A metal organic framework (MOF)-polymer composite for detoxifying a chemical warfare agent (CWA) comprises MOF nanoparticles having catalytically active Lewis acid sites and at least one polymer having catalytically active basic sites. The composite is configured such that the at least one polymer is in surrounding relation to the MOF nanoparticles such that at least a portion of the Lewis acid sites of the MOF nanoparticles are in proximal relation to at least a portion of the basic sites of the at least one polymer thereby forming a plurality of proximal acid-base interfaces thus enabling a bifunctional catalytic mechanism for detoxifying the CWA. The MOF-polymer composite can provide CWA detoxification without the presence of a basic compound.

There is provided a method for producing high-purity bromine pentafluoride while leaving a less amount of an unreacted fluorine gas. The method for producing bromine pentafluoride includes a reaction step of feeding a bromine-containing compound, which is at least one of a bromine gas and bromine trifluoride, and a fluorine gas to a reactor to give a (fluorine atom):(bromine atom) molar ratio, that is, F/Br of 3.0 or more and 4.7 or less and reacting the bromine-containing compound and the fluorine gas to each other to obtain a reaction mixture containing bromine pentafluoride and bromine trifluoride; and a separation step of separating bromine pentafluoride and bromine trifluoride in the reaction mixture from each other.

The invention relates to a two-stage method for recovering halogenated hydrocarbons. In a desorption step, steam is passed through an adsorbent comprising adsorbed halogenated hydrocarbons, which produces a secondary flow volume containing halogenated hydrocarbons. The secondary flow volume is converted into a condensate containing halogenated hydrocarbons and water by cooling, from which condensate the halogenated hydrocarbons are separated. In a sterilisation step that precedes the desorption step, the adsorbent comprising adsorbed halogenated hydrocarbons is brought into contact with steam for at least 10 minutes at a temperature of more than 120° C. and at a pressure between 0.15 MPa and 0.4 MPa.

Disclosed is a system for treating exhaust fluid from semiconductor manufacturing equipment in which cleaning gases decomposed by a plastic apparatus alternately flow towards a front rotor region (a main rotor unit) and a rear rotor region (a subsidiary rotor unit) of a booster pump and then flow towards a dry pump, and thus uniformly react with process byproducts present throughout the whole area in a vacuum pump including the booster pump and the dry pump so as to improve removal efficiency of the process byproducts. Further, the retention time of the cleaning gases decomposed by the plasma apparatus in the vacuum pump is increased by adjusting the pressure in the pump with the rotational speed of a motor, and thus the reaction time of the cleaning gases with the process byproducts is increased, so as to further improve removal efficiency of the process byproducts, such as SiO.sub.2 powder.

An apparatus (1) for generating power is provided. The apparatus comprises: at least one pocket (2a-h) for collecting inlet gas which rises through a liquid in which the at least one pocket may be located; an output rotor (4); and a greenhouse gas scavenger (6) for removing greenhouse gas from an inlet gas; the apparatus being configured so that collection of inlet gas causes movement of the pocket, the pocket being coupled to the output rotor so that movement of the pocket causes rotation of the output rotor. A method is also provided.

Disclosed is a system for integrally treating a composite waste gas including nitrogen oxides (NO.sub.x and N.sub.2O), chlorofluorocarbons (CFCs), hydrochlorofluorocarbons (HCFCs), hydrofluorocarbons (HFCs), and perfluorinated compounds (PFCs). The system includes a first wet processor configured to wash and adsorb dust including gases, SO.sub.x, and ash dissolved in water, a decomposing reactor configured to receive waste gas processed in the first wet processor and process nitrogen oxides (NO.sub.x and N.sub.2O), fluorocarbons (CFCs), hydrochlorofluorocarbons (HCFCs), hydrofluorocarbons (HFCs), and perfluorinated compounds (PFCs) in the waste gas, and a second wet processor configured to receive the waste gas processed in the decomposing reactor and wash and adsorb the received waste gas. The system can efficiently treat a large amount of composite waste gas.

A piping apparatus includes an exhaust pipe providing a passage through which the exhaust gas discharged, and a harmful gas treatment device positioned between a rear end of the vacuum pump and a front end of the exhaust pipe or positioned on the exhaust pipe, wherein the harmful gas treatment device includes a heating means for increasing the temperature of the exhaust gas so as to prevent a sublimable component, from among components included in the exhaust gas, from being sublimated and accumulated inside the exhaust pipe, and the heating means is positioned on a section including a sublimation condition occurrence point, at which a sublimation condition of the sublimable component occurs, and an upstream side of the sublimation condition occurrence point on the exhaust pipe, and the sublimation condition is a temperature condition for the pressure of the sublimable component.

Technologies for combusting hazardous compounds such as chemical warfare agents and related compounds are disclosed. In embodiments, the technologies include systems and methods for combusting such compounds in an internal combustion engine, such as a spark ignition internal combustion engine, a diesel engine, or the like. The technologies described herein further include components for treating an exhaust gas stream produced by combustion of hazardous compounds. In embodiments such components include a scrubber that utilizes a scrubbing media such as soil to removing acid gases from the exhaust stream.

An electrical switching device is provided for interrupting an electrical connection. The device has a switching chamber and two contact pieces being arranged directly in the switching chamber or in an encapsulated housing arranged in the switching chamber and configured to be gas-tight in relation to the switching chamber. The contact pieces are movable relative to each other to bring about a switching action. A fluid insulation medium is also provided, which is arranged in the switching chamber or in a storage volume which can be connected to the switching chamber. The switching chamber or the storage volume has an outlet for letting out the fluid insulation medium. A filter is provided at or adjacent to the outlet, the filter configured to filter gaseous components of the insulation medium, or the reaction products thereof, conducted through the outlet.

A process for treating a composition comprising one or more desired (hydro)fluoroolefins and one or more undesired halogenated ethanes, halogenated methanes or mixtures thereof so as to reduce the concentration of at least one undesired halogenated ethane or halogenated methane, the process comprising contacting the composition with an adsorbent comprising pores having openings which have a size across their largest dimension of about 6 Å or less.