A multilayer identification patch comprises a reflective layer and a design layer on top of the reflective layer. The design layer comprises an opaque body and at least one identification symbol void (ISV) to allow light to reflect from a portion of the reflective layer via the ISV. The opaque body of the design layer comprises multiple layers of cured photopolymer ink. The multiple layers of cured photopolymer ink comprise an opaque layer of colored photopolymer ink. In one embodiment, the multiple layers of cured photopolymer ink in the opaque body of the design layer further comprise a layer of clear photopolymer ink under the opaque layer of colored photopolymer ink. Other embodiments are described and claimed.

To simplify the production of a security element 300 with a first security feature 310 and a second security feature 320, the following method is proposed: (a) Provision of a light-sensitive film 200, which comprises at least one carrier layer 210 and in surface-to-surface contact with this a light-sensitive function layer 220; (b) Exposure of the light-sensitive film 200 at least area by area, with the formation of a pattern in the light-sensitive function layer 220, wherein the security element (300) is formed with a first security feature (310); (b′) Optional fixing of the exposed light-sensitive film; and (c) Printing of the carrier layer 210 and, as appropriate, of the protective layer 230, wherein a second security feature 320 is produced.

A security device includes a diffractive structure, including grating elements and having a first area, the grating elements within a region have a constant pitch or spacing; the first area regions pitches or spacings increase from one region to the next between a first region having a grating element pitch or spacing of less than or equal to 0.6 microns and an end region having a grating element pitch or spacing of greater than or equal to 5 microns; upon illumination and viewing along a first viewing direction substantially orthogonal to the first axis, the device exhibits a first optical effect in that at least one region exhibits a diffractive colour; each region has at least first and second sub-regions having different grating element orientations within the plane of the device such that the first optical effect is exhibited at more than one angle of tilt about the second axis.

A security device includes a diffractive structure, including grating elements and having a first area, the grating elements within a region have a constant pitch or spacing; the first area regions pitches or spacings increase from one region to the next between a first region having a grating element pitch or spacing of less than or equal to 0.6 microns and an end region having a grating element pitch or spacing of greater than or equal to 5 microns; upon illumination and viewing along a first viewing direction substantially orthogonal to the first axis, the device exhibits a first optical effect in that at least one region exhibits a diffractive colour; each region has at least first and second sub-regions having different grating element orientations within the plane of the device such that the first optical effect is exhibited at more than one angle of tilt about the second axis.

A method for producing a forgery-proof object (1), wherein the object is marked with a code (2) and additionally with a marking (3) spaced apart from the code, wherein the method encompasses the following steps: determining a random position (P.sub.Z) of the marking (3) relative to a code position (C.sub.P) determined by one or more position features of the code (2) on the object (1); encoding the object (1) at the determined code position (C.sub.P) marking the object (1) with the marking at the random position (P.sub.Z) storing position data (ZPD) of the random position (P.sub.Z) in a database (6);

A method for producing a forgery-proof object (1), wherein the object is marked with a code (2) and additionally with a marking (3) spaced apart from the code, wherein the method encompasses the following steps: determining a random position (P.sub.Z) of the marking (3) relative to a code position (C.sub.P) determined by one or more position features of the code (2) on the object (1); encoding the object (1) at the determined code position (C.sub.P) marking the object (1) with the marking at the random position (P.sub.Z) storing position data (ZPD) of the random position (P.sub.Z) in a database (6);

A method for producing a multilayer body, as well as a multilayer body produced thereby. A single- or multi-layered first decorative ply is applied to a carrier ply with a first and a second side. A metal layer is applied to the side of the first decorative ply facing away from the carrier ply and structured such that the metal layer is provided with a first layer thickness in one or more first zones and is provided with a second layer thickness different from the first layer thickness in one or more second zones, wherein in particular the second layer thickness is equal to zero. A single- or multi-layered second decorative ply is applied to the side of the metal layer facing away from the first decorative ply and structured using the metal layer as mask such that the first or second decorative ply is at least partially removed in the first or second zones.

A method for producing a multilayer body, as well as a multilayer body produced thereby. A single- or multi-layered first decorative ply is applied to a carrier ply with a first and a second side. A metal layer is applied to the side of the first decorative ply facing away from the carrier ply and structured such that the metal layer is provided with a first layer thickness in one or more first zones and is provided with a second layer thickness different from the first layer thickness in one or more second zones, wherein in particular the second layer thickness is equal to zero. A single- or multi-layered second decorative ply is applied to the side of the metal layer facing away from the first decorative ply and structured using the metal layer as mask such that the first or second decorative ply is at least partially removed in the first or second zones.

A method of manufacturing an image pattern for a security device includes providing a metallised substrate; applying a first photosensitive resist layer to a substrate first metal layer exposing the resist layer to radiation; exposing the resist layer to a first reactant substance; activating a cross linking agent in the resist layer; exposing first and second pattern elements of the resist layer to radiation of a wavelength to which the resist layer is responsive whereupon newly-exposed first pattern elements of the first photosensitive resist layer react, resulting in increased solubility by the second etchant substance, the second pattern elements remaining relatively insoluble by the second etchant substance; and applying first and second etchant substances to the substrate whereupon the first pattern elements of both the first resist layer and the first metal layer are dissolved, the remaining second pattern elements of the first metal layer forming an image pattern.

A method of manufacturing an image pattern for a security device includes providing a metallised substrate; applying a first photosensitive resist layer to a substrate first metal layer exposing the resist layer to radiation; exposing the resist layer to a first reactant substance; activating a cross linking agent in the resist layer; exposing first and second pattern elements of the resist layer to radiation of a wavelength to which the resist layer is responsive whereupon newly-exposed first pattern elements of the first photosensitive resist layer react, resulting in increased solubility by the second etchant substance, the second pattern elements remaining relatively insoluble by the second etchant substance; and applying first and second etchant substances to the substrate whereupon the first pattern elements of both the first resist layer and the first metal layer are dissolved, the remaining second pattern elements of the first metal layer forming an image pattern.