The present disclosure relates to an electronic device comprising a wafer comprising a first upper surface having at least one first contact arranged thereon; and at least one die comprising a second upper surface having at least one second contact arranged thereon, and at least one first lateral surface orthogonal to the second upper surface, said first contact being coupled to said second contact by a connector comprising one first conductive pillar formed on said first contact of said wafer; one second conductive pillar formed on said second contact of said die; and at least one conductive ball positioned in contact with at least a first upper portion of said first pillar(s) and in contact with at least one second upper portion of said second pillar(s).

A multi-layered board includes an upper insulating layer, a lower conductive layer including first lower conductive parts, an upper conductive layer between the lower conductive layer and the upper insulating layer and including first upper conductive parts and second upper conductive parts, and a lower insulating layer between the lower conductive layer and the upper conductive layer. The first upper conductive part includes a first pad exposed from a hole of the upper insulating layer. The second upper conductive part includes a second pad exposed from a hole of the upper insulating layer. At least a part of the first pad is in direct contact with the first lower conductive part within a hole of the lower insulating layer. The second pad is outside any hole of the lower insulating layer. A top surface of the second pad is higher than a top surface of the first pad.

A package comprising a first substrate, a first integrated device coupled to the first substrate, a second substrate coupled to the first substrate through a first plurality of solder interconnects such that the first integrated device is located between the first substrate and the second substrate, wherein the second substrate includes a first surface and a second surface, an electrical device coupled to a second surface of the second substrate such that the electrical device is located between the first substrate and the second substrate, and an encapsulation layer coupled to the first substrate and the second substrate. The encapsulation layer is located between the first substrate and the second substrate. The encapsulation layer encapsulates the first integrated device and the electrical device.

Disclosed are semiconductor packages and their fabrication methods. The semiconductor package comprises a first substrate having first pads on a first surface of the first substrate, a second substrate on the first substrate and having a plurality of second pads on a second surface of the second substrate, and connection terminals between the first substrate and the second substrate and correspondingly coupling the first pad to the second pads. Each of the connection terminals has a first major axis and a first minor axis that are parallel to the first surface of the first substrate and are orthogonal to each other. When viewed in a plan view, the first minor axis of each of the connection terminals is directed toward a center of the first substrate.

A device includes a substrate and a die. A first side of the die is electrically coupled to the substrate. The device also includes interconnect conductors electrically coupled to the die through conductive paths of the substrate. The device also includes an interposer structure that includes a first side and a second side. The first side includes first contacts electrically coupled to the interconnect conductors, and the second side includes second contacts. The interposer structure also includes a plurality of patterned conductive structures electrically coupled to the first contacts and to second contacts. The device further includes a plurality of conductive posts between a second side of the die and to the first side of the interposer structure and configured to conduct heat from the die to the interposer structure.

A method and an apparatus for forming an electronic device is provided. The method comprises: providing a substrate; disposing at least one electronic component on the substrate via a solder paste; applying an inert atmosphere to the substrate and the solder paste, wherein the inert atmosphere has a reduced oxygen partial pressure compared with air atmosphere; and reflowing the solder paste by a heating process within the inert atmosphere to reduce voids formed within the solder paste during the reflowing of the solder paste.

In one example, an electronic device comprises a substrate having a first conductive structure, an electronic component coupled to the first conductive structure at a first side of the substrate, wherein the electronic component includes a first side facing the first side of the substrate and a second side opposite the first side, vertical interconnects around the electronic component, wherein the vertical interconnects are coupled to the first conductive structure at the first side of the substrate, an interposer having a second conductive structure coupled to the plurality of vertical interconnects, a thermal body coupled between the electronic component and the interposer, and an encapsulant between the substrate and the interposer, around the thermal body, around the plurality of vertical interconnects, and around the electronic component. Other examples and related methods are also disclosed herein.

A structure including a substrate having a conductive pad and a connecting structure disposed on the conductive pad and electrically connected to the conductive pad. The connecting structure includes a first metallic layer disposed on the conductive pad, a first intermetallic compound layer disposed on the first metallic layer, a second intermetallic compound layer disposed on the first intermetallic compound layer and a second metallic layer disposed on the second intermetallic compound layer. The first metallic layer comprises copper. The first intermetallic compound layer comprises a first intermetallic compound. The second intermetallic compound layer comprises a second intermetallic compound different from the first intermetallic compound. The second metallic layer comprises tin. The first intermetallic compound contains copper, tin and one of nickel and cobalt.

A method of manufacturing a semiconductor device interconnect structure is provided. The method includes forming a copper pillar on a semiconductor die by way of a plating process. A proximal portion of the copper pillar has a first width dimension, and a distal portion of the copper pillar has a second width dimension. The second width dimension of the distal portion of the copper pillar is configured to be smaller than the first width dimension of the proximal portion of the copper pillar. Sidewalls of the distal portion of the copper pillar are selectively roughened. The roughened sidewalls of the distal portion of the copper pillar are configured to promote solder wetting.

A semiconductor device includes a low-density substrate, a high-density patch positioned inside a cavity in the low-density substrate, a first semiconductor die, and a second semiconductor die. The first semiconductor dies includes high-density bumps and low-density bumps. The second semiconductor die includes high-density bumps and low-density bumps. The high-density bumps of the first semiconductor die and the high-density bumps of the second semiconductor die are electrically connected to the high-density patch. The low-density bumps of the first semiconductor die and the low-density bumps of the second semiconductor die are electrically connected to the low-density substrate.