A device of purifying a fluoride in a semiconductor process waste gas includes a reaction chamber formed in a waste gas treating tank, and a heat pipe disposed in the waste gas treating tank and inserted into the reaction chamber. A water injection pipe is disposed at the outside end of the heat pipe formed at an outside of the waste gas treating tank, a heating rod is disposed in and passes through the heat pipe, a passage is formed between the heating rod and the heat pipe, water is guided and enters into the passage by the water injection pipe, the water in the passage contacts with the heating rod to produce a mist gaseous water at a high temperature, the mist gaseous water is guided and enters into the reaction chamber via the plurality of spit-outs to dissolve the fluoride to be reacted into a hydrogen fluoride, and a dissolving temperature of the mist gaseous water contacting with the fluoride is 3701300 C.

A plant and a related method for the regeneration of fluorinated compounds, particularly sulfur hexafluoride, includes an inlet section designed to receive a gas mixture with the fluorinated compound to be regenerated, an outlet section designed to convey out the regenerated gas, and a fluid dynamic circuit that connects the inlet section to the outlet section and includes filtering elements. The filtering elements have a separation unit where the gas mixture is brought to a temperature and pressure that cause the fluorinated compound to condense while keeping the other components of the mixture in the gaseous state. The condensed fluorinated compound represents the regenerated compound to be conveyed toward the outlet section.

The invention relates to a method of capturing a sintered product after sintering a waste gas in a semiconductor manufacturing process and its capturing device. The method comprises providing aerosolised water molecules to be entered into a reaction chamber of a waste gas treatment tank; and capturing a product generated after a sintering reaction of the waste gas by diffusion distributing of the aerosolised water molecules, wherein, the aerosolised water molecules are diffusion distributed between a bottom edge of a waste gas reaction end in the reaction chamber and a tank wall surrounding the reaction chamber. The present invention further provides a device for capturing a sintered product for implementing the method. The object of the present invention is to solve problems saying that a semiconductor exhaust gas is processed by a high temperature sintering treatment, the generated SiO.sub.2 powders, the WO.sub.2 powders or the BO.sub.2 powders are extremely fine, the F.sub.2 gas is small molecules, and it is not easy to capture them during a rear stage water washing program.

A gas laser apparatus may include: a laser chamber connected through a first control valve to a first laser gas supply source that supplies a first laser gas containing a halogen gas and connected through a second control valve to a second laser gas supply source that supplies a second laser gas having a lower halogen gas concentration than the first laser gas; a purification column that removes at least a part of the halogen gas and a halogen compound from at least a part of a gas exhausted from the laser chamber; a booster pump, connected through a third control valve to the laser chamber, which raises a pressure of a gas having passed through the purification column to a gas pressure that is higher than an operating gas pressure of the laser chamber; and a controller that calculates, on a basis of a first amount of a gas supplied from the booster pump through the third control valve to the laser chamber, a second amount of the first laser gas that is to be supplied to the laser chamber and controls the first control valve on a basis of a result of the calculation of the second amount.

The invention relates to a method of purifying a fluoride in a semiconductor process waste gas. The method comprises the steps of importing a mist gaseous water at a high temperature produced by heating water in a reaction chamber of a semiconductor waste gas treating tank; and dissolving the fluoride into a hydrogen fluoride by using the mist gaseous water, wherein a dissolving temperature of the mist gaseous water contacting with the fluoride is 3701300 C. This invention provides a device of purifying a fluoride in a semiconductor process waste gas. The conventional problems saying that the steps and structure of the device of purifying the fluoride in the semiconductor process waste gas are too complex and a purifying efficiency is hard to be increased.

A portable dry scrubber comprises a gas flow control module comprising a gas receiving unit that receives inflow of gas from surrounding atmosphere or from a gas source, a gas processing module that removes hazardous matter from the gas flowed in through the gas receiving unit and a connection module that connects the gas flow control module detachably to the gas processing module. The connection module comprises quick coupling device that establishes and disassembles a gas flow passage between the gas flow control module and the gas processing module. Example of the quick coupling device is a quick release vacuum flange that engages with a connecting flange of the gas flow control module.

A system for recycling cooling devices, comprising a system part for catalytically oxidizing the pure hydrocarbon compounds and chlorofluorocarbons which accumulate during the recycling of the cooling devices. According to the invention, this system part comprises two reactors, provided mutually separated in the flow direction of the gases to be treated, a first reactor being used for catalytically oxidizing the pure hydrocarbon compounds while a second reactor is used for catalytically oxidizing chlorofluorocarbons.

Systems and methods for recovery of gaseous substances from molten salt electrolysis are generally described. Certain systems comprise a cell configured for molten salt electrolysis; a collector fluidically connected to the cell and configured to collect volatilized molten salt from the cell; and a gas scrubber fluidically connected to the collector and configured to at least partially remove a gas from an effluent stream of the cell. Some methods comprise, using a pressure gradient: transporting a gas comprising molten salt vapor from an electrolytic cell to and through a collector such that at least a portion of the molten salt vapor forms a solid within the collector; and transporting some or all of the gas from the collector through a gas scrubber.

A gas treatment system includes a first scrubber, a regenerative catalytic oxidizer (RCO) that treats gas that passes through the first scrubber, a second scrubber that treats the gas that passed through the regenerative catalytic oxidizer, and a dielectric barrier discharge (DBD) plasma reactor that treats the gas that passed through the second scrubber. The regenerative catalytic oxidizer includes a two-bed regenerative catalytic reactor.

A fluid filter, filtering medium composition, and associated process for removing contaminants from feed and exhaust fluids used in fuel cell electricity generation, laboratories, the semiconductor and other industries to improve performance and extend useful equipment lifetimes and to clean fluids of sulfur compound contaminants, as well as to remove noxious NOx and halogen contaminants from feed and exhaust gases.