B81C1/0046

Nanostructures fabricated by metal assisted chemical etching for antibacterial applications

The method comprises contacting a silicon substrate with a silver salt and an acid for a time effective to produce spikes having a first end disposed on the silicon substrate and a second end extending away from the silicon substrate. The spikes have a second end diameter of about 10 nm to about 200 nm, a height of about 100 nm to 10 micrometers, and a density of about 10 to 100 per square microns. The nanostructures provide antimicrobial properties and can be transferred to the surface of various materials such as polymers.

METHOD OF DEPOSITING ELECTRODES AND ELECTROLYTE ON MICROELECTROMECHANICAL SYSTEM ELECTROCHEMICAL SENSORS

Embodiments relate generally to systems, devices, and methods for depositing an electrode and an electrolyte on a microelectromechanical system (MEMS) electrochemical sensor. A method may comprise providing a blade on a surface of a substrate; providing a ridge along the perimeter of the substrate; pressing the electrode and the electrolyte onto the blade and the ridge; cutting the electrode into multiple electrodes; positioning the electrolyte to contact the surface, the blade, and the ridge; and positioning the multiple electrodes to contact the surface, the blade, and the ridge.

METHOD FOR PRODUCING PATTERN LAMINATE, METHOD FOR PRODUCING REVERSAL PATTERN, AND PATTERN LAMINATE
20180364566 · 2018-12-20 · ·

Provided are a method for producing a pattern laminate, the pattern laminate having a first layer having a pattern on an object to be processed and a second layer, which has a small waviness after etching (LWR), in which the method includes a step of forming a first layer having a pattern on an object to be processed and a step of forming a second layer on the first layer, and the glass transition temperature of the first layer is 90 C. or higher; a method for producing a reversal pattern; and a pattern laminate.

IMPRINT APPARATUS AND METHOD OF MANUFACTURING ARTICLE
20180301331 · 2018-10-18 ·

The present invention provides an imprint apparatus that performs an imprint process of forming a pattern of an imprint material on a processing target region on a substrate by using a mold, including a digital mirror device including two-dimensionally arrayed mirror elements and configured to irradiate the substrate with light reflected by the mirror elements, a measurement unit configured to measure, for each of a plurality of segments obtained by dividing a region in which the mirror elements are arrayed so as to include a plurality of the mirror elements, a light amount of light emitted from each segment, and a control unit configured to control the mirror elements included in each segment based on a measurement result of the measurement unit.

Method For Producing Structured Surfaces

A process for producing a structured surface, in which a composition comprising nanowires is applied to a surface and structured, especially by partial displacement of the composition. When the solvent is removed, the nanowires aggregate to form structures. These may be transparent and also conductive.

Microscale stamp with reversible adhesion for transfer printing

A microscale stamp for transfer printing includes (a) a stamp body comprising a shape memory polymer having a glass transition temperature (T.sub.g) and (b) one or more protruding structures attached to a surface of the stamp body. The shape memory polymer comprises a deformable state at temperatures above T.sub.g and a rigid state at temperatures below T.sub.g. The one or more protruding structures comprise a material which is different from the shape memory polymer and which has a Young's modulus greater than a storage modulus of the shape memory polymer.

IMPRINTING APPARATUS

An imprinting apparatus includes a silicon master having a plurality of nanofeatures defined therein. An anti-stick layer coats the silicon master, the anti-stick layer including a molecule having a cyclosiloxane with at least one silane functional group. A method includes forming a master template by: depositing a formulation on a silicon master including a plurality of nanofeatures defined therein, the formulation including a solvent and a molecule having a cyclosiloxane with at least one silane functional group; and curing the formulation, thereby forming an anti-stick layer on the silicon master, the anti-stick layer including the molecule. The method further includes depositing a silicon-based working stamp material on the anti-stick layer of the master template; curing the silicon-based working stamp material to form a working stamp including a negative replica of the plurality of nanofeatures; and releasing the working stamp from the master template.

Imprint template, detection method and detection device

An imprint template includes a first region and a second region located in the periphery of the first region. The first region is provided with a first imprint structure configured to imprint a first film layer pattern into a base material in a product region of a target substrate. The second region is provided with a second imprint structure configured to imprint a second film layer pattern into the base material in the periphery of the product region of the target substrate. And the second film layer pattern is used for assessing imprint quality of the first film layer pattern.

Method of imprinting to correct for a distortion within an imprint system
09993962 · 2018-06-12 · ·

A method can include placing a substrate over a chucking region, wherein the substrate has a primary surface; quantifying a distortion in the substrate, the lithographic template, the imprint apparatus, or any combination thereof; and dispensing a formable material based at least in part on the distortion. The distortion can include a deviation in planarity, a magnification or orthogonality error or the like. In another aspect, an imprint apparatus can include a substrate holder including a chucking region; a template having an imprint surface that includes protrusions, wherein the protrusions define a primary surface; and a processor configured to determine an amount of a formable material to dispense in a particular area based at least in part on an distortion in the substrate, the lithographic template, the imprint apparatus, or any combination thereof.

LIQUID CRYSTAL DIFFRACTIVE DEVICES WITH NANO-SCALE PATTERN AND METHODS OF MANUFACTURING THE SAME

An optical device includes a liquid crystal layer having a first plurality of liquid crystal molecules arranged in a first pattern and a second plurality of liquid crystal molecules arranged in a second pattern. The first and the second pattern are separated from each other by a distance of about 20 nm and about 100 nm along a longitudinal or a transverse axis of the liquid crystal layer. The first and the second plurality of liquid crystal molecules are configured as first and second grating structures that can redirect light of visible or infrared wavelengths.