Novel radioactive iodide molecular traps, in which one or more metal atoms are functionalized by coordinating to an amine containing two or more nitrogens, and methods of using the molecular traps to capture radioactive iodide.

A plasma abatement process for abating effluent containing compounds from a processing chamber is described. A plasma abatement process takes gaseous foreline effluent from a processing chamber, such as a deposition chamber, and reacts the effluent within a plasma chamber placed in the foreline path. The plasma dissociates the compounds within the effluent, converting the effluent into more benign compounds. Abating reagents may assist in the abating of the compounds. The abatement process may be a volatizing or a condensing abatement process. Representative volatilizing abating reagents include, for example, CH.sub.4, H.sub.2O, H.sub.2, NF.sub.3, SF.sub.6, F.sub.2, HCl, HF, Cl.sub.2, and HBr. Representative condensing abating reagents include, for example, H.sub.2, H.sub.2O, O.sub.2, N.sub.2, O.sub.3, CO, CO.sub.2, NH.sub.3, N.sub.2O, CH.sub.4, and combinations thereof.

A plasma abatement process for abating effluent containing compounds from a processing chamber is described. A plasma abatement process takes gaseous foreline effluent from a processing chamber, such as a deposition chamber, and reacts the effluent within a plasma chamber placed in the foreline path. The plasma dissociates the compounds within the effluent, converting the effluent into more benign compounds. Abating reagents may assist in the abating of the compounds. The abatement process may be a volatizing or a condensing abatement process. Representative volatilizing abating reagents include, for example, CH.sub.4, H.sub.2O, H.sub.2, NF.sub.3, SF.sub.6, F.sub.2, HCl, HF, Cl.sub.2, and HBr. Representative condensing abating reagents include, for example, H.sub.2, H.sub.2O, O.sub.2, N.sub.2, O.sub.3, CO, CO.sub.2, NH.sub.3, N.sub.2O, CH.sub.4, and combinations thereof.

Processes for reducing the amount of a gaseous iodide-containing impurity present in a recycle gas stream used in the production of ethylene oxide, in particular an alkyl iodide impurity, are provided. Processes for producing ethylene oxide, ethylene carbonate and/or ethylene glycol, and associated reaction systems are similarly provided.

Processes for reducing the amount of a gaseous iodide-containing impurity present in a recycle gas stream used in the production of ethylene oxide, in particular an alkyl iodide impurity, are provided. Processes for producing ethylene oxide, ethylene carbonate and/or ethylene glycol, and associated reaction systems are similarly provided.

Processes for manufacturing a purified aromatic carboxylic acid include oxidizing a substituted aromatic compound in a reaction zone to form a crude aromatic carboxylic acid and a gaseous stream; heating the crude aromatic carboxylic acid in a pre-heating zone, contacting the crude aromatic carboxylic acid with hydrogen in the presence of a catalyst in a hydrogenation reactor to form a purified aromatic carboxylic acid, crystallizing the purified aromatic carboxylic acid in a crystallization zone to form a slurry stream comprising solid purified aromatic carboxylic acid and a vapor stream. At least a portion of the vapor stream is directed to the pre-heating zone and at least a portion of the vapor stream from the pre-heating zone is vented to the off-gas treatment zone in order to achieve energy savings.

Processes for manufacturing a purified aromatic carboxylic acid include oxidizing a substituted aromatic compound in a reaction zone to form a crude aromatic carboxylic acid and a gaseous stream; heating the crude aromatic carboxylic acid in a pre-heating zone, contacting the crude aromatic carboxylic acid with hydrogen in the presence of a catalyst in a hydrogenation reactor to form a purified aromatic carboxylic acid, crystallizing the purified aromatic carboxylic acid in a crystallization zone to form a slurry stream comprising solid purified aromatic carboxylic acid and a vapor stream. At least a portion of the vapor stream is directed to the pre-heating zone and at least a portion of the vapor stream from the pre-heating zone is vented to the off-gas treatment zone in order to achieve energy savings.

A scrubber system having a lower body, a scrubber located in the lower body, the scrubber having a reactor and a wet treatment performer connected to the reactor, the scrubber being configured in the form of a chiffonier, an upper body located on the lower body, and a pump located in the upper body, wherein the pump pumps a harmful gas from a manufacturing device into the reactor, and the scrubber purifies the harmful gas and discharges a purified gas to the outside of the upper body.

A scrubber system having a lower body, a scrubber located in the lower body, the scrubber having a reactor and a wet treatment performer connected to the reactor, the scrubber being configured in the form of a chiffonier, an upper body located on the lower body, and a pump located in the upper body, wherein the pump pumps a harmful gas from a manufacturing device into the reactor, and the scrubber purifies the harmful gas and discharges a purified gas to the outside of the upper body.

The present invention relates to the filtering of fumes emitted by industrial processes such as those used in iron and steel works, refineries, waste-to-energy plants and the like and in particular relates to a filtering device for fine and ultrafine dust particles and other polluting agents.