatus capable of safely treating sulfur hexafluoride at low cost.
Method for treating sulfur hexafluoride using radiation and apparatus for collecting and treating by-products
Provided are a method for treating sulfur hexafluoride and an apparatus for collecting and treating by-products. The method for treating sulfur hexafluoride, and the apparatus for collecting and treating by-products according to the present invention are a significantly effective method and apparatus capable of safely treating sulfur hexafluoride at low cost.
METHODS AND COMPOSITIONS FOR SCRUBBING CHLORINE-CONTAINING GASES
Methods and compositions are described that remove chlorine from a chlorine-containing gas stream. The method includes adding a carbonate salt and optionally a scale inhibitor to a scrubbing liquid in a wet scrubbing system, and contacting the chlorine-containing gas with the scrubbing liquid. The amount of carbonate salt that is added can vary depending on the pH of the scrubbing liquid.