An abatement apparatus includes a combustion chamber formed by a foraminous sleeve defining an upstream portion of the combustion chamber for treating an effluent stream, the upstream portion of the combustion chamber having an inlet for receiving the effluent stream and a wetted sleeve fluidly coupled with foraminous sleeve, the wetted sleeve defining a downstream portion of the combustion chamber, wherein the foraminous sleeve is configured to provide a foraminous axial surface facing downstream towards the downstream portion of the combustion chamber. In this way, the foraminous surface not only faces inwards towards the upstream portion of the combustion chamber, but also faces downstream, towards the downstream portion of the combustion chamber.

An inlet nozzle assembly includes: a delivery nozzle configured to deliver an effluent stream into an abatement chamber; and a mount configured to couple with an enclosure defining the abatement chamber, the mount being further configured to receive the delivery nozzle, wherein the delivery nozzle is configured to extend from the mount distal from the abatement chamber. In this way, the height of the mount and the location of the abatement chamber can remain fixed for different length delivery nozzles and different amounts of the delivery nozzle extend from the mount, dependent on the length of that nozzle.

A modular abatement apparatus is for abatement of an effluent stream from a semiconductor processing tool and comprises: a housing defining a common housing chamber; a plurality of combustion chamber modules positionable within the common housing chamber for treating the effluent stream, each combustion chamber module containing a foraminous sleeve defining a combustion chamber therewithin. In this way, multiple combustion chambers may be provided within a single, common housing, each of which may be configured to treat a particular effluent stream flow. Accordingly, the number of combustion chambers can be selected to match the different types and flowrates of the effluent stream expected from any particular processing tool. This provides an architecture which is readily scalable to suit the needs of different effluent gas stream types and flowrates while retaining a common housing which may interface with upstream and downstream components.

An inlet assembly includes an inlet nozzle configured to deliver an effluent stream into a combustion chamber of an abatement apparatus; and a reagent nozzle configured to deliver a reagent into the combustion chamber of the abatement apparatus, the reagent nozzle being located concentrically with respect to the inlet nozzle, the reagent nozzle being configured to deliver the reagent in different quantities at different positions around its perimeter.

An inlet assembly includes an inlet nozzle configured to deliver an effluent stream into a combustion chamber of an abatement apparatus; and a reagent nozzle configured to deliver a reagent into the combustion chamber of the abatement apparatus, the reagent nozzle being located concentrically with respect to the inlet nozzle, the reagent nozzle being configured to deliver the reagent in different quantities at different positions around its perimeter.

Methods for purification of a fluorocarbon or hydrofluorocarbon containing at least one undesired halocarbon impurities comprise flowing the fluorocarbon or hydrofluorocarbon through at least one adsorbent beds to selectively adsorb the at least one undesired halocarbon impurities through physical adsorption and/or chemical adsorption, wherein the at least one adsorbent beds contain a metal oxide supported on an adsorbent in an inert atmosphere.

Implementations of the present disclosure relate to systems and techniques for abating F-gases present in the effluent of semiconductor manufacturing processes. In one implementation, a water and oxygen delivery system for a plasma abatement system is provided. The water and oxygen delivery system comprises a housing that includes a floor and a plurality of sidewalls that define an enclosed region. The water and oxygen delivery system further comprises a cylindrical water tank positioned on the floor, wherein a longitudinal axis of the cylindrical water tank is parallel to a plane defined by the floor and a length of the water tank is 1.5 times or greater than the diameter of the cylindrical water tank. The water and oxygen delivery system further comprises a flow control system positioned within the housing above the cylindrical water tank.

Processes for manufacturing a purified aromatic carboxylic acid include oxidizing a substituted aromatic compound in a reaction zone to form a crude aromatic carboxylic acid and a gaseous stream; heating the crude aromatic carboxylic acid in a pre-heating zone, contacting the crude aromatic carboxylic acid with hydrogen in the presence of a catalyst in a hydrogenation reactor to form a purified aromatic carboxylic acid, crystallizing the purified aromatic carboxylic acid in a crystallization zone to form a slurry stream comprising solid purified aromatic carboxylic acid and a vapor stream. At least a portion of the vapor stream is directed to the pre-heating zone and at least a portion of the vapor stream from the pre-heating zone is vented to the off-gas treatment zone in order to achieve energy savings.

Processes for manufacturing a purified aromatic carboxylic acid include oxidizing a substituted aromatic compound in a reaction zone to form a crude aromatic carboxylic acid and a gaseous stream; heating the crude aromatic carboxylic acid in a pre-heating zone, contacting the crude aromatic carboxylic acid with hydrogen in the presence of a catalyst in a hydrogenation reactor to form a purified aromatic carboxylic acid, crystallizing the purified aromatic carboxylic acid in a crystallization zone to form a slurry stream comprising solid purified aromatic carboxylic acid and a vapor stream. At least a portion of the vapor stream is directed to the pre-heating zone and at least a portion of the vapor stream from the pre-heating zone is vented to the off-gas treatment zone in order to achieve energy savings.

The invention relates to a method for cleaning flue gas, the flue gas to be cleaned and a sorption agent starting material in the form of a solid being injected into a reactor chamber of a fluidized-bed reactor, and a liquid being injected into the reactor chamber separately from the flue gas and the sorption agent starting material, the sorption agent starting material being contacted with the liquid in the fluidized-bed reactor and being converted to a sorption agent in the form of a solid.