A semiconductor device includes: a semiconductor element; and a first conductor and a second conductor respectively joined to a first surface and a second surface of the semiconductor element via Sn-based solder, in which a Ni-based plated layer is formed on surfaces of the first conductor and the second conductor that oppose the Sn-based solder and on the first surface and the second surface of the semiconductor element, and an interface reaction inhibition layer made of (Cu, Ni).sub.6Sn.sub.5 and having a layer thickness of 1.2 to 4.0 m is formed at an interface between the Ni-based plated layer and the Sn-based solder.

Embodiments disclosed herein include semiconductor devices. In an embodiment, a die comprises a substrate, where the substrate comprises a semiconductor material. In an embodiment a fiducial is on the substrate. In an embodiment, the fiducial is a cantilever beam that extends out past an edge of the substrate.

A package structure includes a leadframe, at least two dies, at least one spacer and a plastic package material. The leadframe includes a die pad. The dies are disposed on the die pad of the leadframe. The spacer is disposed between at least one of the dies and the die pad. The plastic package material is disposed on the leadframe, and covers the dies. A first minimum spacing distance is between one of a plurality of edges of the spacer and one of a plurality of edges of the die pad, a second minimum spacing distance is between one of a plurality of edges of the dies and one of the edges of the die pad, and the first minimum spacing distance is larger than the second minimum spacing distance.

In one example, a semiconductor device includes a conductive structure having a conductive structure upper side. A roughening is on the conductive structure upper side and a groove is in the conductive structure extending partially into the conductive structure from the conductive structure upper side. An electronic component is attached to the conductive structure upper side with an attachment film. An encapsulant covers the electronic component, at least portions of the roughening, and at least portions of the conductive structure upper side. The groove has smoothed sidewalls that include substantially planarized portions of the roughening. The smooth sidewalls reduce flow of the attachment film across the conductive structure upper side to improve adhesion of the encapsulant to the conductive structure. Other examples and related methods are also disclosed herein.

In a described example, an apparatus includes: a package substrate with conductive leads; a semiconductor die mounted to the package substrate, the semiconductor die having a first thickness; electrical connections coupling bond pads on the semiconductor die to conductive leads on the package substrate; brackets attached to the package substrate spaced from the semiconductor die and extending away from the package substrate to a distance from the package substrate that is greater than the first thickness of the semiconductor die; and mold compound covering the package substrate, the semiconductor die, the brackets, and the semiconductor die to form a semiconductor device package having a board side surface and a top surface opposite the board side surface, and having portions of the brackets exposed from the mold compound on the top surface of the semiconductor device package to form mounts for a passive component.

A semiconductor package including a first lead comprising a first surface and a second surface that is opposite to the first surface, at least one semiconductor chip that is placed on the first surface of the first lead, a connecting structure body that is connected to the first lead, and a molding layer configured to cover the first lead and the semiconductor chip. The first lead comprises a recess that is formed on the second surface of the lead, and the connecting structure body is placed in the recess. The semiconductor chip, the first lead, and the connecting structure body are electrically connected to each other.

A device comprises a substrate) of a first material with a surface, which is modified by depositing a bi-layer nanoparticle film. The film includes a nanoparticle layer of a second material on top of and in contact with surface, and a nanoparticle layer of a third material on top of and in contact with the nanoparticle layer of the second material. The nanoparticles of the third material adhere to the nanoparticles of the second material. The substrate region adjoining surface comprises an admixture of the second material in the first material. A fourth material contacts and chemically/mechanically bonds to the nanoparticle layer of the third material.

A semiconductor die is arranged at a mounting region of a surface of a substrate. A substrate includes electrically conductive leads around a die pad including a mounting region. A metallic layer is located at one or more portions of the substrate including the mounting region. A semiconductor die is arranged at a mounting region. The metallic layer is selectively exposed at portions less than all of the metallic layer to an oxidizing plasma to produce a patterned oxide layer including oxides of metallic material in the metallic layer. An electrically insulating encapsulation is molded onto the surface of the substrate to encapsulate the semiconductor die. The oxides of metallic material in the patterned oxide layer facilitate adhesion of the electrically insulating encapsulation to the surface of the substrate.

A packaged lateral semiconductor device includes a resistor connected between the device substrate and a package ground point. The packaged device avoids the drawbacks of a floating substrate, and reduces substrate leakage current and increases breakdown voltage relative to conventionally packaged structures. Moreover, device substrate leakage current and breakdown voltage may be controlled by selecting a value of the resistor. Exemplary devices include high voltage lateral devices such as high-electron mobility transistors (HEMTs), implemented in technologies such as GaN or GaAs, where the packaging achieves high breakdown voltage with improved dynamic behavior.

Implementations of a method of providing wettable flanks on leads of a semiconductor package may include applying mold compound around a plurality of leads included in a leadframe; electroplating exposed portions of the plurality of leads; cutting at least one lead of the plurality of leads to expose a flank of the least one lead; applying an electrically conductive layer over the plurality of leads; electroplating the flank of the at least one lead to render the flank wettable; removing the electrically conductive layer from the plurality of leads; and singulating to form a semiconductor package.