A material for separating and pumping oxygen is disclosed. The material is a zeolite doped with a chemical element having an electron density of between 30 kJ/mol and 150 kJ/mol. The material is configured for controllable oxygen desorption between 150 C. and 300 C. and pumping the released oxygen into an area having an ambient pressure of less than 100 pascals.

A non alpha controlled plating bath including Tin species and a trace amount of Polonium species is utilized in a plating tool. The plating tool includes a Polonium filter element to remove Polonium species from the plating bath to selectively plate Tin upon a plating cathode. The filter may include a Titanium inner portion surrounding by a stannic oxide exterior. The filter may reduce the Polonium species by having the polonium absorb and then enter within the stannic oxide matrix. The filter may be located within the plating tool reservoir or filter housing. The filter may be fabricated by forming Tin upon a Titanium filter backbone and converting the Tin to stannic oxide.

A material for separating and pumping oxygen is disclosed. The material is a zeolite doped with a chemical element having an electron density of between 30 kJ/mol and 150 kJ/mol. The material is configured for controllable oxygen desorption between 150 C. and 300 C. and pumping the released oxygen into an area having an ambient pressure of less than 100 pascals.

A gas adsorption/desorption unit 2 according to this invention includes: one or more honeycomb structures 20 including a honeycomb structure portion 24 having an outer peripheral wall 240 and partition walls 241 provided on an inner side of the outer peripheral wall 240, the partition walls 241 defining a plurality of cells 241a each extending from one end face to other end face of the honeycomb structure portion 24 to form a flow path; and at least one induction heating coil 21 provided around the periphery of each of the one or more honeycomb structures 20, wherein at least one of the one or more honeycomb structures 20 comprises a magnetic material and a gas adsorbent.

A selective metamaterial absorber and method for fabricating the same is disclosed. The method includes deposing a first metal layer on a first surface of a substrate and on a plurality of nanowires extending outward from the first surface of the substrate, the plurality of nanowires forming an array on the first surface, the substrate further including a second surface opposite the first surface. The first metal layer may be deposed using conformally sputtering. The substrate and the plurality of nanowires may be composed of silicon, and the first metal layer may be composed of tungsten. The first metal layer may be composed of a material having a penetration depth for a wavelength range of interest. The first metal layer may be at least three times thicker than the penetration depth.

A selective metamaterial absorber and method for fabricating the same is disclosed. The method includes deposing a first metal layer on a first surface of a substrate and on a plurality of nanowires extending outward from the first surface of the substrate, the plurality of nanowires forming an array on the first surface, the substrate further including a second surface opposite the first surface. The first metal layer may be deposed using conformally sputtering. The substrate and the plurality of nanowires may be composed of silicon, and the first metal layer may be composed of tungsten. The first metal layer may be composed of a material having a penetration depth for a wavelength range of interest. The first metal layer may be at least three times thicker than the penetration depth.