B01D53/70

MICROORGANISM INCLUDING GENE ENCODING PROTEIN HAVING DEHALOGENASE ACTIVITY, AND METHOD OF REDUCING CONCENTRATION OF FLUORINE-CONTAINING COMPOUND IN SAMPLE USING THE SAME
20190032034 · 2019-01-31 ·

Provided are a microorganism including a gene encoding a protein having a dehalogenase activity, a composition including the microorganism for use in reducing a concentration of a fluorine-containing compound in a sample, and a method of reducing the concentration of the fluorine-containing compound in the sample by using the microorganism.

PLASMA ABATEMENT OF COMPOUNDS CONTAINING HEAVY ATOMS

A plasma abatement process for abating effluent containing compounds from a processing chamber is described. A plasma abatement process takes gaseous foreline effluent from a processing chamber, such as a deposition chamber, and reacts the effluent within a plasma chamber placed in the foreline path. The plasma dissociates the compounds within the effluent, converting the effluent into more benign compounds. Abating reagents may assist in the abating of the compounds. The abatement process may be a volatizing or a condensing abatement process. Representative volatilizing abating reagents include, for example, CH.sub.4, H.sub.2O, H.sub.2, NF.sub.3, SF.sub.6, F.sub.2, HCl, HF, Cl.sub.2, and HBr. Representative condensing abating reagents include, for example, H.sub.2, H.sub.2O, O.sub.2, N.sub.2, O.sub.3, CO, CO.sub.2, NH.sub.3, N.sub.2O, CH.sub.4, and combinations thereof.

PLASMA ABATEMENT OF COMPOUNDS CONTAINING HEAVY ATOMS

A plasma abatement process for abating effluent containing compounds from a processing chamber is described. A plasma abatement process takes gaseous foreline effluent from a processing chamber, such as a deposition chamber, and reacts the effluent within a plasma chamber placed in the foreline path. The plasma dissociates the compounds within the effluent, converting the effluent into more benign compounds. Abating reagents may assist in the abating of the compounds. The abatement process may be a volatizing or a condensing abatement process. Representative volatilizing abating reagents include, for example, CH.sub.4, H.sub.2O, H.sub.2, NF.sub.3, SF.sub.6, F.sub.2, HCl, HF, Cl.sub.2, and HBr. Representative condensing abating reagents include, for example, H.sub.2, H.sub.2O, O.sub.2, N.sub.2, O.sub.3, CO, CO.sub.2, NH.sub.3, N.sub.2O, CH.sub.4, and combinations thereof.

BACILLUS BOMBYSEPTICUS SF3 DECOMPOSING FLUORINE-CONTAINING COMPOUND, RECOMBINANT MICROORGANISM INCLUDING GENE DERIVED FROM BACILLUS BOMBYSEPTICUS AND METHOD OF REDUCING CONCENTRATION OF FLUORINE-CONTAINING COMPOUND IN SAMPLE BY USING BACILLUS BOMBYSEPTICUS

Provided are a microorganism having activity in reducing a concentration of a fluorine-containing compound in a sample, a recombinant microorganism including a gene derived from the microorganism, and a method of reducing the concentration of the fluorine-containing compound in the sample by using the microorganism or recombinant microorganism.

BACILLUS BOMBYSEPTICUS SF3 DECOMPOSING FLUORINE-CONTAINING COMPOUND, RECOMBINANT MICROORGANISM INCLUDING GENE DERIVED FROM BACILLUS BOMBYSEPTICUS AND METHOD OF REDUCING CONCENTRATION OF FLUORINE-CONTAINING COMPOUND IN SAMPLE BY USING BACILLUS BOMBYSEPTICUS

Provided are a microorganism having activity in reducing a concentration of a fluorine-containing compound in a sample, a recombinant microorganism including a gene derived from the microorganism, and a method of reducing the concentration of the fluorine-containing compound in the sample by using the microorganism or recombinant microorganism.

BACILLUS SAITENS DECOMPOSING FLUORINE-CONTAINING COMPOUND, RECOMBINANT MICROORGANISM INCLUDING GENE DERIVED FROM BACILLUS SAITENS, AND METHOD OF REDUCING CONCENTRATION OF FLUORINE-CONTAINING COMPOUND IN SAMPLE BY USING BACILLUS SAITENS

Provided are a microorganism having activity in reducing a concentration of a fluorine-containing compound in a sample, a recombinant microorganism including a gene derived from the microorganism, and a method of reducing the concentration of the fluorine-containing compound in the sample by using the microorganism or recombinant microorganism.

Device and method for treating a gas laden with pollutants

A device for treating a gas laden with pollutants, includes at least one adsorption module for adsorbing the pollutants, which is utilized in an adsorption apparatus. The adsorption module includes at least one electrically conductive layer of an activated carbon fiber mat, an electric current circuit for heating the activated carbon fiber mat for the desorption of the adsorbed pollutants, and distributing conduit which is routed into the center of the adsorption module and has outlet openings for a flush gas for inertizing and rinsing the activated carbon fiber mat.

Device and method for treating a gas laden with pollutants

A device for treating a gas laden with pollutants, includes at least one adsorption module for adsorbing the pollutants, which is utilized in an adsorption apparatus. The adsorption module includes at least one electrically conductive layer of an activated carbon fiber mat, an electric current circuit for heating the activated carbon fiber mat for the desorption of the adsorbed pollutants, and distributing conduit which is routed into the center of the adsorption module and has outlet openings for a flush gas for inertizing and rinsing the activated carbon fiber mat.

PROCESSES AND SYSTEMS FOR REMOVING A VINYL IODIDE IMPURITY FROM A RECYCLE GAS STREAM IN THE PRODUCTION OF ETHYLENE OXIDE

Processes for reducing the amount of a gaseous iodide-containing impurity present in a recycle gas stream used in the production of ethylene oxide, in particular a vinyl iodide impurity, are provided. Processes for producing ethylene oxide, ethylene carbonate and/or ethylene glycol, and associated reaction systems are similarly provided.

PROCESSES AND SYSTEMS FOR REMOVING A VINYL IODIDE IMPURITY FROM A RECYCLE GAS STREAM IN THE PRODUCTION OF ETHYLENE OXIDE

Processes for reducing the amount of a gaseous iodide-containing impurity present in a recycle gas stream used in the production of ethylene oxide, in particular a vinyl iodide impurity, are provided. Processes for producing ethylene oxide, ethylene carbonate and/or ethylene glycol, and associated reaction systems are similarly provided.