A high voltage semiconductor package includes a semiconductor device. The semiconductor device includes a high voltage semiconductor transistor chip having a front side and a backside. A low voltage load electrode and a control electrode are disposed on the front side of the semiconductor transistor chip. A high voltage load electrode is disposed on the backside of the semiconductor transistor chip. The semiconductor package further includes a dielectric inorganic substrate. The dielectric inorganic substrate includes a pattern of first metal structures running through the dielectric inorganic substrate and connected to the low voltage load electrode, and at least one second metal structure running through the dielectric inorganic substrate and connected to the control electrode. The front side of the semiconductor transistor chip is attached to the dielectric inorganic substrate by a wafer bond connection, and the dielectric inorganic substrate has a thickness of at least 50 m.

A semiconductor package includes a package substrate including a base substrate including a redistribution layer, pads disposed on first and second surfaces of the base substrate and connected to the redistribution layer, and a protective layer having a mounting region in which first openings respectively exposing first pads among the pads and a second opening exposing second pads among the pads and a portion of the second surface are disposed on the second surface; a semiconductor chip disposed on the mounting region and connected to the pads through the first openings and the second opening; and a sealing material covering a portion of the semiconductor chip and extending into the second opening. Four first openings among the first openings are respectively disposed adjacent to respective corners of the mounting region. The second opening is disposed to divide the four first openings into at least two groups.

In an output circuit of a semiconductor integrated circuit device, an output transistor part including a transistor connected between VSS and an output terminal has first and second active regions overlapping each other in planar view. A power line and an output line are placed in an interconnect layer on the back side so as to overlap the first and second active regions in planar view. The power line is connected to the lower face of the portion that is to be the source of the first active region through a via, and the output line is connected to the lower face of the portion that is to be the drain of the first active region through a via.

A semiconductor device assembly can include a first semiconductor device comprising CMOS circuitry at a first active surface and a second semiconductor device having a footprint smaller than that of the first semiconductor device and including memory array circuitry at a second active surface hybrid-bonded to the first active surface. The assembly can further include a gapfill material directly contacting the first active surface of the first semiconductor device and having an upper surface coplanar with a back surface of the second semiconductor device, and a metallization layer disposed over the second semiconductor device and the gapfill material. The metallization layer can include conductive structures operably coupled to the second semiconductor device through back-side contacts of the second semiconductor device. The assembly can further include a plurality of bond pads disposed at an upper surface of the metallization layer and coupled to the conductive structures of the metallization layer.

A chiplet hub for interconnecting a series of connected chiplets and internal resources. An HBM is mounted on top of the chiplet hub to provide multiple party access to the HBM and to save System in Package (SIP) area. The chiplet hub can form system instances to combine connected chiplets and internal resources, with the system instances being isolated. One type of system instance is a private memory system instance with private memory gathered from multiple different memory devices. The chiplet hubs can be interconnected to form a clustered chiplet hub to provide for a larger number of chiplet connections and more complex system. A DMA controller can receive DMA service requests from devices other than a system hosted, including in cases where the chiplet hub is non-hosted.

A semiconductor package includes a connection substrate on a package substrate and has an opening that penetrates therethrough. A chip stack is on the package substrate and in the opening. A redistribution layer is on the connection substrate and the chip stack. An upper semiconductor chip is on first redistribution pads of the redistribution layer. External terminals are on a bottom surface of the package substrate. The chip stack includes a first semiconductor chip on substrate pads of the package substrate, and a second semiconductor chip on the first semiconductor chip and second redistribution pads of the redistribution layer. The redistribution layer includes a first region that overlaps the upper semiconductor chip and a second region beside the upper semiconductor chip. The first redistribution pads are on the first region. The second redistribution pads are on the second region.

Methods, systems, and devices for redundant bond pads in stacked semiconductor architectures are described. A semiconductor device may be formed one or more redundant structures. A memory chip and a logic die may be formed with a redistribution layer that interconnects multiple bonding pads together. The redistribution layer may couple the bonding pads with a common via, where the common via interfaces with circuitry of a respective device. Additionally, or alternatively, a memory chip and a logic die may be formed with redundant via paths that form parallel electrical paths. The redundant via paths may couple device circuitry with respective bonding pads of a device. The memory chip and the logic die may be bonded together to form a semiconductor device.

A semiconductor chip includes: a photonic integrated circuit (PIC) comprising an active component electrically connected to a first landing pad at a surface of the PIC, wherein the first landing pad is configured to receive a copper pillar, which, when installed, provides at least a portion of a first electrical interconnect between the active photonic component and a second integrated circuit to be stacked on the surface of the PIC, and wherein, when viewed from above the PIC towards the PIC, a center of the active photonic component on the PIC is offset from a nearest edge of the first landing pad by about a distance less than 10 m.

Semiconductor devices, packaging architectures and associated methods are disclosed. In one embodiment, a multi-chip module (MCM) is disclosed. The MCM includes an active silicon substrate and a memory interface circuit configured to support N memory channels. The memory interface circuit has a primary interface for coupling to a host memory interface via the N memory channels. A first HBM stack of memory die is disposed on the active silicon substrate and coupled to a secondary interface of the memory interface circuit. The first HBM stack dedicated to a first subset of the N data channels and a first data transfer rate. A second HBM stack of memory die is disposed on the active silicon substrate. The second HBM stack is positioned inline with the first HBM stack and the memory interface circuit and coupled to the secondary interface of the memory interface circuit. The second HBM stack is dedicated to a second subset of the N data channels and exhibits a second data transfer rate. The first HBM stack and the second HBM stack are configured to collectively support the N channels and exhibit an aggregate data rate that is a sum of the first data rate and the second data rate.

A semiconductor package includes a substrate; a sub semiconductor package disposed over the substrate, the sub semiconductor package including a sub semiconductor chip with chip pads on its active surface that faces the substrate, a sub molding layer that surrounds side surfaces of the sub semiconductor chip, the sub molding layer with a surface that faces the substrate, and redistribution conductive layers that connect to the chip pads and extend under the surface of the sub molding layer, wherein the redistribution conductive layers include a signal redistribution conductive layer that extends toward an edge of the sub molding layer, the signal redistribution conductive layer with a signal redistribution pad on its end portion, and a power redistribution conductive layer that has a length that is shorter than a length of the signal redistribution conductive layer, the power redistribution conductive layer with a power redistribution pad on its end portion; a signal sub interconnector with an upper surface that is connected to the signal redistribution pad and a lower surface that is connected to the substrate; a power sub interconnector with an upper surface that is connected to the power redistribution pad and a lower surface that is connected to the substrate; and at least one main semiconductor chip formed over the sub semiconductor package and electrically connected to the substrate.