Provided is a novel exhaust gas processing device which allows processing target exhaust gas having a large flow volume to be handled with a small-capacity plasma generator, by preheating a high-temperature decomposable gas component of the processing target exhaust gas. An exhaust gas processing device 10 preheats processing target exhaust gas F in the presence of moisture with heat from at least either an electric heater 15 or a heat exchanger 17 and subsequently thermally decomposes the exhaust gas with an atmospheric pressure plasma P. A device main body 11 has a heating decomposition chamber T therein. A plasma generator 14 is of a non-transferred type and is installed at a top surface portion 11a of the device main body 11. A reactor 12 has a cylindrical shape and is installed within the device main body 11 such that an upper end opening 12i thereof is directed toward a plasma emission port 14f of the plasma generator 14. A moisture supply unit 18 is provided at an inlet side of the device main body 11. At least either the electric heater 15 or the heat exchanger 17 is disposed in a first space T1.

A method for producing fluorine gas including a fluorination step of obtaining a reaction mixture containing a major fluorinated substance that is a target component generated by fluorination of a raw material compound and by-product hydrogen fluoride, a separation step of separating the reaction mixture to obtain a main product component containing the major fluorinated substance and a by-product component containing the by-product hydrogen fluoride, a purification step of purifying the by-product component to obtain a recovered hydrogen fluoride component in which a concentration of an organic substance is reduced and a concentration of the by-product hydrogen fluoride is increased, an electrolysis step of performing electrolysis using the recovered hydrogen fluoride component as at least a part of an electrolyte to produce fluorine gas, and an introduction step of introducing the fluorine gas obtained in the electrolysis step into a reaction field for fluorination in the fluorination step.

The present disclosure provides a method for converting the target gas contained in the exhaust gas in plasma phase and an apparatus for implementing the method, the method comprising the steps of: generating a plasma in a conversion region in which the conversion of the target gas occurs; supplying, to the conversion region, a conversion promoting agent containing a conversion promoting element of which the first ionization energy is not greater than 10 eV for promoting the conversion of the target gas; supplying, to the conversion region, a conversion agent that produces conversion products by combining with the dissociation products of the target gas and prevents the dissociation products from recombining into the target gas; and supplying the exhaust gas containing the target gas to the conversion region.

An absorption system (100) and a process for absorption of gas from a medical apparatus (1) are provided. The absorption system includes a feed line (6), a discharge line (8), a filter unit (4) with a filter and at least one buffer storage device. The feed line establishes a fluid connection between the medical apparatus and the filter unit. The discharge line establishes a fluid connection between the filter unit and a fluid absorption unit (7). The gas is discharged from the medical apparatus and is passed through the feed line to the filter unit and from there through the discharge line to the fluid absorption unit. The filter filters at least one gas component out of the gas that is passed through the filter unit. The one or more buffer storage device absorbs and again discharges gas from time to time.

A detoxifying device 100 having an inner wall 104 that forms a flow passage 103 through which treatment gas flows includes a first piping 130 that forms a part of the flow passage 103, a replaceable piping section 170 that forms a part of the flow passage 103 at the position downstream of the first piping 130, and is connected thereto for sprinkling the cleaning water to remove the solid product adhering to the inner wall 104, and a second piping 150 that forms a part of the flow passage 103 at the position downstream of the piping section 170, and is connected thereto.

An exhaust gas processing system including a process chamber in which an exhaust gas is produced; an exhaust gas measurer receiving the exhaust gas and measuring a concentration of the exhaust gas; a solid producing gas processor receiving the exhaust gas and removing a solid producing gas contained in the exhaust gas; a gas supply supplying dilution and cooling gases to the solid producing gas processor; a processed gas measurer receiving, as a processed gas, the exhaust gas free of the solid producing gas and measuring a temperature of the processed gas and ingredients of the processed gas; and a controller receiving results of measurement of the concentration of the exhaust gas from the exhaust gas measurer and results of measurement of the temperature of the processed gas and the ingredients of the processed gas from the exhaust gas measurer and controlling the gas supply based on the measurement results.

Embodiments disclosed herein include a particle collection trap for an abatement system for abating compounds produced in semiconductor processes. The particle collection trap includes a device for producing spiral gas flow in the particle collection trap. The spiral gas flow causes particles, which are heavier than the gas, to travel to the outside diameter of the flow path where the gas velocity is slower and to drop out of the gas stream. The device may be a spiral member coupled to a hollow tube or a rolled member having an inner portion coupled to a hollow tube. The particle collection trap increases the accumulation rate of particles in the gas stream without reducing the velocity of the gas flow.

Provided are a gas treatment method and a gas treatment device capable of efficiently removing a bromofluoroethylene. A gas containing a bromofluoroethylene is brought into contact with an adsorbent (7) having pores with an average pore diameter of 0.4 nm or more and 4 nm or less in a temperature environment of not less than 0° C. and less than 120° C. to allow the adsorbent (7) to adsorb the bromofluoroethylene, and thus the bromofluoroethylene is separated from the gas.

A process gas suction structure for preventing a generation of products from a process gas due to a temperature drop is disclosed. The process gas suction structure includes a double tube structure, and a heating device configured to heat the double tube structure. The double tube structure includes a process-gas flow passage portion where the process gas flows, and a partition portion arranged outside of the process-gas flow passage portion.

An exhaust gas processing system including a process chamber in which an exhaust gas is produced; an exhaust gas measurer receiving the exhaust gas and measuring a concentration of the exhaust gas; a solid producing gas processor receiving the exhaust gas and removing a solid producing gas contained in the exhaust gas; a gas supply supplying dilution and cooling gases to the solid producing gas processor; a processed gas measurer receiving, as a processed gas, the exhaust gas free of the solid producing gas and measuring a temperature of the processed gas and ingredients of the processed gas; and a controller receiving results of measurement of the concentration of the exhaust gas from the exhaust gas measurer and results of measurement of the temperature of the processed gas and the ingredients of the processed gas from the exhaust gas measurer and controlling the gas supply based on the measurement results.