Various embodiments disclosed relate to pore inducers and porous abrasive forms made using the same. In various embodiments, the present invention provides a method of forming a porous abrasive form including heating an abrasive composition including pore inducers to form the porous abrasive form. During the heating the pore inducers in the porous abrasive form reduce in volume to form induced pores in the porous abrasive form.

Various embodiments disclosed relate to pore inducers and porous abrasive forms made using the same. In various embodiments, the present invention provides a method of forming a porous abrasive form including heating an abrasive composition including pore inducers to form the porous abrasive form. During the heating the pore inducers in the porous abrasive form reduce in volume to form induced pores in the porous abrasive form.

The invention provides a porous subpad for a chemical mechanical polishing pad comprising a polishing layer having a polymeric matrix, a polishing surface useful for polishing at least one of semiconductor, magnetic and optical substrates and a bottom surface. The porous subpad includes a non-porous layer having a polymeric matrix and a multilayer having a micro-scale negative impression of the bottom surface of the polishing pad. The multilayer is closed cell, open cell or a mixture of closed and open cell micropores that are gas filled; and the multilayer remains gas filled during an entire polishing life of the polishing pad.

A method of making an abrasive article comprises urging a malleable thermosetting melt-flowable composition through openings extending through a porous abrasive member to form an abrasive article precursor; which is heated to form the abrasive article. Multiple abrasive articles may be stacked prior to heating. Methods can be used to fabricate abrasive articles such as grinding wheels and cut-off wheels.

A method of making an abrasive article comprises urging a malleable thermosetting melt-flowable composition through openings extending through a porous abrasive member to form an abrasive article precursor; which is heated to form the abrasive article. Multiple abrasive articles may be stacked prior to heating. Methods can be used to fabricate abrasive articles such as grinding wheels and cut-off wheels.

An object of the present invention is to provide a porous material for polishing in which, during a polishing operation, it is possible to keep a proportion between abrasive grains in contact with an object to be polished and a resin portion in contact with the object to be polished within a certain range, even if an unskilled person attaches a polishing tool to an automated device and uses it, there is no need for complicated adjustment to stabilize the device, whereby it is possible to obtain precise surface accuracy. The above object is achieved by a porous material for polishing including an elastic foam having anisotropy, a polymer, and abrasive grains.

An object of the present invention is to provide a porous material for polishing in which, during a polishing operation, it is possible to keep a proportion between abrasive grains in contact with an object to be polished and a resin portion in contact with the object to be polished within a certain range, even if an unskilled person attaches a polishing tool to an automated device and uses it, there is no need for complicated adjustment to stabilize the device, whereby it is possible to obtain precise surface accuracy. The above object is achieved by a porous material for polishing including an elastic foam having anisotropy, a polymer, and abrasive grains.

Provided is a polishing pad which is capable of providing a high flatness to a polishing workpiece and suppressing the formation of scratches, and a method therefor. The polishing pad comprises a foamed urethane sheet on the surface which includes closed cells and open cells and which satisfies the following requirements: (1) an open cell ratio is 20-80 vol % where the total volume of closed cells and open cells is taken as 100 vol %, (2) the ratio [tan (wet/dry) ratio] of a loss factor tan in a water-absorption state to that in a dry state is 1.3-1.7, the loss factors being measured according to JIS K7244-4 with an initial load of 20 g at a measuring frequency of 1 Hz at a temperature of 26 C. in a tensile mode over a strain range from 0.01 to 0.1%, and (3) the Shore DO hardness according to ASTM D2240 is 60-80.

Provided is a polishing pad which is capable of providing a high flatness to a polishing workpiece and suppressing the formation of scratches, and a method therefor. The polishing pad comprises a foamed urethane sheet on the surface which includes closed cells and open cells and which satisfies the following requirements: (1) an open cell ratio is 20-80 vol % where the total volume of closed cells and open cells is taken as 100 vol %, (2) the ratio [tan (wet/dry) ratio] of a loss factor tan in a water-absorption state to that in a dry state is 1.3-1.7, the loss factors being measured according to JIS K7244-4 with an initial load of 20 g at a measuring frequency of 1 Hz at a temperature of 26 C. in a tensile mode over a strain range from 0.01 to 0.1%, and (3) the Shore DO hardness according to ASTM D2240 is 60-80.

The present disclosure relates to lapping pads which include an abrading layer, wherein the abrading layer includes a working surface and a second surface opposite the working surface having a projected area Ap, and at least one cavity having a cavity opening located at the second surface, the at least one cavity being defined by at least one rib, each rib having a distal end at the second surface; and a phase transition material having a thermally reversible phase transition, wherein the phase transition material is disposed in the at least one cavity. The present disclosure further relates to a lapping system, the lapping system includes a lapping pad of the present disclosure and a working fluid; a method of making a lapping pad; and a method of lapping using a lapping pad of the present disclosure.