A dispensing system can include a material delivery assembly that includes a tubular reservoir with a tubular extension, where the tubular reservoir includes a longitudinal axis; a nozzle body, where the tubular extension fluidly couples the tubular reservoir to the nozzle body; and a rotor coupling that operatively couples to the material delivery assembly for rotation of the tubular reservoir about its longitudinal axis.

An insulation-coating overlay control system, an electrode plate for a secondary battery, and an insulation-coating overlay control method are provided. I system includes an insulation coater configured to coat an insulating material to allow the insulating material to cover a partial region of a coated part and a non-coated part in an electrode plate along a boundary part. The coated part has an electrode slurry coated thereon and the non-coated part does not have the electrode slurry coated thereon. An insulation-coating width measuring means is configured to measure an overlay width. An insulation coater moving means is configured to move the insulation coater and a controller is configured to control the insulation coater moving means to adjust the overlay width by comparing the measured overlay width with a predetermined overlay width setting range or an overlay width reference value.

Embodiments of the present disclosure generally relate to apparatus and methods for manufacturing continuous sucker rods with protective coatings. One embodiment provides a coating system including a first drive station disposed on a first end of a coating line, a second drive station disposed on a second end of the coating line to move a continuous sucker rod along the coating line from the first drive station to the second drive station, a heater disposed along the coating line, and a first coating station disposed along the coating line.

Exemplary coating devices and exemplary coating methods for coating components with a coating agent, e.g., for painting motor vehicle body components with a paint, are disclosed. An exemplary coating device comprises an application device that applies the coating agent. The application device may include a paint head that discharges the coating agent out of at least one coating agent nozzle.

An apparatus including a caliper measuring sensor arrangement, a mass measuring sensor arrangement, and a stabilizing arrangement. The caliper measuring sensor arrangement measures caliper of the web. The mass measuring sensor arrangement measures at least one of the following: a basis weight of the web, a moisture content, a water weight, dry weight of the web. The stabilizing arrangement stabilizes the web. The stabilizing arrangement including at least a part of the mass measuring sensor arrangement.

The present invention is to form an organic film on a substrate having a pattern formed on a front surface thereof and configured to: apply an organic material onto the substrate; then thermally treat the organic material to form an organic film on the substrate; and then perform ultraviolet irradiation processing on the organic film to remove a surface of the organic film down to a predetermined depth, thereby appropriately and efficiently form the organic film on the substrate.

Object: A liquid material application apparatus and a liquid material application method are provided with which a liquid material can be discharged in a predetermined discharge amount per unit time regardless of a relative moving speed in a series of application works.

Solution: The liquid material application apparatus includes a discharge head, a robot moving the discharge head relative to a workpiece, a movement control unit controlling relative movement of the discharge head and the workpiece, and a discharge control unit controlling an operation of discharging a liquid material from a discharge head, wherein the discharge control unit executes, in a switchable manner in accordance with an application program, first mode discharge control of changing a discharge amount of the liquid material, which is discharged from the discharge head per unit time, depending on a relative moving speed between the discharge head and the workpiece, and second mode discharge control of operating the discharge head to discharge the liquid material in a predetermined discharge amount per unit time regardless of the relative moving speed. The liquid material application method is implemented using the liquid material application apparatus.

Application of liquid material is carried out without causing variations in discharge amount even on a stage under heating while temperature of a liquid material is adjusted by a temperature control device. A liquid material discharge device includes a discharge port, a liquid chamber in communication with the discharge port, and a temperature control device adjusting a temperature of the liquid chamber, the liquid material discharge device discharging the liquid material from the discharge port while a workpiece and the discharge port are moved relative to each other. The liquid material discharge device also includes a coolant flow path through which a coolant for heat exchange with the temperature control device flows, and a discharge control device controlling a discharge operation. An application device including the liquid material discharge device and an application method using the application device are also provided.

A semiconductor processing apparatus includes a wafer support assembly, a temperature sensor integrated in the wafer support assembly for measuring a temperature of the wafer support assembly, and a signal transmission device that wirelessly transmits a signal relating to a temperature measurement obtained by the temperature sensor to an external control module.

Object: A liquid material application apparatus and a liquid material application method are provided with which a liquid material can be discharged in a predetermined discharge amount per unit time regardless of a relative moving speed in a series of application works. Solution: The liquid material application apparatus includes a discharge head, a robot moving the discharge head relative to a workpiece, a movement control unit controlling relative movement of the discharge head and the workpiece, and a discharge control unit controlling an operation of discharging a liquid material from a discharge head, wherein the discharge control unit executes, in a switchable manner in accordance with an application program, first mode discharge control of changing a discharge amount of the liquid material, which is discharged from the discharge head per unit time, depending on a relative moving speed between the discharge head and the workpiece, and second mode discharge control of operating the discharge head to discharge the liquid material in a predetermined discharge amount per unit time regardless of the relative moving speed. The liquid material application method is implemented using the liquid material application apparatus.