A method of pre-treating a contaminated medical instrument that is to undergo decontamination involves inserting a distal tip of the instrument into a distal tip protector. The distal tip of the instrument is inserted through a rupturable resilient seal into an internal cavity of the protector that contains a fluid. The distal tip protector thereby maintains a fluid around the distal tip of the instrument until the distal tip protector is removed to allow reprocessing of the instrument to take place, facilitating decontamination of the instrument.

An apparatus for washing solid particles removed from a hydrocarbon-containing fluid produced from an oil and gas production facility using a company automated unit. The apparatus comprises an inlet that carries a mixture of solids particles and water flushed from a de-sander.

The present disclosure provides a method and apparatus for cleaning a workpiece, and a method and apparatus for cleaning a ventless tire segment mold. The method for cleaning a workpiece comprises: heating the workpiece to a preset temperature; and applying a cleaning solution onto the workpiece so that the cleaning solution is vaporized instantaneously to form a micro-explosion at each shocking point, thereby peeling dirt off the workpiece and achieving the purpose of workpiece cleaning. The apparatus for cleaning a workpiece comprises: a heating device for heating the workpiece into a preset temperature range, and a cleaning device for applying a cleaning solution onto the workpiece so that the cleaning solution is vaporized instantaneously to form a micro-explosion at each shocking point, thereby peeling dirt off the workpiece and achieving the purpose of workpiece cleaning. The present disclosure not only cleans the dirt on the surface of the workpiece, but also makes a significant breakthrough in the cleaning of the gaps of micron or nano scale on the workpiece. The present disclosure has the characteristics of lower cost, simple cleaning, thorough dirt removal, etc.

According to one embodiment, a semiconductor manufacturing device includes a chemical solution preparation tank configured to prepare a solution; a chamber configured to discharge the chemical solution prepared at the chemical solution preparation tank to a substrate; a pressure sensor configured to measure a pressure inside the chemical solution preparation tank; and a variable opening valve arranged between the chemical solution preparation tank and an exhaust pipe.

Impurities are removed from plastic by cleaning using, as a cleaning medium, water heated to a level where a dielectric constant is 60 or less.

An apparatus for cleaning drinking straws has a canister enclosing a plurality of carriers for supporting drinking straws to be cleaned, and a subsystem supplying water heated to a sanitizing temperature to the carriers. Straws are placed in or on the carriers, and the heated water flows around the inside and the outside of the straws.

Provided is a substrate treating apparatus comprising: a support unit for supporting the substrate; a discharge unit for discharging an organic solvent to the substrate supported on the support unit; and a solvent supply unit for supplying the organic solvent in a liquid state to the discharge unit at atmospheric pressure to a temperature higher than the boiling point of the organic solvent.

A steam generating apparatus includes a canister having a water inlet and a steam outlet. The steam generating apparatus includes a barrier in the canister dividing the canister into a lower chamber and an upper chamber. The lower chamber is positioned to receive water from the water inlet. The steam outlet valve receives steam from the upper chamber. The barrier has apertures for steam to pass from the lower chamber to the upper chamber and allows for condensation to pass from the upper chamber to the lower chamber. The steam generating apparatus includes a heating element configured to apply heat to a portion of lower chamber. The steam generating apparatus includes a controller configured to modify the flow rate of water through the water inlet to keep a water level above the heating element and below the steam outlet.

An apparatus for steam treatment of a carrier head or a substrate in a chemical mechanical polishing system includes a load cup, a pedestal in a cavity defined by the load cup, the pedestal configured to receive a substrate from or supply a substrate to a carrier head, a boiler to generate steam, one or more nozzles positioned to direct steam inwardly into the cavity defined by the load cup, and a supply line running from the boiler to the one or more nozzles to supply steam to the one or more nozzles.

A method of cleaning for a chemical mechanical polishing system includes directing a gas that includes steam from an orifice onto a component in the polishing system while the component is spaced away from a polishing pad of the polishing system to clean the component, and moving the component into contact with the polishing pad.