A method of forming a non-optically detectable identifiable marking invisible to the naked eye is formed from plural recesses of multiple levels at an outer surface of an article formed from a solid-state material. The method includes forming plural recesses of multiple levels within a predetermined region of a photoresist applied to an outer surface of an article formed from a solid-state material. The plural recesses are formed by grayscale lithography and the recesses extend at least partially through the photoresist and towards the outer surface of the article formed from a solid-state material. The method also includes applying an etching process such that at least a portion of the outer surface of said article is exposed and etched to form plural etched portions extending into the article from its outer surface and corresponding to plural recesses; wherein said predetermined region of said photoresist defines an identifiable marking to be applied to the outer surface of said article; wherein said plurality of etched portions forms the non-optically identifiable marking on the outer surface of said article.

A method of manufacturing an image element array for a security device is disclosed. The method comprises: (a) providing a metallised substrate web comprising a substrate having a first metal layer thereon on a first surface of the substrate, the first metal layer being soluble in a first etchant substance; (b) applying a first photosensitive resist layer to the first metal layer; (c) exposing the first photosensitive resist layer to radiation of a wavelength to which the resist layer is responsive through a patterned mask, by conveying the substrate web along a transport path and, during the exposure, moving the patterned mask alongside the substrate web along at least a portion of the transport path at substantially the same speed as the substrate web, such that there is substantially no relative movement between the mask and the substrate web, wherein the patterned mask comprises first pattern elements in which the mask is substantially opaque to the radiation and second pattern elements in which the mask is substantially transparent to the radiation, whereupon the exposed second pattern elements of the first photosensitive resist layer react resulting in increased solubility by a second etchant substance, the non-exposed first pattern elements remaining relatively insoluble by the second etchant substance; and (d) applying the first and second etchant substances to the substrate web whereupon the second pattern elements of both the first resist layer and the first metal layer are dissolved, the remaining first pattern elements of the first metal layer forming an image element array.

A method of manufacturing an image element array for a security device is disclosed. The method comprises: (a) providing a metallised substrate web comprising a substrate having a first metal layer thereon on a first surface of the substrate, the first metal layer being soluble in a first etchant substance; (b) applying a first photosensitive resist layer to the first metal layer; (c) exposing the first photosensitive resist layer to radiation of a wavelength to which the resist layer is responsive through a patterned mask, by conveying the substrate web along a transport path and, during the exposure, moving the patterned mask alongside the substrate web along at least a portion of the transport path at substantially the same speed as the substrate web, such that there is substantially no relative movement between the mask and the substrate web, wherein the patterned mask comprises first pattern elements in which the mask is substantially opaque to the radiation and second pattern elements in which the mask is substantially transparent to the radiation, whereupon the exposed second pattern elements of the first photosensitive resist layer react resulting in increased solubility by a second etchant substance, the non-exposed first pattern elements remaining relatively insoluble by the second etchant substance; and (d) applying the first and second etchant substances to the substrate web whereupon the second pattern elements of both the first resist layer and the first metal layer are dissolved, the remaining first pattern elements of the first metal layer forming an image element array.

A method for producing a multilayer body, as well as a multilayer body produced thereby. A single- or multi-layered first decorative ply is applied to a carrier ply with a first and a second side. A metal layer is applied to the side of the first decorative ply facing away from the carrier ply and structured such that the metal layer is provided with a first layer thickness in one or more first zones and is provided with a second layer thickness different from the first layer thickness in one or more second zones, wherein in particular the second layer thickness is equal to zero. A single- or multi-layered second decorative ply is applied to the side of the metal layer facing away from the first decorative ply and structured using the metal layer as mask such that the first or second decorative ply is at least partially removed in the first or second zones.

A method for producing a multilayer body, as well as a multilayer body produced thereby. A single- or multi-layered first decorative ply is applied to a carrier ply with a first and a second side. A metal layer is applied to the side of the first decorative ply facing away from the carrier ply and structured such that the metal layer is provided with a first layer thickness in one or more first zones and is provided with a second layer thickness different from the first layer thickness in one or more second zones, wherein in particular the second layer thickness is equal to zero. A single- or multi-layered second decorative ply is applied to the side of the metal layer facing away from the first decorative ply and structured using the metal layer as mask such that the first or second decorative ply is at least partially removed in the first or second zones.

A security element includes a transparent film, a first layer and a second layer. The first layer includes a first metal arranged on the transparent film in a first pattern. The second layer includes a second metal being a baser metal than the first metal arranged over the first layer in a second pattern. Each of the first and second patterns is composed of metallic regions and metal-free regions. The metal-free regions of the second pattern overlap with the metal-free regions of the first pattern. The metallic regions of the first pattern overlap with the metal-free regions of the second pattern.

A security element includes a transparent film, a first layer and a second layer. The first layer includes a first metal arranged on the transparent film in a first pattern. The second layer includes a second metal being a baser metal than the first metal arranged over the first layer in a second pattern. Each of the first and second patterns is composed of metallic regions and metal-free regions. The metal-free regions of the second pattern overlap with the metal-free regions of the first pattern. The metallic regions of the first pattern overlap with the metal-free regions of the second pattern.

A non-provisioned card having a front side and a back side, and at least one visible surface that is patinated or activated to promote patination.

A micro-optic security device with zonal color transitions includes a planar array of focusing elements, an image icon layer including a plurality of retaining structures, the plurality of retaining structures defining isolated volumes at a first depth within the image icon layer, a first zone of image icons, the first zone of image icons having a first predefined subset of the plurality of retaining structures, wherein the isolated volumes of retaining structures of the first predefined subset of the plurality of retaining structures contain cured pigmented material of a first color, and a second zone of image icons, the second zone of image icons including a second predefined subset of the plurality of retaining structures, wherein the isolated volumes of retaining structures of the second predefined subset of the plurality of retaining structures contain cured pigmented material of a second color, wherein the second color contrasts with the first color.

A method of manufacturing an image pattern for a security device includes providing a metallised substrate; applying a first photosensitive resist layer to a substrate first metal layer exposing the resist layer to radiation; exposing the resist layer to a first reactant substance; activating a cross linking agent in the resist layer; exposing first and second pattern elements of the resist layer to radiation of a wavelength to which the resist layer is responsive whereupon newly-exposed first pattern elements of the first photosensitive resist layer react, resulting in increased solubility by the second etchant substance, the second pattern elements remaining relatively insoluble by the second etchant substance; and applying first and second etchant substances to the substrate whereupon the first pattern elements of both the first resist layer and the first metal layer are dissolved, the remaining second pattern elements of the first metal layer forming an image pattern.