A package substrate and a semiconductor package including the same are provided. The semiconductor package includes a package substrate including a base having a front side and a back side, rear pads below the back side of the base, lower connection patterns below the rear pads and in contact with the rear pads, first and second front pads on the front side of the base, a first support pattern on the front side of the base having a thickness greater than a thickness of each of the first and second front pads, and a protective insulating layer on the front side of the base and having openings exposing the first and second front pads respectively, and on an upper surface and a side surface of the first support pattern; a lower semiconductor chip on the protective insulating layer of the package substrate, spaced apart from the first support pattern in a horizontal direction; and a first upper semiconductor chip on the package substrate vertically overlapping the lower semiconductor chip and the first support pattern.

The present invention provides a packaging structure and a manufacturing method thereof. The packaging structure includes a first substrate, a first chip, a second chip, a first heat conductor and a second heat conductor, wherein the first substrate includes a cavity; the first chip is embedded in the cavity and includes a first connecting surface and a first heat-conducting surface that face away from each other; the second chip is disposed on a side of the first connecting surface and electrically connected to the first chip, a side of the second chip distal from the first chip includes a second heat-conducting surface on a side; and the first heat conductor is connected to the first heat-conducting surface, and the second heat conductor is connected to the second heat-conducting surface. The first substrate includes a third connecting surface that is flush with the first connecting surface.

The disclosure concerns methods of forming a semiconductor device with a repairable redistribution layer (RDL) design, comprising: preparing an original repairable RDL design; forming first conductive segments of the repairable RDL design; inspecting the first conductive segments of the repairable RDL design to detect manufacturing defects; detecting at least one defect in the first conductive segments; and forming second conductive segments of the repairable RDL design according to a new custom RDL design to mitigate the negative effects of the at least one defect among the first conductive segments. The disclosure also concerns semiconductor devices with a repairable RDL design.

A multiple die package is described that has an embedded bridge to connect the dies. One example is a microelectronic package that includes a package substrate, a silicon bridge embedded in the substrate, a first interconnect having a first plurality of contacts at a first location of the silicon bridge, a second interconnect having a second plurality of contacts at a second location of the silicon bridge, a third interconnect having a third plurality of contacts at a third location of the silicon bridge, and an electrically conductive line in the silicon bridge connecting a contact of the first interconnect, a contact of the second interconnect, and a contact of the third interconnect each to each other.

A semiconductor device includes an insulated circuit substrate, a semiconductor chip, a printed circuit board, an interposer, and a sealing member, the interposer including a plurality of post electrodes each having one end bonded to the semiconductor chip via a solder layer, an insulating layer provided to be separately opposed to the semiconductor chip and provided with a first penetration hole filled with part of the solder layer, and a conductor layer provided to be opposed to the printed circuit board and connected to another end of each of the post electrodes via the insulating layer.

Embodiments of the present disclosure provide a microelectronic assembly comprising: a first integrated circuit (IC) die in a first layer; an interposer in a second layer not coplanar with the first layer, the first layer coupled to the second layer by interconnects having a pitch of less than 10 micrometers between adjacent interconnects; and a first conductive pathway and a second conductive pathway in the interposer coupling the first IC die and a second IC die. The first IC die is configured to transmit at a first supply voltage through the first conductive pathway to a second IC die, the second IC die is configured to transmit to the first IC die through the second conductive pathway at a second supply voltage simultaneously with the first die transmitting at the first supply voltage, and the first supply voltage is different from the second supply voltage.

A method includes forming a first photoresist layer on a dielectric layer; performing a first light-exposure process on the first photoresist layer using a first photolithography mask, wherein during the first light-exposure process, a first region the first photoresist layer is blocked from being exposed, a second region of the first photoresist layer is exposed, and a third region of the first photoresist layer is exposed, wherein the second region encircles the first region and the third region encircles the second region; performing a second light-exposure process on the first photoresist layer using a second photolithography mask, wherein during the second light-exposure process, the first region of the first photoresist layer is exposed, the second region of the first photoresist layer is exposed, and the third region of the first photoresist layer is blocked from being exposed; and developing the first photoresist layer.

A semiconductor package structure includes a redistribution structure layer, at least one chip, an encapsulant, and multiple solder balls. The redistribution structure layer includes multiple first connectors located on a first side. Each first connector includes a connecting pad, a soldering pad, and multiple conductive blind holes located between the connecting pad and the soldering pad. The conductive blind holes are disposed separately from each other and connect the connecting pad and the soldering pad. The chip is disposed on a second side of the redistribution structure layer and electrically connected to the redistribution structure layer. The encapsulant is disposed on the second side and at least covers the chip and the second side. The solder balls are disposed on the first side of the redistribution structure layer and electrically connected to the redistribution structure layer. The solder balls are respectively connected to the connecting pad of each first connector.

A semiconductor package includes a redistribution structure including redistribution patterns, first and second chip structures on the redistribution structure and electrically connected to the redistribution patterns, a first mold covering at least a portion of each of the first and second chip structures, an interconnection chip including interconnection patterns electrically connected to the redistribution patterns and a plurality of insulating layers having third surfaces in which respective ones of the interconnection patterns are embedded, through-vias electrically connected to the redistribution patterns, a second mold covering at least a portion of each of the through-vias and the interconnection chip. Each third surface includes a first region, and a second region between the first region and an upper surface of the respective interconnection pattern embedded in the third surface. The second region defines a step between the first region and the upper surface of the interconnection pattern embedded in the third surface.

A semiconductor package includes a redistribution structure, a first semiconductor chip above the redistribution structure, a second semiconductor chip on, and offset relative to, the first semiconductor chip, a plurality of first conductive posts extending from a bottom surface of the second semiconductor chip to a top surface of the redistribution structure, a third semiconductor chip on the second semiconductor chip, a plurality of second conductive posts extending from a bottom surface of the third semiconductor chip to the top surface of the redistribution structure, and a molding layer between the top surface of the redistribution structure and the bottom surface of the third semiconductor chip.