A display device includes: a power source line; a plurality of gate lines each extending in a first direction and arranged along a second direction in a plan view; a plurality of pixels connected to the power source line and the gate lines; and a plurality of vertical lines each extending in the second direction and arranged along the first direction in the plan view, wherein the vertical lines include a plurality of gate connection lines and a plurality of dummy lines between the gate connection lines, wherein the gate connection lines connect the gate lines to a gate driver, wherein the dummy lines are connected to the power source line, and wherein a distance between the dummy lines spaced apart from each other with at least one of the gate connection lines interposed therebetween is constant throughout.

An electronic structure, an electronic package and a manufacturing method thereof are provided, in which a carrier and an adhesive layer are used to support or fix the electronic structure and the electronic package, and double carriers are used to support or fix the electronic structure and the electronic package, thereby avoiding the warpage problem of the electronic structure and the electronic package.

A semiconductor assembly, a packaging structure, and associated method for corner stress reduction in semiconductor devices. The assembly includes a plurality of semiconductor dies and a plurality of spacers. Each spacer in the plurality of spacers is disposed between and configured to separate two semiconductor dies in the plurality of semiconductor dies. At least one spacer in the plurality of spacers has at least one extended spacer corner feature configured to extend toward at least one corner of at least one semiconductor die in the plurality of semiconductor dies disposed adjacent to the at least one spacer. At least one extended spacer corner feature is configured to reduce stress on at least one semiconductor die.

A fan-out wafer-level packaging (FOWLP) unit including a substrate, at least one first die, a first dielectric layer, a plurality of first conductive circuits, a second dielectric layer, a plurality of second conductive circuits, and at least one second die is provided. A range perpendicular to a second surface of the first die is defined as a chip area. The second dielectric layer is provided with a plurality of second slots allowing the second conductive circuit to expose and form bonding pads. The bonding pads located around the chip area are first bonding pads. The second die is disposed over the second dielectric layer by flip chip and electrically connected to the first die which is electrically connected with the outside by the first bonding pads. Thereby problems of conventional FOWLP generated during manufacturing of the conductive circuits including higher manufacturing cost and less environmental benefit can be solved.

Disclosed herein are microelectronic assemblies, as well as related apparatuses and methods. In some embodiments, a microelectronic assembly may include a plurality of dies stacked vertically; a trench of dielectric material extending through the plurality of dies; a conductive via extending through the trench of dielectric material; and a plurality of conductive pathways between the plurality of dies and the conductive via, wherein individual ones of the conductive pathways are electrically coupled to the conductive via and to individual ones of the plurality of dies, and wherein the individual ones of the plurality of conductive pathways have a first portion including a first material and a second portion including a second material different from the first material.

A method for fabricating semiconductor device includes the steps of first providing a first substrate having a high-voltage (HV) region and a medium voltage (MV) region and a second substrate having a low-voltage (LV) region and a static random access memory (SRAM) region, in which the HV region includes a HV device, the MV region includes a MV device, the LV region includes a fin field-effect transistor (FinFET), and the SRAM region includes a SRAM device. Next, a bonding process is conducted by using hybrid bonding, through-silicon interposer (TSI) or redistribution layer (RDL) for bonding the first substrate and the second substrate.

A device package comprising an integrated cooling assembly comprising a semiconductor stack and a cooling channel, wherein the semiconductor stack comprises a first semiconductor device and a second semiconductor device stacked vertically above the first semiconductor device; and spacers extending between opposing surfaces of the first and second semiconductor devices to space the first semiconductor device away from the second semiconductor device, the spacers and the opposing surfaces of the first and second semiconductor devices collectively define the cooling channel therebetween; and the spacers comprise via electrically connecting the first semiconductor device and the second semiconductor device.

A display device includes a first display substrate including a light emitting element layer, a second display substrate facing the first display substrate and including a light blocking member and a color conversion layer, a coupling member that connects the first display substrate and the second display substrate to each other, and a filling member disposed between the first display substrate and the second display substrate. The filling member includes a photoinitiator that initiates by absorbing light of a wavelength band in a range of about 380 nm to about 500 nm, and the light blocking member and the color conversion layer cover a side of an entire surface of the second display substrate.

An offset interposer includes a land side including land-side ball-grid array (BGA) and a package-on-package (POP) side including a POP-side BGA. The land-side BGA includes two adjacent, spaced-apart land-side pads, and the POP-side BGA includes two adjacent, spaced-apart POP-side pads that are coupled to the respective two land-side BGA pads through the offset interposer. The land-side BGA is configured to interface with a first-level interconnect. The POP-side BGA is configured to interface with a POP substrate. Each of the two land-side pads has a different footprint than the respective two POP-side pads.

A package structure is provided. The package structure includes a redistribution structure, and the redistribution structure has multiple insulating layers and multiple conductive features. The package structure also includes a semiconductor die and a device element over opposite surfaces of the redistribution structure. The package structure further includes a first protective layer at least partially surrounding the semiconductor die. In addition, the package structure includes a second protective layer at least partially surrounding the device element. The second protective layer is thicker than the first protective layer, and the second protective layer and the first protective layer have different coefficients of thermal expansion.