B81B3/007

MEMS via with enhanced electrical and mechanical integrity

Described examples include a micromechanical device having a substrate. The micromechanical device includes a MEMS element and a via between the MEMS element and the substrate, the via having a conductive layer extending from the substrate to the MEMS element and having a structural integrity layer on the conductive layer.

Diaphragm-based sensor with a corrugated sidewall
11504012 · 2022-11-22 · ·

A diaphragm-based sensor includes a deflectable diaphragm, a base layer opposite the diaphragm, and a corrugated wall extending between the diaphragm and the base layer. The diaphragm is suspended over a cavity enclosed by the diaphragm, the base layer and the corrugated wall. The diaphragm includes a first electrode and the base layer includes a second electrode such that a capacitance between the first and second electrodes changes when the diaphragm is deflected relative to the cavity.

MICROELECTROMECHANICAL SYSTEM
20220363533 · 2022-11-17 ·

A microelectromechanical system includes a backplate and a diaphragm. The backplate includes spaced stator elements with voids formed therebetween. The stator element includes a first conductive element. The diaphragm includes a plurality of corrugations facing the voids respectively. Each corrugation includes a groove formed at a surface thereof away from the backplate. The corrugation includes a second conductive element. The diaphragm is moveable with respect to the backplate in response to a pressure exerted thereon to cause the corrugations to be moved into or out of the corresponding voids, thereby changing the capacitance formed between the first and second conductive elements. The corrugations are defined by grooves formed at surfaces away from the backplate, which facilitate to control the compliance of the diaphragm and reduce stiffness of the diaphragm. The corrugation can be formed with lower aspect ratios, which allows it to be formed using standard front side processes.

MEMS TRANSDUCER HAVING A DIAPHRAGM MADE OF POLYMER AND METHOD OF PRODUCING SAME

A method for manufacturing a MEMS sound transducer for generating and/or detecting sound waves in the audible wavelength range and/or in the ultrasonic range, includes arranging at least one piezoelectric element on a support substrate. A diaphragm is formed on the at least one piezoelectric element. In forming the diaphragm, a flowable and curable polymer, which forms the diaphragm after curing, is at least partially cast around the at least one piezoelectric element. The invention further relates to the MEMS sound transducer formed by the method.

MEMS FOR HIGHLY EFFICIENT INTERACTION WITH A VOLUME FLOW

An MEMS having a layered structure includes a cavity disposed in the layered structure and fluidically coupled to an external environment of the layered structure through at least one opening in the layered structure. The MEMS includes an interaction structure movably disposed in a first MEMS plane and in the cavity along a plane direction and configured to interact with a fluid in the cavity, wherein movement of the interaction structure is causally related to movement of the fluid through the at least one opening. The MEMS further includes an active structure disposed in a second MEMS perpendicular to the plane direction, the active structure mechanically coupled to the insulation structure and configured such that an electrical signal at an electrical contact of the active structure is causally related to a deformation of the active structure, wherein the deformation of the active structure is causally related to movement of the fluid.

Method and structure for sensors on glass

A method for providing a semiconductor layer arrangement on a substrate which comprises providing a semiconductor layer arrangement having a functional layer and a semiconductor substrate layer, attaching the semiconductor layer arrangement to a glass substrate layer such that the functional layer is arranged between the glass substrate layer and the semiconductor substrate layer, and removing the semiconductor substrate layer at least partially such that the glass substrate layer substitutes the semiconductor substrate layer as the substrate of the semiconductor layer arrangement.

MEMBRANE STRUCTURE, TRANSDUCER DEVICE AND METHOD OF PRODUCING A MEMBRANE STRUCTURE
20220324695 · 2022-10-13 ·

A membrane structure comprises a substrate having a main surface and a rear surface. A plurality of pillars are arranged on the main surface of the substrate and have a support area facing away from the main surface of the substrate. A thin-film structure is arranged above the main surface of the substrate and the pillars, wherein the thin-film structure comprises a plurality of raised portions that are spaced further from the substrate than at least one lower portion of the thin film structure. The raised portions each comprise at least one protruding portion, the protruding portions being hollow and having a bottom part and a sidewall and the protruding portions extending towards the substrate. The bottom part of each protruding portion is mechanically connected to the support area of one of the pillars, respectively. A back-volume is formed by the volume between the main surface of the substrate and the thin-film structure.

METHOD FOR PRODUCING AT LEAST ONE FIRST AND ONE SECOND MICROMIRROR DEVICE
20230066345 · 2023-03-02 ·

A method for producing a first and second micromirror device. A silicon oxide layer is applied to at least the front side of a silicon wafer. The silicon oxide layer is removed so that a first and second separation region of the silicon oxide layer are generated, which are arranged spatially separated from each other along a separation plane. A silicon layer is applied to the front side of the silicon wafer and to the silicon oxide layer. An etching mask is applied to the rear side of the silicon wafer, the etching mask having a first opening along the separation plane of the first and second separation region. The silicon layer and the silicon wafer are removed, according to the etching mask on the rear side of the silicon wafer and according to the silicon oxide layer of the first and second separation region.

MICRO-ELECTROMECHANICAL SYSTEM DEVICE USING A METALLIC MOVABLE PART AND METHODS FOR FORMING THE SAME
20230066841 · 2023-03-02 ·

A micro-electromechanical system (MEMS) device includes a movable comb structure located in a cavity within an enclosure, and a stationary structure affixed to the enclosure. The movable comb structure includes a comb shaft portion and movable comb fingers laterally protruding from the comb shaft portion. The movable comb structure includes a metallic material portion. The movable structure and the stationary structure are configured to generate an electrical output signal based on lateral movement of the movable structure relative to the stationary structure.

Micro-electro-mechanical system acoustic sensor, micro-electro-mechanical system package structure and method for manufacturing the same
11665485 · 2023-05-30 · ·

A MEMS acoustic sensor includes a substrate, a back plate, a diaphragm, a dielectric layer and a connecting portion. The diaphragm is disposed between the substrate and the back plate and includes a vibration portion. The dielectric layer is formed between the substrate and the diaphragm and has a cavity corresponding to the vibrating portion. The connecting portion is located in the cavity and connects the vibrating portion and the substrate.