A hose assembly includes a first conduit, a second conduit, a nozzle assembly, and a valve assembly. The first conduit defines a first fluid path through the hose assembly. The second conduit is received within and extends partially through the first conduit. The second conduit defines a second fluid path through the hose assembly. The nozzle assembly is coupled to a first end of the first conduit. The valve assembly is fluidly coupled to the first conduit and the second conduit. The valve assembly is fluid coupled to a second end of the first conduit opposite the first end. The valve assembly is adjustable between a first position and a second position. In the first position, the valve assembly provides water into the first conduit. In the second position, the valve assembly provides pressurized air into the second conduit.

An apparatus and method for reprocessing a medical device includes a decontamination basin, a first flush conduit, a second flush conduit, and a manifold. The first and second flush conduits have respective first and second coupling ports configured to fluidly connect to the medical device positioned within the decontamination basin. The manifold is fluidly connected to the first and second flush conduits and configured to distribute the fluid received therein accordingly. The apparatus also includes a first valve, a second valve, and a primary pump configured to discharge the fluid into the manifold at a predetermined supply flow rate. The first and second valve are positioned respectively in the first and second flush conduits for balancing the respective flow rates discharged therefrom at a first predetermined conduit flow rate and a second predetermined conduit flow rate.

A cleaning system and process for cleaning a medical system comprising at least one air source at least one cleaning solution source at least one rinsing solution source and at least one switch for switching between the at least one air source, the at least one cleaning solution source, and said at least one rinsing solution source. The process is configured to selectively provide the cleaning solution from the cleaning solution source, selectively provide the rinsing solution source, and selectively providing the air pressure to purge the lines of a medical/dental system.

Provided is a method of preventing a sudden increase in the number of particles detected on wafer surfaces even when cleaning of a wafer is performed repeatedly using a single-wafer processing wafer cleaning apparatus. The method uses a single-wafer processing wafer cleaning apparatus including a rotatable stage; chemical solution supply nozzles; pure water supply nozzles; a chemical solution supply line for supplying chemical solutions to the chemical solution supply nozzles; a pure water supply line for supplying pure water to the pure water supply nozzles; and a waste liquid line. The method includes a pipe cleaning step of introducing pure water containing micro-nano bubbles into the pure water supply line, and cleaning the pipe of the pure water supply line.

A self-contained system is provided for cleaning a food flow path in a food processor. The system can be operably engaged without requiring disassembly and reassembly of the food processor or can be operably engaged after a partial disassembly of the food processor. The system includes a control assembly for directing passage of a solution through the food processor without requiring constant operator oversight. The system can employ available positive pressure water supply, such as public utility water pressure to selectively and automatically push solutions, including rinses, backwards or forwards through a food flow path in the food processor, though typically countercurrent to the normal processing food flow. A manifold assembly includes an intake manifold and a distribution manifold, with an induction port and/or access port in the distribution manifold for introducing additives or agents into a controlled motive stream passing through the manifold assembly.

A diverter valve for conveying material to be conveyed, the diverter valve being cleanable using a method for CIP cleaning, comprises a housing with at least three passage openings to feed or discharge the material to be conveyed, the passage openings defining a conveying plane. The diverter valve further comprises a rotary part having an axis of rotation and an outer contour designed conically in relation to the axis of rotation at least in sections, the rotary part being arrangeable in the housing in a sealed manner, the rotary part being displaceable along the axis of rotation in an axially driven manner and being arranged such as to be drivable for rotation about the axis of rotation, the axis of rotation being oriented perpendicular to the conveying plane, a passage duct arranged in the rotary part, which—depending on a rotary position of the rotary part—connects in each case two passage openings for conveying material along the passage duct through the diverter valve. The CIP cleaning method of a diverter valve of this type comprises the pulling back and rotating the rotary part into an intermediate position to clean and then dry the diverter valve intensively. A particular feature is the embodiment configured without drainage in the housing of the diverter valve.

A process to clean medical devices, such as endoscopes, with a turbulent cleaning solution is described. The process includes providing cleaning solution in a first delivery system and providing a gas in a second delivery system, wherein the first and second delivery system are connected to a third delivery system that allows the cleaning solution and gas to combine to provide a turbulent cleaning solution that can be passed through a lumen of a medical device. The process is generally accomplished by use of a peristaltic pump with two heads; one head for each of the delivery system. The resultant turbulent cleaning solution provides enough force to dislodge most body fluids, debris, bacteria and/or virus(es) from the surface of the medical device without the requirement for physical scrubbing or brushing of the surface.

Provided are a method for producing an ultra-fine bubble-containing liquid, an ultra-fine bubble-containing liquid, and a method for utilizing and a device for utilizing ultra-fine bubbles that allow highly concentrated UFBs to be maintained for a long period of time and that are capable of effectively utilizing the UFBs. To this end, the method for producing an ultra-fine bubble-containing liquid includes an ultra-fine bubble generating step and a dispersing step to disperse the ultra-fine bubbles. In the ultra-fine bubble generating step, the ultra-fine bubbles are generated in a liquid by heating a heating element and making film boiling on an interface between the liquid and the heating element. In the dispersing step, a floc, which includes two or more ultra-fine bubbles, is dispersed into multiple ultra-fine bubbles by applying vibration to the liquid in which the floc floats.

A method for simultaneously unblocking multiple blocked valve fittings is described. The method includes coupling a tool to unblock multiple valve fittings simultaneously to a valve with multiple valve fitting blocked to fluid flow. The tool includes a pressure vessel holding a cleaning fluid, an input conduit fluidically coupled to the pressure vessel to flow the cleaning fluid from a cleaning fluid source to the pressure vessel and to adjust a pressure of the pressure vessel, and injection conduits to flow the cleaning fluid from the pressure vessel to the valve fittings. The method includes simultaneously flowing the cleaning fluid from the pressure vessel through the injection conduits to the valve fittings. Responsive to flowing the cleaning fluid to the valve fitting, the valve fittings are unblocked.

A fluid test system for checking the integrity of connections and welds in a fluid component includes a first nitrogen source selectively connected to first and second isopropanol tanks, a fluid line circulation circuit, a drain selectively connected to the fluid circulation line, the first IPA tank connected to the fluid line circulation circuit through a first IPA line and a second IPA tank connected to the fluid line circulation circuit through a second IPA a second drain selectively connected to the first and second IPA tanks, a first deionized water line selectively connectable to a deionized water source and to the fluid line circulation circuit, and a vacuum pump selectively connectable to the fluid line circulation circuit through a vacuum selection valve, wherein the fluid line circulation circuit is selectively configurable to flow water, nitrogen and IPA through a unit under test.