Plant for delivering a gas mixture to a silicon wafer doping unit comprising a source of a dopant gas (1), a source of a carrier gas (2), a mixer device (3) connected to the container of dopant gas (1) and to the source of carrier gas (2), a first flow regulator member (41) and a second flow regulator member (42) for regulating the flows of the dopant gas (1) and of the carrier gas (2) towards the mixer device (3), a control unit (5) for controlling the first and second flow regulator members (41, 42) so as to adjust the first flow rate setpoint (D1) and the second flow rate setpoint (D2) in proportions determined as a function of at least one target content (C1, C2) of dopant gas (1) and/or carrier gas (2) in the mixture, a buffer tank (7), a delivery line (6) for delivering the mixture to a doping unit (10) with a consumption flow rate (DC), at least one measurement sensor (8) for measuring a physical quantity, the variation of which is representative of a variation in the consumption flow rate (DC) and for providing a first measurement signal, the control unit (5) being connected to the sensor (8) and configured to produce a first control signal from the first measurement signal, the flow regulator members (41, 42) being configured to adjust the first and second flow rate setpoints (D1, D2) in response to said first control signal.

A control valve features a first housing and a second housing. The first housing includes a first inlet port having a first inlet port orifice member with a first inlet port orifice size configured to provide a first inlet fluid with a first inlet volumetric flow rate, the first inlet port orifice member being detachably coupled inside the first inlet port; includes a second inlet port having a second inlet port orifice member with a second inlet port orifice size configured to provide a second inlet fluid with a second inlet volumetric flow rate, the second inlet port orifice member being detachably coupled inside the second inlet port; and includes a first housing rim configured to extend from the first fixed inlet and the second fixed inlet. The second housing includes a second housing rim coupled to the first housing rim and configured to form a mixture chamber to mix the first inlet fluid received from the first fixed inlet orifice and the second inlet fluid received from the second fixed inlet orifice and provide a mixture chamber fluid; and an outlet port having an outlet port orifice with an outlet port orifice size configured to provide the mixture chamber fluid as an outlet port fluid having an outlet volumetric flow rate. The outlet port fluid has a mixture ratio of the first inlet fluid and the second inlet fluid for a particular application that depends on dimensions of the first inlet port orifice size, the second inlet port orifice size and the outlet port orifice size.

Methods and apparatus are disclosed relating to mixing fluids in welding-type equipment. In some examples, a welding-type power supply (and/or wire feeder) may include multiple fluid paths through which to provide fluid from multiple fluid reservoirs to multiple welding-type tools. The power supply may be configured to automatically control fluid flow rates through the fluid paths via proportional valves. Further, the welding-type power supply may be configured to allow and/or prohibit mixing of fluids from different flow paths via control of various valves.

A method comprises transporting a first stream of a carrier gas to a delivery device that contains a liquid precursor compound. The method further comprises transporting a second stream of the carrier gas to a point downstream of the delivery device. The first stream after emanating from the delivery device and the second stream are combined to form a third stream, such that the dew point of the vapor of the liquid precursor compound in the third stream is lower than the temperature of the plumbing that transports the vapor to a CVD reactor or a plurality of CVD reactors. The flow direction of the first stream, the flow direction of the second stream and the flow direction of the third stream are unidirectional and are not opposed to each other.

An exemplary process air recirculation system, and an electric heater mixing apparatus is disclosed herein. Exemplary process air recirculation systems comprise the electric heating mixing apparatus. An exemplary electric heating mixing apparatus comprises: walls defining a first chamber having a first upstream opening and a first downstream opening, and a second chamber having a first upstream opening and a first downstream opening, wherein the second chamber is adjacently disposed to the first chamber, a first inlet damper disposed at the first upstream opening, a second inlet damper disposed at the second upstream opening, and a resistance-type electric air heater disposed in the first chamber.

Methods and apparatus are disclosed relating to mixing fluids in welding-type equipment. In some examples, a welding-type power supply (and/or wire feeder) may include multiple fluid paths through which to provide fluid from multiple fluid reservoirs to multiple welding-type tools. The power supply may be configured to automatically control fluid flow rates through the fluid paths via proportional valves. Further, the welding-type power supply may be configured to allow and/or prohibit mixing of fluids from different flow paths via control of various valves.

A mixed gas supply device includes: a hydrogen gas generation unit that includes a hydrogen generator, the hydrogen generator generating hydrogen gas by decomposition of water and supplying the hydrogen gas; a nitrogen gas generation unit that includes a filter, the filter separating nitrogen gas from air and supplying the nitrogen gas; a gas mixing unit that mixes the supplied hydrogen gas and the supplied nitrogen gas and generates mix gas including the hydrogen gas and the nitrogen gas; and a single base on which the hydrogen gas generation unit, the nitrogen gas generation unit, and the gas mixing unit are mounted, the hydrogen gas generation unit, the nitrogen gas generation unit, and the gas mixing unit being integrated. The gas mixing unit supplies the generated mixed gas to outside.

A control valve features a first housing and a second housing. The first housing includes a first inlet port having a first inlet port orifice member with a first inlet port orifice size configured to provide a first inlet fluid with a first inlet volumetric flow rate, the first inlet port orifice member being detachably coupled inside the first inlet port; includes a second inlet port having a second inlet port orifice member with a second inlet port orifice size configured to provide a second inlet fluid with a second inlet volumetric flow rate, the second inlet port orifice member being detachably coupled inside the second inlet port; and includes a first housing rim configured to extend from the first fixed inlet and the second fixed inlet. The second housing includes a second housing rim coupled to the first housing rim and configured to form a mixture chamber to mix the first inlet fluid received from the first fixed inlet orifice and the second inlet fluid received from the second fixed inlet orifice and provide a mixture chamber fluid; and an outlet port having an outlet port orifice with an outlet port orifice size configured to provide the mixture chamber fluid as an outlet port fluid having an outlet volumetric flow rate. The outlet port fluid has a mixture ratio of the first inlet fluid and the second inlet fluid for a particular application that depends on dimensions of the first inlet port orifice size, the second inlet port orifice size and the outlet port orifice size.

A gaseous fuel mixer assembly for an engine includes a mixer housing forming gas delivery openings, and positioned to extend across a flow path formed by an intake conduit for the engine. A spool valve is within a central bore in the mixer housing and includes gas distribution openings selectively connectable to the gas delivery openings by moving the spool valve within the mixer housing using a piezoelectric actuator coupled with the spool valve by way of a pivot arm. Sealing lands of the spool valve are in an alternating arrangement with the gas distribution openings, such that at the closed position the sealing lands block the gas distribution openings from the gas delivery openings, and at the open position the respective openings are fluidly connected.

Gas injectors for providing uniform flow of fluid are provided herein. The gas injector includes a plenum body. The plenum body includes a recess, a protrusion adjacent to the recess and extending laterally away from the plenum body, and a plurality of nozzles extending laterally from an exterior surface of the plenum body. The plenum body has a plurality of holes in an exterior wall of the plenum body. Each nozzle is in fluid communication with an interior volume of the plenum body. By directing the flow of fluid, the gas injector provides for a uniform deposition.