A roadway or pavement sweeper with multiple sweeping modes for the removal of debris from a swept surface may, in some embodiments, include a sweeper vehicle having a pair of side-brooms independently movable between a retracted and extended position for sweeping debris into an area therebetween and at least one material-transfer broom to sweep a portion of the debris accumulated between the side-brooms as the vehicle moves in its direction of travel. A fan-driven suction-inlet may be provided at or adjacent each side of the vehicle. The at least one material-transfer broom may rotate in a first or other direction to transfer debris for entrainment into a selected suction-inlet for transfer to a debris hopper. Other embodiments are also described.

A rotational brush for cleaning laps of siding featuring a set of rotational tiered brush elements complementary to the profile of laps of siding. The tiered brush elements attach to an elongated axle connectable to a motor drive imparting a rotational force to the brush, which when positioned in contact with laps of siding, further imparts a scrubbing action for the rotational brush to remove debris from laps of siding.

A wash equipment assembly for a car wash and method of operating the equipment are described. For example, the assembly includes a cleaning element configured to clean a vehicle, an arm assembly operably attached to the cleaning element and configured to move the cleaning element to a vehicle cleaning position, the arm movably fixed to a support at a first end and the cleaning element mounted on the arm at a second end, a controlled locator for positioning the arm relative to the support such that the cleaning equipment is moved to the vehicle cleaning position, and a sensor for evaluating an actual orientation of the cleaning element relative to a default orientation of the cleaning element. In certain implementations, the controlled locator can modify the position of the arm in response to a signal from the sensor, thereby providing a closed loop control system.

A roll cleaning device according to one example of the present invention comprises at least one knife, wherein the at least one knife comprises a cleaning part surrounding a target roll to be in contact with the outer circumferential surface of the target roll on which foreign substances are present, and an operating part, which is connected to the cleaning part, for moving the at least one knife along the circumferential direction on the outer circumferential surface of the target roll.

A roll cleaning device according to one example of the present invention comprises at least one knife, wherein the at least one knife comprises a cleaning part surrounding a target roll to be in contact with the outer circumferential surface of the target roll on which foreign substances are present, and an operating part, which is connected to the cleaning part, for moving the at least one knife along the circumferential direction on the outer circumferential surface of the target roll.

A substrate cleaning device includes a substrate holder, a lower-surface brush, a first liquid nozzle and a second liquid nozzle. The substrate holder holds a substrate in a horizontal attitude. The lower-surface brush is configured to be movable between a processing position for cleaning of the substrate and a waiting position that overlaps with the substrate held by the substrate holder in an up-and-down direction. Further, the lower-surface brush is configured to be rotatable about an axis extending in the up-and-down direction. The lower-surface brush cleans a lower surface of the substrate by coming into contact with the lower surface of the substrate. The first liquid nozzle discharges a cleaning liquid to a center portion of the lower-surface brush, at a waiting position. The second liquid nozzle discharges a cleaning liquid to an end portion of the lower-surface brush, at the waiting position.

A substrate cleaning device includes a substrate holder, a lower-surface brush, a first liquid nozzle and a second liquid nozzle. The substrate holder holds a substrate in a horizontal attitude. The lower-surface brush is configured to be movable between a processing position for cleaning of the substrate and a waiting position that overlaps with the substrate held by the substrate holder in an up-and-down direction. Further, the lower-surface brush is configured to be rotatable about an axis extending in the up-and-down direction. The lower-surface brush cleans a lower surface of the substrate by coming into contact with the lower surface of the substrate. The first liquid nozzle discharges a cleaning liquid to a center portion of the lower-surface brush, at a waiting position. The second liquid nozzle discharges a cleaning liquid to an end portion of the lower-surface brush, at the waiting position.

Cleaning systems proposed in the art have technical construct limitations in the cleaning mechanisms used, which leads to a lower ratio of power consumed to area cleaned, directly affecting the cleaning efficiency. Thus, an Unmanned Aerial Vehicle (UAV) Propelled Autonomous Multiplane Cleaning System (UPAMCS) is disclosed. An UAV and Mopping Interface Mechanism (UAV-MIM) connects a UAV to one or more mopping systems comprising an epicyclic gear driven moppers with no additional power devices used. A maneuvering mechanism disclosed enables the UAV to propel the mopping systems to reach any geometric shape or inclination. The UPAMCS provides cost, time, and power efficient surface cleaning. The UPAMCS is also equipped with vision cameras and LiDAR for guidance during landing and crawling over surfaces along with additional surface defect detection by processing the captured images.

A cleaning apparatus includes: a rotation support section that supports and rotates a substrate; a chemical liquid supply section that supplies a chemical liquid other than an organic solvent to a surface of the substrate; an organic solvent supply section that supplies an organic solvent to a surface of the substrate; and cleaning means that cleans a surface of the substrate supported by the rotation support section using a chemical liquid from the chemical liquid supply section, and then cleans a surface of the substrate using an organic solvent from the organic solvent supply section with the substrate being kept supported by the rotation support section.

A cleaning apparatus includes: a rotation support section that supports and rotates a substrate; a chemical liquid supply section that supplies a chemical liquid other than an organic solvent to a surface of the substrate; an organic solvent supply section that supplies an organic solvent to a surface of the substrate; and cleaning means that cleans a surface of the substrate supported by the rotation support section using a chemical liquid from the chemical liquid supply section, and then cleans a surface of the substrate using an organic solvent from the organic solvent supply section with the substrate being kept supported by the rotation support section.