B01F35/2132

Systems and methods for generating a conductive liquid comprising deionized water with ammonia gas dissolved therein

Systems and methods are described for dissolving ammonia gas in deionized water. The system includes a deionized water source and a gas mixing device including a first inlet for receiving ammonia gas, a second inlet for receiving a transfer gas, and a mixed gas outlet for outputting a gas mixture including the ammonia gas and the transfer gas. The system includes a contactor that receives the deionized water and the gas mixture and generates deionized water having ammonia gas dissolved therein. The system includes a sensor in fluid communication with at least one inlet of the contactor for measuring a flow rate of the deionized water, and a controller in communication with the sensor. The controller sets a flow rate of the ammonia gas based on the flow rate of the deionized water measured by the sensor, and a predetermined conductivity set point.

DEVICE FOR METERING AND/OR PREPARING A MIXTURE, AND CONTAINER FOR HOLDING AT LEAST ONE FLUID
20220370966 · 2022-11-24 ·

Shown and described is a device (100) for dosing and/or preparing a mixture of substances, in particular a medium or a buffer, the device (100) comprising: at least one first container (102), which is designed to receive at least one solid component, at least one first dosing device (104) for dosing the at least one solid component, the first dosing device (104) being connected to or can be connected to the first container (102), at least one fluid connection (110, 110′) to connect to at least one second container (103, 103′), which is designed to receive at least one fluid, and/or a fluid line for supplying a fluid, and at least one second dosing device (108, 108′) for dosing the at least one fluid, the second dosing device (108, 108′) being connected or connectable to the second container (103, 103′) or to the fluid line, respectively. the fluid line, wherein the at least one second container (103, 103′) and/or the at least one second dosing device (108, 108′) are replaceable and are developed as disposable articles, and/or wherein the at least one first container (102) and/or the at least one first dosing device (104) are replaceable and are developed as disposable articles.

Chemical liquid preparation method, chemical liquid preparation device, and substrate processing device

A chemical liquid preparation method of preparing a chemical liquid for treating a film formed on a substrate, including a gas dissolving process in which an oxygen-containing gas and an inert-gas-containing gas are dissolved in the chemical liquid by supplying the oxygen-containing gas which contains oxygen gas and the inert-gas-containing gas which contains an inert gas to a chemical liquid, wherein in the gas dissolving process, a dissolved oxygen concentration in the chemical liquid is adjusted by setting a mixing ratio between the oxygen-containing gas and the inert-gas-containing gas supplied to the chemical liquid as a mixing ratio corresponding to a predetermined target dissolved oxygen concentration.

Dispenser and solution dispensing method

A dispenser includes a dock configured to be fixed in place at a use device and a solid product holder configured to be removably secured to the dock. The dock has a first portion including a fixation element that is configured to fix the dock in place at the use device and a second portion including a receiving structure. The solid product holder includes a retaining structure, a base, and a support structure. The retaining structure is configured to removably secure the solid product holder to the receiving structure at the second portion of the dock. The base defines a plurality of apertures that form an open area at which the liquid is received at the solid product holder. The support structure extends from the base and defines an internal volume for holding the solid product at the solid product holder.

System for continuous make-down of powder material

A system for continuously making-down a dry powder material is provided. The system may include a liquid supply system, a material feed system, a vessel, a filter, and an agitator. The vessel may receive a continuous supply of liquid from the liquid supply system and a continuous supply of dry powder from the material feed system. The liquid and material may be discharged continuously from the vessel. A filter may sealingly extend across the outlet to filter the solution exiting the vessel. The filter may include an upstream surface in contact with the inner volume of the vessel. The agitator may be disposed within the vessel and may be configured to agitate the contents of the vessel. The agitator may include a wiping member configured to contact the upstream surface of the filter while agitating the contents.

System and method for preparation of a medical fluid
11400426 · 2022-08-02 · ·

Systems and apparatuses for preparing a medical fluid are disclosed. In an example embodiment, a system is configured to initially control a dosing of a first concentrate, while not feeding a second concentrate, under feedback control via a concentration sensor to a first pump to feed the first concentrate. When a concentration has reached a preselected concentration level, a value for a feeding parameter for the first pump to feed the first concentrate is determined. Additionally, the system is configured to control the dosing of both the first and the second concentrates by switching the feedback control via the concentration sensor, from control of the first pump to control of a second pump to feed the second concentrate. During this time, the system controls the first pump to feed the first concentrate based on the determined value of the feeding parameter.

Medicament Preparation Devices, Methods, and Systems
20220241478 · 2022-08-04 · ·

A system for mixing a batch of medicament has a pump actuator, control valve actuators, a source of concentrate, and a purified water source, all connected by a fluid circuit. A controller controls various control valves to open fluid channels from the source of concentrate and from the purified water source to connect a junction of the fluid circuit to the concentrate container and the purified water source. The controller also controls the pump actuator and a water pump to flow water and concentrate through the junction into a mixing container, such that the mixture of the concentrate and the water requires additional dilution to form a ready-to-use medicament. The controller samples the mixture and calculate an additional quantity of water to add based on the sampling.

GENERATING METHOD FOR GENERATING ULTRA-FINE BUBBLE-CONTAINING LIQUID CONTAINING ULTRA-FINE BUBBLES AND MANUFACTURING APPARATUS FOR LIQUID CONTAINING ULTRA-FINE BUBBLES

Provided is a generating method for generating an ultra-fine bubble-containing liquid in which multiple types of UFB s of different gas components are mixed at a desired concentration ratio, and a manufacturing apparatus for a liquid containing ultra-fine bubbles. Multiple types of UFB-containing liquids are generated for each gas contained by the UFBs, and the UFB-containing liquids are mixed with each other based on a mix proportion of a desired UFB concentration.

METHOD AND SYSTEM FOR DRILLING FLUID CONDITION MONITORING

A method may include supplying water for a mud mixture to a mixing tank according to a predetermined volume. The method may further include supplying, using a rheological sensor, a viscosifier to the mud mixture in the mixing tank until the mud mixture achieves one or more predetermined rheological values. The method may further include supplying, using a density sensor, a weighting agent to the mud mixture in the mixing tank until the mud mixture achieves a predetermined specific gravity value. The method may further include supplying, using a pH sensor, a buffering agent to the mud mixture in the mixing tank until the mud mixture achieves a predetermined pH value to produce a drilling fluid.

SUBSTRATE TREATMENT APPARATUS AND SUBSTRATE TREATMENT METHOD
20220280969 · 2022-09-08 · ·

In one embodiment, a substrate treatment apparatus includes a mixer configured to mix a first liquid including a metal element and a second liquid being basicity to generate a third liquid including the metal element and being basicity. The apparatus further includes a supplier configured to supply the third liquid to a substrate. The apparatus further includes a first flow path configured to convey the third liquid from the mixer to the supplier not through a filter that removes particles from the third liquid.