Patent classifications
B29C33/62
Method to improve optical properties of stabilized polycarbonate compositions
Methods for producing transparent polycarbonate articles include melting a composition at a temperature of 300 to 390 C., extruding the melted composition to form a strand, cooling the strand of extruded composition, cutting the cooled strand into pellets, drying the pellets at a temperature of 50 to 140 C. and injecting molding or extruding the pellets at a temperature of 300 to 380 C. to form an article. The composition can comprise a moisture content of 0.1 to 5 wt. % and a crystalline additive having a melting point of at least 280 C., a heat of fusion greater than or equal to 1.0 Joule/gram (J/g). The composition can be cooled to at least 20 C. below the glass transition temperature of the polycarbonate.
Process for transfer imprinting
A process for transfer imprinting using a novel family of anti-sticking layers, such as for nanoimprint lithography processes, is described.
Process for transfer imprinting
A process for transfer imprinting using a novel family of anti-sticking layers, such as for nanoimprint lithography processes, is described.
THICK POLYMER COATING OF A SUBSTRATE APPARATUS AND METHOD
A method for applying a polymer coating to a substrate wherein the resultant layer of polymer on the substrate has a substantial thickness. A mixture of polymer material, including reactor bead polymer and ground polymer, may be used in a powder coating process to achieve thicker polymer layers. In separate embodiments, the resultant polymer layer may remain on the substrate or may be removed from the substrate.
Deposition assembly and methods for depositing mold release layers on substrates
A deposition assembly generally comprises a first deposition apparatus that is configured to receive a substrate, such as a glass mandrel. The first deposition apparatus is further configured to deposit a plurality of first monolayer molecules onto at least a surface of the substrate to generate a first coating structure on the substrate. A second deposition apparatus is coupled to the first deposition apparatus, and wherein the second deposition apparatus is configured to deposit a plurality of second monolayer molecules onto at least the surface of the substrate such that the second monolayer molecules are diffused through the first coating structure and at least one aperture is filled by at least one of the second monolayer molecules to generate at least one mold release layer on at least the surface of the substrate.
Deposition assembly and methods for depositing mold release layers on substrates
A deposition assembly generally comprises a first deposition apparatus that is configured to receive a substrate, such as a glass mandrel. The first deposition apparatus is further configured to deposit a plurality of first monolayer molecules onto at least a surface of the substrate to generate a first coating structure on the substrate. A second deposition apparatus is coupled to the first deposition apparatus, and wherein the second deposition apparatus is configured to deposit a plurality of second monolayer molecules onto at least the surface of the substrate such that the second monolayer molecules are diffused through the first coating structure and at least one aperture is filled by at least one of the second monolayer molecules to generate at least one mold release layer on at least the surface of the substrate.
Method for Reducing Drawing Force in Forming Process of Photocurable Material
The present invention provides a method for reducing a drawing force in a forming process of a photocurable material by adding a radical scavenger capable of terminating free radical polymerization into a substrate for carrying the photocurable material. The method comprises: providing a mold release composition at least comprising a radical scavenger and a molding agent; and forming a mold release film from the mold release composition by curing forming or by combining with an upper surface of a plate, thereby preparing the substrate. In this way, during the light curing reaction of the photocurable material by irradiation with a light source, the radical scavenger in the upper surface of the substrate contacting with the photocurable material can re act with free radicals in the photocurable material, such that the photocurable material forms an uncured layer for which light curing does not occur on the upper surface of the substrate.
CURING MEMBRANE FOR A TIRE
The curing bladder for a tire has a shape of revolution around a central axis and comprises a flexible wall made of crosslinked rubber. The surface of the wall is covered with a coating film made of a non-stick composition. When the bladder is non-inflated, the coating film has a variable thickness over the surface.
CURING MEMBRANE FOR A TIRE
The curing bladder for a tire has a shape of revolution around a central axis and comprises a flexible wall made of crosslinked rubber. The surface of the wall is covered with a coating film made of a non-stick composition. When the bladder is non-inflated, the coating film has a variable thickness over the surface.
Photocurable composition, method for forming a pattern, and method for producing a photocured product
It is intended to provide a photocured product that is prepared using the photo-imprint method and has favorable pattern precision and improvement in pattern defects. The present invention provides a photocured product obtained by irradiating a coating film in contact with a mold with light, the photocured product containing a fluorine atom-containing surfactant, wherein of secondary ion signals obtained by the surface analysis of the photocured product based on time-of-flight secondary ion mass spectrometry, the intensity of a C.sub.2H.sub.5O.sup.+ ion signal is higher than that of a C.sub.3H.sub.7O.sup.+ ion signal.