A method of pre-treating a contaminated medical instrument that is to undergo decontamination involves inserting a distal tip of the instrument into a distal tip protector. The distal tip of the instrument is inserted through a rupturable resilient seal into an internal cavity of the protector that contains a fluid. The distal tip protector thereby maintains a fluid around the distal tip of the instrument until the distal tip protector is removed to allow reprocessing of the instrument to take place, facilitating decontamination of the instrument.

Provided is a substrate treating apparatus comprising: a support unit for supporting the substrate; a discharge unit for discharging an organic solvent to the substrate supported on the support unit; and a solvent supply unit for supplying the organic solvent in a liquid state to the discharge unit at atmospheric pressure to a temperature higher than the boiling point of the organic solvent.

The present invention relates to a withdrawal plate suitable for an apparatus for withdrawing a sprayed paint to solve a failure of a painting facility and a contamination problem due to paint sludge, which includes: a square frame constituted by left and right side frames 91, an upper frame 92, and a base frame 93; and slats 94 arranged at a predetermined interval within the square frame, in which the left and right side frames 91 facing each other are included in one direction, and the slat 94 is fixed the left and right side frames 91 in an oblique state so that a front is lifted up and moves down backwards when viewed from the side, and multiple slats are consecutively arranged at a predetermined interval in a vertical direction.

A surface cleaning apparatus, such as a steam mop, includes a steam delivery system having a steam delivery pathway. A fragrance dispenser for receiving a fragrant material is provided on the apparatus, and a portion of the steam delivery pathway is in in heat exchange relationship with the fragrance dispenser to heat the fragrant material in the fragrance dispenser by heat transfer from the steam in the pathway. Fragrance is dispensed from apparatus via heat transfer utilizing the steam pathway as a thermal radiation source.

The present invention provides a method for allowing a used inert material that has been subjected to a reaction once, which is disposed of in the background art, to be used again as well as a brand-new one. A method of recovering an inert material of the present invention is characterized by in the fixed-bed reactor, the inert material is loaded in an inert material layer provided between a first-stage catalyst layer and a second-stage catalyst layer, the first-stage catalyst layer is loaded with a first-stage catalyst for producing acrolein from propylene, and the second-stage catalyst layer is loaded with a second-stage catalyst for producing acrylic acid from acrolein, the method comprising the steps of: extracting the inert material from the fixed-bed reactor; washing the extracted inert material; and screening the washed inert material.

A method of pre-treating a contaminated medical instrument that is to undergo decontamination involves inserting a distal tip of the instrument into a distal tip protector. The distal tip of the instrument is inserted through a rupturable resilient seal into an internal cavity of the protector that contains a fluid. The distal tip protector thereby maintains a fluid around the distal tip of the instrument until the distal tip protector is removed to allow reprocessing of the instrument to take place, facilitating decontamination of the instrument.

A method of processing a plurality of substrates includes immersing the plurality of substrates into a bath solution contained in a bath chamber; generating gas bubbles in the bath solution; projecting light from a light source toward the bath chamber; generating light sensor data by capturing light emanating off the bath chamber after interacting with the gas bubbles with a light sensor; and converting the light sensor data into a metric for the bath solution.

A method for treating a substrate, including a solvent processing step of supplying an organic solvent onto the substrate to treat the substrate, a drying step of drying the substrate to remove the organic solvent on the substrate, and a bake step of heating the substrate to thermally decompose an impurity adhering to the substrate, where the drying step and the bake step are performed in different chambers.

According to one embodiment, a semiconductor manufacturing device includes a chemical solution preparation tank configured to prepare a solution; a chamber configured to discharge the chemical solution prepared at the chemical solution preparation tank to a substrate; a pressure sensor configured to measure a pressure inside the chemical solution preparation tank; and a variable opening valve arranged between the chemical solution preparation tank and an exhaust pipe.

A chemical mechanical polishing system includes a platen to support a polishing pad, a boiler, a component that is movable between a first position spaced from the polishing pad and a second position in contact with the polishing pad, a plurality of nozzles to direct steam from the boiler onto the component of the polishing system when located at the first position, an actuator to move the component from the first position to the second position in contact with the polishing pad, and a controller configured to cause the treatment station to direct the steam onto the component to clean the component, and cause the actuator to move the cleaned component from the treatment station into contact with the polishing pad.