Disclosed is a surface plate cleaning apparatus which cleans the surfaces of surface plates having grooves. The surface plate cleaning apparatus includes an injection unit including an injection head, and at least one first injection nozzle and at least one second injection nozzle, and a moving unit configured to move the injection unit, the at least one first injection nozzle includes a first injection hole to inject a first cleaning solution, the at least one second injection nozzle includes a second injection hole to inject a second cleaning solution, a first separation distance from the upper surface of the injection head to the first injection hole and a second separation distance from the upper surface of the injection head to the second injection hole are different, and a first injection angle of the first cleaning solution and a second injection angle of the second cleaning solution are different.

Disclosed is a surface plate cleaning apparatus which cleans the surfaces of surface plates having grooves. The surface plate cleaning apparatus includes an injection unit including an injection head, and at least one first injection nozzle and at least one second injection nozzle, and a moving unit configured to move the injection unit, the at least one first injection nozzle includes a first injection hole to inject a first cleaning solution, the at least one second injection nozzle includes a second injection hole to inject a second cleaning solution, a first separation distance from the upper surface of the injection head to the first injection hole and a second separation distance from the upper surface of the injection head to the second injection hole are different, and a first injection angle of the first cleaning solution and a second injection angle of the second cleaning solution are different.

A dressing device including: a disk that has an opening on an inside, the disk dressing a polishing surface for polishing a substrate; a rotatable holder, the disk being coupled to a lower surface side of the holder, the holder being provided with a first flow passage that passes from a lower surface to an upper surface, the lower surface being inside an outer edge of the opening of the disk; and a housing that is provided with a distance from the upper surface of the holder, the housing being provided with a second flow passage in an interior, the housing being fixed such that an opening of the second flow passage faces the upper surface of the holder, the second flow passage being connected with a supply source and a suction source of process liquid.

A dressing device including: a disk that has an opening on an inside, the disk dressing a polishing surface for polishing a substrate; a rotatable holder, the disk being coupled to a lower surface side of the holder, the holder being provided with a first flow passage that passes from a lower surface to an upper surface, the lower surface being inside an outer edge of the opening of the disk; and a housing that is provided with a distance from the upper surface of the holder, the housing being provided with a second flow passage in an interior, the housing being fixed such that an opening of the second flow passage faces the upper surface of the holder, the second flow passage being connected with a supply source and a suction source of process liquid.

Provided is a dummy disk which enables a surface height measurement instrument to accurately measure heights of a table surface of a polishing table. A dummy disk is fixed to a disk holder of a dresser when heights of a table surface of a polishing table are measured. The dummy disk includes a first surface capable of coming into contact with the disk holder and a second surface which is on an opposite side of the first surface. The second surface has a plurality of liquid discharge channels, and the plurality of liquid discharge channels extends from one end of the second surface to the other end.

Provided is a dummy disk which enables a surface height measurement instrument to accurately measure heights of a table surface of a polishing table. A dummy disk is fixed to a disk holder of a dresser when heights of a table surface of a polishing table are measured. The dummy disk includes a first surface capable of coming into contact with the disk holder and a second surface which is on an opposite side of the first surface. The second surface has a plurality of liquid discharge channels, and the plurality of liquid discharge channels extends from one end of the second surface to the other end.

An abrasive article includes a first abrasive element, a second abrasive element, a resilient element having first and second major surfaces, and a carrier. The first element and the second abrasive element each comprises a first major surface and a second major surface. At least the first major surfaces of the first and second abrasive elements comprise a plurality of precisely shaped features. The abrasive elements comprise substantially inorganic, monolithic structures.

An abrasive article includes a first abrasive element, a second abrasive element, a resilient element having first and second major surfaces, and a carrier. The first element and the second abrasive element each comprises a first major surface and a second major surface. At least the first major surfaces of the first and second abrasive elements comprise a plurality of precisely shaped features. The abrasive elements comprise substantially inorganic, monolithic structures.

A dressing device including: a disk that has an opening on an inside, the disk dressing a polishing surface for polishing a substrate; a rotatable holder, the disk being coupled to a lower surface side of the holder, the holder being provided with a first flow passage that passes from a lower surface to an upper surface, the lower surface being inside an outer edge of the opening of the disk; and a housing that is provided with a distance from the upper surface of the holder, the housing being provided with a second flow passage in an interior, the housing being fixed such that an opening of the second flow passage faces the upper surface of the holder, the second flow passage being connected with a supply source and a suction source of process liquid.

A dressing device including: a disk that has an opening on an inside, the disk dressing a polishing surface for polishing a substrate; a rotatable holder, the disk being coupled to a lower surface side of the holder, the holder being provided with a first flow passage that passes from a lower surface to an upper surface, the lower surface being inside an outer edge of the opening of the disk; and a housing that is provided with a distance from the upper surface of the holder, the housing being provided with a second flow passage in an interior, the housing being fixed such that an opening of the second flow passage faces the upper surface of the holder, the second flow passage being connected with a supply source and a suction source of process liquid.