A device and method of simultaneously removing flammable gases and nitrous oxide are provided. The device includes a thermal oxidation chamber, a high-temperature resistant dust filter, and a catalyst chamber. The thermal oxidation chamber is configured to receive an exhaust gas from a process tool. The exhaust gas includes flammable gases and nitrous oxide. The thermal oxidation chamber has a first exhaust pipe to emit nitrous oxide and dust generated after the exhaust gas is thermally oxidized. The high-temperature resistant dust filter receives dust and nitrous oxide from the first exhaust pipe, wherein the high-temperature resistant dust filter has a filter fiber net and a second exhaust pipe, and the second exhaust pipe is configured to emit nitrous oxide. The catalyst chamber receives nitrous oxide from the second exhaust pipe, wherein the catalyst chamber has a nitrous oxide decomposition catalyst to decompose nitrous oxide into nitrogen and oxygen.

The greenhouse gas converter chamber is a process and apparatus that captures, cleans, and separates greenhouse or exhaust gases at their source. Once separated, each individual gas can be released back into the atmosphere or stored depending on the gas's impact on the environment.

The greenhouse gas converter chamber is a process and apparatus that captures, cleans, and separates greenhouse or exhaust gases at their source. Once separated, each individual gas can be released back into the atmosphere or stored depending on the gas's impact on the environment.

An apparatus for treating gaseous pollutants includes a gas inlet part, a first treatment unit, a second treatment unit and a non-mechanical flow-guiding device. The gas inlet part includes a gas inlet chamber and at least one guide pipe. The guide pipe communicates with the gas inlet chamber and guides an effluent stream from a semiconductor process to the gas inlet chamber. The first treatment unit is coupled to a bottom end of the gas inlet part and is configured to abate the effluent stream. The non-mechanical flow-guiding device is coupled to the first treatment unit. The flow-guiding device is configured to guide the effluent stream to move toward an opening. The second treatment unit is coupled to the flow-guiding device via the opening, receives the effluent stream from the first treatment unit and further abates the effluent stream.

An apparatus for treating gaseous pollutants includes a gas inlet part, a first treatment unit, a second treatment unit and a non-mechanical flow-guiding device. The gas inlet part includes a gas inlet chamber and at least one guide pipe. The guide pipe communicates with the gas inlet chamber and guides an effluent stream from a semiconductor process to the gas inlet chamber. The first treatment unit is coupled to a bottom end of the gas inlet part and is configured to abate the effluent stream. The non-mechanical flow-guiding device is coupled to the first treatment unit. The flow-guiding device is configured to guide the effluent stream to move toward an opening. The second treatment unit is coupled to the flow-guiding device via the opening, receives the effluent stream from the first treatment unit and further abates the effluent stream.

Embodiments of the invention include a filtration element. In an embodiment, the invention includes a filtration element for an airplane cabin that includes a first media portion upstream from a second media portion. The first media portion can include activated carbon. The second media portion can include a catalyst material. Other embodiments are also included herein.

Embodiments of the invention include a filtration element. In an embodiment, the invention includes a filtration element for an airplane cabin that includes a first media portion upstream from a second media portion. The first media portion can include activated carbon. The second media portion can include a catalyst material. Other embodiments are also included herein.

A method and apparatus for purifying gas where gas is treated in a multistage treatment having at least two ejector stages, a motive medium including liquid, steam or gaseous agent at high pressure injected by an ejector of the ejector stage, and the gas is sucked into the same ejector and mixed with the motive medium for forming a mixture, at least a part of gas and/or liquid phase of the mixture is supplied to a second ejector stage having so that a second motive medium which includes liquid, steam or gaseous agent is injected to the ejector and the gas and/or the liquid phase is sucked into the same ejector in which the gas and/or liquid phase is mixed with the second motive medium for forming a second mixture, at least one of the mixtures includes an additive for removing impurities of the gas, and a purified gas is formed.

A method and apparatus for purifying gas where gas is treated in a multistage treatment having at least two ejector stages, a motive medium including liquid, steam or gaseous agent at high pressure injected by an ejector of the ejector stage, and the gas is sucked into the same ejector and mixed with the motive medium for forming a mixture, at least a part of gas and/or liquid phase of the mixture is supplied to a second ejector stage having so that a second motive medium which includes liquid, steam or gaseous agent is injected to the ejector and the gas and/or the liquid phase is sucked into the same ejector in which the gas and/or liquid phase is mixed with the second motive medium for forming a second mixture, at least one of the mixtures includes an additive for removing impurities of the gas, and a purified gas is formed.

Apparatus and methods are disclosed. The apparatus comprises: an abatement chamber of an abatement apparatus which treats an effluent stream from a semiconductor processing tool to provide a combusted effluent stream having effluent particles; and a first atomiser located downstream of the abatement chamber, the first atomiser being configured to produce droplets having a droplet size based on a particle size of the effluent particles to be removed from the combusted effluent stream. In this way, the atomizer may produce droplets which combine with or adhere to the effluent particles which assists in the removal of the effluent particles from the combusted effluent stream.